Nanotechnology Now







Heifer International

Wikipedia Affiliate Button


DHgate

Home > Press > TOK Joins CEA-Leti IMAGINE Program to Develop Multiple E-Beam Lithography Sub-20nm Resists and Processes

Abstract:
TOK and CEA-Leti today announced that TOK will join the new industry/research multi-partner program IMAGINE that is developing maskless lithography for IC manufacturing.

TOK Joins CEA-Leti IMAGINE Program to Develop Multiple E-Beam Lithography Sub-20nm Resists and Processes

Kawasaki, Japan | Posted on January 17th, 2011

The three-year project is led by CEA-Leti, a research center committed to creating and commercializing innovation in micro- and nanotechnologies, and also includes semiconductor manufacturers TSMC and STMicroelectronics. It is evaluating a maskless lithography infrastructure and the use of MAPPER Lithography tools for high throughput. The multiple e-beam-lithography program covers a global approach to the technology, including tool assessment, patterning and process integration, data handling, prototyping and cost analysis.

"TOK's material development beyond the 20nm node covers a broad range of technology- platform and lithography-process candidates, such as EUVL, ML2, and DSA. The IMAGINE program at CEA-Leti, which focuses on multiple e-beam lithography, is a very attractive program especially for understanding the fundamental RLS (resolution, line edge roughness and sensitivity) issue in photoresist development," said Kazufumi Sato, TOK R&D general manager. "TOK will contribute to the program by providing a materials perspective based on our deep knowledge of the electron-beam resist and recent discoveries from the EUV resist development."

"The development of new chemically amplified resist platforms achieving resolution below 20nm with a line-edge roughness in the nanometer range is one of the main challenges for next-generation lithography," said Serge Tedesco, CEA-Leti program manager. "We have already built a long and fruitful collaboration with TOK by working together at the introduction of e-beam lithography at the STMicroelectronics Crolles Line. We are very pleased to continue this relationship with a worldwide leader in resist technology, ensuring a boost for the IMAGINE program and reinforcing the semiconductor industry's commitment to introduce ML2 in manufacturing."

####

About CEA-Leti
CEA is a French research and technology public organization, with activities in four main areas: energy, information technologies, healthcare technologies and defence and security. Within CEA, the Laboratory for Electronics & Information Technology (CEA-Leti) works with companies in order to increase their competitiveness through technological innovation and transfers. CEA-Leti is focused on micro and nanotechnologies and their applications, from wireless devices and systems, to biology and healthcare or photonics. Nanoelectronics and microsystems (MEMS) are at the core of its activities. As a major player in MINATEC campus, CEA-Leti operates 8,000-m² state-of-the-art clean rooms, on 24/7 mode, on 200mm and 300mm wafer standards. With 1,200 employees, CEA-Leti trains more than 150 Ph.D. students and hosts 200 assignees from partner companies. Strongly committed to the creation of value for the industry, CEA-Leti puts a strong emphasis on intellectual property and owns more than 1,500 patent families.

About TOK
TOK is a world’s leading supplier of photoresists inevitably required for semiconductor and flat panel display. TOK has always been at the forefront of the leading edge microprocessing technologies based on photolithography as its core technology. And TOK also expands its business, applying the microprocessing technologies developed in semiconductor manufacturing into the fields such as LCD display, semiconductor packaging and other related sectors.

In addition to the above, as proposing new fields with innovative fabrication technologies, TOK is vigorously developing the Through Silicon Via (TSV) system which connects between the frontend and backend process in semiconductor manufacturing as well as deploying materials applied for solar cells paid a lot of attention as an energy resource.

Additional information about TOK is available at www.tok.co.jp/en/

For more information, please click here

Contacts:
TOK Contact:
Tomoyuki Yazawa
Phone +31 33 454 3527


Takeyuki Yokoyama
Phone +31 33 450 6028


CEA-Leti Contacts:
Serge Tedesco
Phone: +33 4 38 78 49 89


Agency
Amélie Ravier
Phone: +33 1 58 18 59 30

Copyright © CEA-Leti

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Nanoscale worms provide new route to nano-necklace structures March 29th, 2015

Solving molybdenum disulfide's 'thin' problem: Research team increases material's light emission by twelve times March 29th, 2015

A first glimpse inside a macroscopic quantum state March 28th, 2015

DFG to Establish One Clinical Research Unit and Five Research Units: New Projects to Investigate Complications in Pregnancy, Particle Physics, Nanoparticles, Implants and Transport Planning / Approximately 13 Million Euros in Funding for an Initial Three-Year Period March 28th, 2015

Chip Technology

State-of-the-art online system unveiled to pinpoint metrology software accuracy March 27th, 2015

SUNY POLY CNSE to Host First Ever Northeast Semi Supply Conference (NESCO) Conference Will Connect New and Emerging Innovators in the Northeastern US and Canada with Industry Leaders and Strategic Investors to Discuss Future Growth Opportunities in NYS March 25th, 2015

NXP and GLOBALFOUNDRIES Announce Production of 40nm Embedded Non-Volatile Memory Technology: Co-developed technology to leverage GLOBALFOUNDRIES 40nm process technology platform March 24th, 2015

Building shape inspires new material discovery March 24th, 2015

Nanoelectronics

SUNY POLY CNSE to Host First Ever Northeast Semi Supply Conference (NESCO) Conference Will Connect New and Emerging Innovators in the Northeastern US and Canada with Industry Leaders and Strategic Investors to Discuss Future Growth Opportunities in NYS March 25th, 2015

UW scientists build a nanolaser using a single atomic sheet March 24th, 2015

Iranian Researchers Present Model to Determine Dynamic Behavior of Nanostructures March 24th, 2015

Sharper nanoscopy: What happens when a quantum dot looks in a mirror? March 19th, 2015

Announcements

Nanoscale worms provide new route to nano-necklace structures March 29th, 2015

Solving molybdenum disulfide's 'thin' problem: Research team increases material's light emission by twelve times March 29th, 2015

A first glimpse inside a macroscopic quantum state March 28th, 2015

DFG to Establish One Clinical Research Unit and Five Research Units: New Projects to Investigate Complications in Pregnancy, Particle Physics, Nanoparticles, Implants and Transport Planning / Approximately 13 Million Euros in Funding for an Initial Three-Year Period March 28th, 2015

Alliances/Partnerships/Distributorships

NXP and GLOBALFOUNDRIES Announce Production of 40nm Embedded Non-Volatile Memory Technology: Co-developed technology to leverage GLOBALFOUNDRIES 40nm process technology platform March 24th, 2015

Young NTU Singapore spin-off clinches S$4.3 million joint venture with Chinese commercial giant March 23rd, 2015

Halas, Nordlander awarded Optical Society's R.W. Wood Prize: Rice University researchers recognized for pioneering nanophotonics March 21st, 2015

EU Funded PCATDES Project has completed its half-period with success March 19th, 2015

Research partnerships

SUNY Poly & M+W Make Major Announcement: Major Expansion To Include M+W Owned Gehrlicher Solar America Corporation That Will Create up to 400 Jobs to Develop Solar Power Plants at SUNY Poly Sites Across New York State March 26th, 2015

ORNL-led team demonstrates desalination with nanoporous graphene membrane March 25th, 2015

New kind of 'tandem' solar cell developed: Researchers combine 2 types of photovoltaic material to make a cell that harnesses more sunlight March 24th, 2015

UW scientists build a nanolaser using a single atomic sheet March 24th, 2015

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More










ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2015 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE