Nanotechnology Now







Heifer International

Wikipedia Affiliate Button


DHgate

Home > Press > UMD Advance Lights Possible Path to Creating Next Gen Computer Chips

Abstract:
University of Maryland researchers have made a breakthrough in the use of visible light for making tiny integrated circuits. Though their advance is probably at least a decade from commercial use, they say it could one day make it possible for companies like Intel to continue their decades long tread of making ever smaller, faster, and cheaper computer chips.

UMD Advance Lights Possible Path to Creating Next Gen Computer Chips

College Park, MD | Posted on February 4th, 2011

For some 50 years, the integrated circuits, or chips, that are at the heart of computers, smart phones, and other high-tech devices have been created through a technique known as photolithography, in which each computer chip is built up in layers.

In photolithography, each layer of a conductive material (metal, treated silicon, etc,) is deposited on a chip and coated with a chemical that hardens when exposed to light. Light shining through a kind of stencil know as a mask projects a detailed pattern onto the photoresist, which hardens where it's exposed. Then, the unhardened areas of photoresist and underlying metal are etched away with a chemical. Finally, the remaining photoresist is etched away using a different chemical treatment, leaving an underlying layer of metal with the same shape as the mask.

However, fitting more and more circuits on each chip has meant making smaller and smaller circuits. In fact, features of circuits in today's computer chips are significantly smaller than the wavelength of visible light. As a result, manufacturers have gone to using shorter and shorter wavelengths of light (radiation), or even charged particles, to enable them to make these circuits.

University of Maryland chemistry Professor John Fourkas and his research group recently introduced a technique called RAPID lithography that makes it possible to use visible light to attain lithographic resolution comparable to (and potentially even better than) that obtained with shorter wave length radiation.

"Our RAPID technique could offer substantial savings in cost and ease of production," Fourkas said. "Visible light is far less expensive to generate, propagate and manipulate than shorter wavelength forms of electromagnetic radiation, such as vacuum ultraviolet or X-rays. And using visible light would not require the use of the high vacuum conditions needed for current short wavelength technologies."

The key to RAPID is the use of a special "photoinitiator" that can be excited, or turned on, by one laser beam and deactivated by another. In new work just published online by Nature Chemistry, Fourkas and his group report three broad classes of common dye molecules that can be used for RAPID lithography.

In earlier work, Fourkas and his team used a beam of ultrafast pulses for the excitation step and a continuous laser for deactivation. However, they say that in some of their newly reported materials deactivation is so efficient that the ultrafast pulses of the excitation beam also deactivate molecules. This phenomenon leads to the surprising result that higher exposures can lead to smaller features, leading to what the researchers call a proportional velocity (PROVE) dependence.

"PROVE behavior is a simple way to identify photoinitiators that can be deactivated efficiently," says Fourkas, "which is an important step towards being able to use RAPID in an industrial setting."

By combining a PROVE photoinitiator with a photoinitiator that has a conventional exposure dependence, Fourkas and co-workers were also able to demonstrate a photoresist for which the resolution was independent of the exposure over a broad range of exposure times.

"Imagine a photographic film that always gives the right exposure no matter what shutter speed is used," says Fourkas. "You could take perfect pictures every time. By the same token, these new photoresists are extremely fault-tolerant, allowing us to create the exact lithographic pattern we want time after time."

According to Fourkas, he and his team have more research to do before thinking about trying to commercialize their new RAPID technology. "Right now we're using the technique for point-by-point lithography. We need to get it to the stage where we can operate on an entire silicon wafer, which will require more advances in chemistry, materials and optics. If we can make these advances -- and we're working hard on it -- then we will think about commercialization."

Another factor in time to application, he explained, is that his team's approach is not a R&D direction that chip manufacturers had been looking at before now. As a result, commercial use of the RAPID approach is probably at least ten years down the road, he said.

Multiphoton photoresists giving nanoscale resolution that is inversely dependent on exposure time was authored by Michael P. Stocker, Linjie Li, Ravael R. Gattass and John T. Fourkas.

The authors acknowledge the support of the Maryland NanoCenter and its NispLab. The NispLab is supported in part by the National Science Foundation (NSF) as a Materials Research Science and Engineering Center (MRSEC) Shared Experimental Facility. This work was supported in part by the UMD-NSF-MRSEC.

To learn more about research in the Fourkas laboratories, visit www2.chem.umd.edu/groups/fourkas

####

Contacts:
Lee Tune
301 405 4679

Copyright © University of Maryland

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Toyocolor to Launch New Carbon Nanotube Materials at nano tech 2015 January 24th, 2015

NANOPOSTER 2015 - 5th Virtual Nanotechnology Conference - call for abstracts January 24th, 2015

Nanosensor Used for Simultaneous Determination of Effective Tea Components January 24th, 2015

The latest fashion: Graphene edges can be tailor-made: Rice University theory shows it should be possible to tune material's properties January 24th, 2015

Govt.-Legislation/Regulation/Funding/Policy

The latest fashion: Graphene edges can be tailor-made: Rice University theory shows it should be possible to tune material's properties January 24th, 2015

Scientists 'bend' elastic waves with new metamaterials that could have commercial applications: Materials could benefit imaging and military enhancements such as elastic cloaking January 23rd, 2015

Harper Government Supports Research Innovation in Western Canada January 22nd, 2015

EnvisioNano: An image contest hosted by the National Nanotechnology Initiative (NNI) January 22nd, 2015

Possible Futures

Nanotechnology in Energy Applications Market Research Report 2014-2018: Radiant Insights, Inc January 15th, 2015

'Mind the gap' between atomically thin materials December 23rd, 2014

A novel method for identifying the body’s ‘noisiest’ networks November 19th, 2014

Researchers discern the shapes of high-order Brownian motions November 17th, 2014

Academic/Education

Rice's Naomi Halas to direct Smalley Institute: Optics pioneer will lead Rice's multidisciplinary science institute January 15th, 2015

SUNY Board Appoints Dr. Alain Kaloyeros as Founding President of SUNY Polytechnic Institute January 13th, 2015

CNSE's Smart System Technology & Commercialization Center Successfully Recertifies as ISO 9001:2008 January 12th, 2015

SUNY Poly Now Accepting Applications to the Colleges of Nanoscale Science and Engineering for Fall 2015: Full Scholarships Available to Incoming CNSE Students January 7th, 2015

Chip Technology

The latest fashion: Graphene edges can be tailor-made: Rice University theory shows it should be possible to tune material's properties January 24th, 2015

New method to generate arbitrary optical pulses January 21st, 2015

New signal amplification process set to transform communications, imaging, computing: UC San Diego researchers discover a mechanism to amplify signals in optoelectronic systems that is far more efficient than standard processes January 21st, 2015

Solving an organic semiconductor mystery: Berkeley Lab researchers uncover hidden structures in domain interfaces that hamper performance January 16th, 2015

Nanoelectronics

Rice-sized laser, powered one electron at a time, bodes well for quantum computing January 15th, 2015

Rapid journey through a crystal lattice: Researchers measure how fast electrons move through single atomic layers January 14th, 2015

A new step towards using graphene in electronic applications January 14th, 2015

SUNY Board Appoints Dr. Alain Kaloyeros as Founding President of SUNY Polytechnic Institute January 13th, 2015

Discoveries

Nanosensor Used for Simultaneous Determination of Effective Tea Components January 24th, 2015

The latest fashion: Graphene edges can be tailor-made: Rice University theory shows it should be possible to tune material's properties January 24th, 2015

Iranian Scientists Produce Graphene-Based Oxygen Sensor January 23rd, 2015

Silver nanowires demonstrate unexpected self-healing mechanism: The material has potential for flexible electronics January 23rd, 2015

Announcements

Toyocolor to Launch New Carbon Nanotube Materials at nano tech 2015 January 24th, 2015

NANOPOSTER 2015 - 5th Virtual Nanotechnology Conference - call for abstracts January 24th, 2015

Nanosensor Used for Simultaneous Determination of Effective Tea Components January 24th, 2015

The latest fashion: Graphene edges can be tailor-made: Rice University theory shows it should be possible to tune material's properties January 24th, 2015

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More










ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2015 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE