Nanotechnology Now

Our NanoNews Digest Sponsors



Heifer International

Wikipedia Affiliate Button


android tablet pc

Home > Press > CAMECA Unveils News Semiconductor Metrology Tool

Cameca EX-300 LEXES metrology tool
Cameca EX-300 LEXES metrology tool

Abstract:
Versatile Metrology Tool for Front-End Process Control Of 22nm Technology Nodes and Beyond

CAMECA Unveils News Semiconductor Metrology Tool

Gennevillers, France | Posted on January 27th, 2011

CAMECA, a world leader in scientific instrumentation and metrology solutions for semiconductor labs and fabs, has unveiled the latest addition to its line of high-end metrology systems-the EX-300 metrology tool targeted for front-end process control of 22 nm technology nodes and beyond.

"CAMECA is very proud to introduce the EX-300," notes Dr. Michel Schuhmacher, CAMECA Vice President and Chief Technical Officer. "This highly versatile metrology tool benefits from CAMECA's 10-years of experience with LEXES (Low-energy Electron induced X-ray Emission Spectrometry) technology."

"We are convinced that the EX-300 will become the metrology tool of choice for semiconductor fabs integrating new challenging processes," adds Dr. Schuhmacher. "The EX-300 offers unique capabilities for front-end compositional control at and near the surface. The instrument targets front-end process control for 22nm technology nodes and performs metrology of patterned wafers down to 30x30µm."

The EX-300 utilizes LEXES, a unique surface probing technique pioneered by CAMECA. The technology is now well-established for addressing challenges in elemental composition, thickness determination and dopant dosimetry. With dozens of CAMECA LEXFAB 300 instruments currently installed at the top-ten semiconductor fabrication facilities worldwide, the technology is considered the standard for semiconductor R&D and ramping-up phases at the most advanced nodes as well as for high-volume production monitoring.

CAMECA optimized the performance of the EX-300 for challenging High K Metal Gate (HKMG), epitaxial layers such as Boron in Silcon Germanium(B:SiGe) and shallow implants, fulfilling requirements of both rapid device development and high-yield mass production. In addition, the instrument is designed to deliver enhanced long-term stability and minimize mean time to repair (MTTR).

####

About CAMECA
CAMECA has more than 50 years of experience in the design, manufacture and servicing of scientific instruments for material micro- and nano-analysis. Since pioneering Secondary Ion Mass Spectrometry (SIMS) and Electron Probe Microanalysis (EPMA) instrumentation in the 1950s, CAMECA has remained an undisputed world leader, while achieving numerous breakthrough innovations in such complementary techniques as LEXES and Atom Probe Tomography.

More recently CAMECA has evolved successfully from a provider of scientific instrumentation for the international research community to a provider of metrology solutions for the semiconductor industry. Headquartered near Paris, CAMECA has subsidiaries in China, Germany, Japan, Korea, Taiwan and the United States along with a global network of agents. Acquired in 2007 by AMETEK, Inc, a leading global manufacturer of electronic instrument and electromechanical products, CAMECA is now a unit of AMETEK’s Materials Analysis Division.

For more information, please click here

Contacts:
Marion Chopin
+33 (1) 43 34 62 00

Copyright © CAMECA

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Cool Calculations for Cold Atoms: New theory of universal three-body encounters September 2nd, 2014

Accounting for Biological Aggregation in Heating and Imaging of Magnetic Nanoparticles September 2nd, 2014

Engineers develop new sensor to detect tiny individual nanoparticles September 2nd, 2014

Future solar panels September 2nd, 2014

Chip Technology

New analytical technology reveals 'nanomechanical' surface traits August 29th, 2014

Fonon Announces 3D Metal Sintering Technology: Emerging Additive Nano Powder Manufacturing Technology August 28th, 2014

RMIT delivers $30m boost to micro and nano-tech August 26th, 2014

Competition for Graphene: Berkeley Lab Researchers Demonstrate Ultrafast Charge Transfer in New Family of 2D Semiconductors August 26th, 2014

Memory Technology

Promising Ferroelectric Materials Suffer From Unexpected Electric Polarizations: Brookhaven Lab scientists find surprising locked charge polarizations that impede performance in next-gen materials that could otherwise revolutionize data-driven devices August 18th, 2014

Can our computers continue to get smaller and more powerful? University of Michigan computer scientist reviews frontier technologies to determine fundamental limits of computer scaling August 13th, 2014

An Inkjet-Printed Field-Effect Transistor for Label-Free Biosensing August 11th, 2014

Rice's silicon oxide memories catch manufacturers' eye: Use of porous silicon oxide reduces forming voltage, improves manufacturability July 10th, 2014

Nanoelectronics

Competition for Graphene: Berkeley Lab Researchers Demonstrate Ultrafast Charge Transfer in New Family of 2D Semiconductors August 26th, 2014

A*STAR and industry form S$200M semiconductor R&D July 25th, 2014

A Crystal Wedding in the Nanocosmos July 23rd, 2014

3-D nanostructure could benefit nanoelectronics, gas storage: Rice U. researchers predict functional advantages of 3-D boron nitride July 15th, 2014

Announcements

New synthesis method may shape future of nanostructures, clean energy: Findings advance efficient solar spliting of water into hydrogen fuel September 2nd, 2014

Accounting for Biological Aggregation in Heating and Imaging of Magnetic Nanoparticles September 2nd, 2014

Engineers develop new sensor to detect tiny individual nanoparticles September 2nd, 2014

Future solar panels September 2nd, 2014

Tools

Accounting for Biological Aggregation in Heating and Imaging of Magnetic Nanoparticles September 2nd, 2014

Raman Whispering Gallery Detects Nanoparticles September 1st, 2014

New analytical technology reveals 'nanomechanical' surface traits August 29th, 2014

Ultra-Low Frequency Vibration Isolation Stabilizes Scanning Tunneling Microscopy at UCLA’s Nano-Research Group August 28th, 2014

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More














ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2014 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE