Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > Press > CEA-Leti and its Startup ASELTA Create Joint Lab to Address Manufacturing Challenges of Mask and Direct-Write Lithography

Abstract:
CEA-Leti and ASELTA Nanographics, its newly incorporated startup, today announced they will jointly develop e-beam proximity effects correction solutions for both mask writing and maskless lithography (ML2) applications. This common lab is staffed with a joint team of CEA-Leti and ASELTA personnel. Part of this collaboration will be done inside the multi-partner IMAGINE program, which is designed to develop maskless lithography for IC manufacturing.

CEA-Leti and its Startup ASELTA Create Joint Lab to Address Manufacturing Challenges of Mask and Direct-Write Lithography

Grenoble, France | Posted on February 24th, 2011

Launched in November 2009, ASELTA Nanographics develops software that reduces production costs for chips at the 32nm node and beyond by improving fab-process precision, including cycle time and lithography-image quality.

"ASELTA is excited about funding a joint laboratory with CEA-Leti in order to get access to leading edge e-beam equipment and validate its work on e-beam proximity effects correction," said Serdar Manakli, ASELTA CEO. "E-beam proximity effects have been under-estimated so far. Our experience has proven that with our unique expertise, we can provide our customers with dramatic productivity improvement and lifetime extension of current equipment. The fact that more and more partners are joining partnership programs like IMAGINE is a validation of our vision."

"Launching and supporting startups in one of our main missions and ASELTA is one of the most promising companies to come out of Leti. It is addressing key maskmaking challenges for both critical dimension (CD) control and writing speed," said Serge Tedesco, CEA-Leti program manager. "Moreover, the growing interest in ML2 has to be supported from the point of view of proximity-effect correction and CEA-Leti, with its industrial IMAGINE program, will provide the right environment."

####

About CEA-Leti
CEA is a French research and technology organization, with activities in four main areas: energy, information technologies, healthcare technologies and defence and security. Within CEA, the Laboratory for Electronics & Information Technology (CEA-Leti) works with companies in order to increase their competitiveness through technological innovation and transfers. CEA-Leti is focused on micro and nanotechnologies and their applications, from wireless devices and systems, to biology and healthcare or photonics. Nanoelectronics and microsystems (MEMS) are at the core of its activities. As a major player in MINATEC campus, CEA-Leti operates 8,000-m² state-of-the-art clean rooms, on 24/7 mode, on 200mm and 300mm wafer standards. With 1,200 employees, CEA-Leti trains more than 150 Ph.D. students and hosts 200 assignees from partner companies. Strongly committed to the creation of value for the industry, CEA-Leti puts a strong emphasis on intellectual property and owns more than 1,500 patent families.

About ASELTA

ASELTA is a privately funded French company providing software environment mostly for the e-beam market. A CEA-LETI spin-off, incorporated in November 2009, ASELTA has production customers benefiting from its technology. Its unique architecture allows customers to increase resolution, accuracy and reduce writing time for their e-beam equipment with a seamless plug-and-play environment. Its corporate headquarters are at Minatec BHT, Bat.52 7 Parvis Louis Néel, BP50, 38040 Grenoble. Email:

For more information, please click here

Contacts:
CEA-LETI Contacts:
Serge Tedesco
Phone: +33 4 38 78 49 89
Email:

Thierry Bosc
Phone: +33 4 38 78 31 95
Email:

Agency
Amélie Ravier
Phone: +33 1 58 18 59 30
Email:

Copyright © CEA-Leti

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

A new product to help combat mouldy walls, thanks to technology developed at the ICN2 December 14th, 2017

Sandia researchers make solid ground toward better lithium-ion battery interfaces: Reducing the traffic jam in batteries December 13th, 2017

Perking up and crimping the 'bristles' of polyelectrolyte brushes December 13th, 2017

Columbia engineers create artificial graphene in a nanofabricated semiconductor structure: Researchers are the first to observe the electronic structure of graphene in an engineered semiconductor; finding could lead to progress in advanced optoelectronics and data processing December 13th, 2017

Chip Technology

Columbia engineers create artificial graphene in a nanofabricated semiconductor structure: Researchers are the first to observe the electronic structure of graphene in an engineered semiconductor; finding could lead to progress in advanced optoelectronics and data processing December 13th, 2017

UCLA chemists synthesize narrow ribbons of graphene using only light and heat: Tiny structures could be next-generation solution for smaller electronic devices December 8th, 2017

Device makes power conversion more efficient: New design could dramatically cut energy waste in electric vehicles, data centers, and the power grid December 8th, 2017

Leti Integrates Hybrid III-V Silicon Lasers on 200mm Wafers with Standard CMOS Process December 6th, 2017

Nanoelectronics

Columbia engineers create artificial graphene in a nanofabricated semiconductor structure: Researchers are the first to observe the electronic structure of graphene in an engineered semiconductor; finding could lead to progress in advanced optoelectronics and data processing December 13th, 2017

GLOBALFOUNDRIES, Fudan Team to Deliver Next Generation Dual Interface Smart Card November 14th, 2017

Leti Will Present 11 Papers and Host More-than-Moore Technologies Workshop November 14th, 2017

The next generation of power electronics? Gallium nitride doped with beryllium: How to cut down energy loss in power electronics? The right kind of doping November 9th, 2017

Announcements

A new product to help combat mouldy walls, thanks to technology developed at the ICN2 December 14th, 2017

Sandia researchers make solid ground toward better lithium-ion battery interfaces: Reducing the traffic jam in batteries December 13th, 2017

Perking up and crimping the 'bristles' of polyelectrolyte brushes December 13th, 2017

Columbia engineers create artificial graphene in a nanofabricated semiconductor structure: Researchers are the first to observe the electronic structure of graphene in an engineered semiconductor; finding could lead to progress in advanced optoelectronics and data processing December 13th, 2017

Alliances/Trade associations/Partnerships/Distributorships

A new product to help combat mouldy walls, thanks to technology developed at the ICN2 December 14th, 2017

JPK Instruments announce partnership with Swiss company, Cytosurge AG. The partnership makes Cytosurge’s FluidFM® technology available on the JPK NanoWizard® AFM platform December 8th, 2017

Nano Global, Arm Collaborate on Artificial Intelligence Chip to Drive Health Revolution by Capturing and Analyzing Molecular Data in Real Time November 21st, 2017

EC Project Aims at Creating and Commercializing Cyber-Physical-System Solutions November 14th, 2017

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project