Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > Press > TOK Joins CEA-Leti IMAGINE Program to Develop Multiple E-Beam Lithography Sub-20nm Resists and Processes

Abstract:
TOK and CEA-Leti today announced that TOK will join the new industry/research multi-partner program IMAGINE that is developing maskless lithography for IC manufacturing.

TOK Joins CEA-Leti IMAGINE Program to Develop Multiple E-Beam Lithography Sub-20nm Resists and Processes

Kawasaki, Japan | Posted on January 17th, 2011

The three-year project is led by CEA-Leti, a research center committed to creating and commercializing innovation in micro- and nanotechnologies, and also includes semiconductor manufacturers TSMC and STMicroelectronics. It is evaluating a maskless lithography infrastructure and the use of MAPPER Lithography tools for high throughput. The multiple e-beam-lithography program covers a global approach to the technology, including tool assessment, patterning and process integration, data handling, prototyping and cost analysis.

"TOK's material development beyond the 20nm node covers a broad range of technology- platform and lithography-process candidates, such as EUVL, ML2, and DSA. The IMAGINE program at CEA-Leti, which focuses on multiple e-beam lithography, is a very attractive program especially for understanding the fundamental RLS (resolution, line edge roughness and sensitivity) issue in photoresist development," said Kazufumi Sato, TOK R&D general manager. "TOK will contribute to the program by providing a materials perspective based on our deep knowledge of the electron-beam resist and recent discoveries from the EUV resist development."

"The development of new chemically amplified resist platforms achieving resolution below 20nm with a line-edge roughness in the nanometer range is one of the main challenges for next-generation lithography," said Serge Tedesco, CEA-Leti program manager. "We have already built a long and fruitful collaboration with TOK by working together at the introduction of e-beam lithography at the STMicroelectronics Crolles Line. We are very pleased to continue this relationship with a worldwide leader in resist technology, ensuring a boost for the IMAGINE program and reinforcing the semiconductor industry's commitment to introduce ML2 in manufacturing."

####

About CEA-Leti
CEA is a French research and technology public organization, with activities in four main areas: energy, information technologies, healthcare technologies and defence and security. Within CEA, the Laboratory for Electronics & Information Technology (CEA-Leti) works with companies in order to increase their competitiveness through technological innovation and transfers. CEA-Leti is focused on micro and nanotechnologies and their applications, from wireless devices and systems, to biology and healthcare or photonics. Nanoelectronics and microsystems (MEMS) are at the core of its activities. As a major player in MINATEC campus, CEA-Leti operates 8,000-m² state-of-the-art clean rooms, on 24/7 mode, on 200mm and 300mm wafer standards. With 1,200 employees, CEA-Leti trains more than 150 Ph.D. students and hosts 200 assignees from partner companies. Strongly committed to the creation of value for the industry, CEA-Leti puts a strong emphasis on intellectual property and owns more than 1,500 patent families.

About TOK
TOK is a world’s leading supplier of photoresists inevitably required for semiconductor and flat panel display. TOK has always been at the forefront of the leading edge microprocessing technologies based on photolithography as its core technology. And TOK also expands its business, applying the microprocessing technologies developed in semiconductor manufacturing into the fields such as LCD display, semiconductor packaging and other related sectors.

In addition to the above, as proposing new fields with innovative fabrication technologies, TOK is vigorously developing the Through Silicon Via (TSV) system which connects between the frontend and backend process in semiconductor manufacturing as well as deploying materials applied for solar cells paid a lot of attention as an energy resource.

Additional information about TOK is available at www.tok.co.jp/en/

For more information, please click here

Contacts:
TOK Contact:
Tomoyuki Yazawa
Phone +31 33 454 3527


Takeyuki Yokoyama
Phone +31 33 450 6028


CEA-Leti Contacts:
Serge Tedesco
Phone: +33 4 38 78 49 89


Agency
Amélie Ravier
Phone: +33 1 58 18 59 30

Copyright © CEA-Leti

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

ICN2 researchers compute unprecedented values for spin lifetime anisotropy in graphene November 17th, 2017

Math gets real in strong, lightweight structures: Rice University researchers use 3-D printers to turn century-old theory into complex schwarzites November 16th, 2017

The stacked color sensor: True colors meet minimization November 16th, 2017

Nanometrics to Participate in the 6th Annual NYC Investor Summit 2017 November 16th, 2017

Chip Technology

ICN2 researchers compute unprecedented values for spin lifetime anisotropy in graphene November 17th, 2017

Nanometrics to Participate in the 6th Annual NYC Investor Summit 2017 November 16th, 2017

GLOBALFOUNDRIES Demonstrates Industry-Leading 112G Technology for Next-Generation Connectivity Solutions: High bandwidth, low power SerDes IP portfolio enables ‘connected intelligence’ in data centers and networking applications November 15th, 2017

Nanometrics Announces $50 Million Share Repurchase Program November 15th, 2017

Nanoelectronics

GLOBALFOUNDRIES, Fudan Team to Deliver Next Generation Dual Interface Smart Card November 14th, 2017

Leti Will Present 11 Papers and Host More-than-Moore Technologies Workshop November 14th, 2017

The next generation of power electronics? Gallium nitride doped with beryllium: How to cut down energy loss in power electronics? The right kind of doping November 9th, 2017

Researchers bring optical communication onto silicon chips: Ultrathin films of a semiconductor that emits and detects light can be stacked on top of silicon wafers October 23rd, 2017

Announcements

ICN2 researchers compute unprecedented values for spin lifetime anisotropy in graphene November 17th, 2017

Math gets real in strong, lightweight structures: Rice University researchers use 3-D printers to turn century-old theory into complex schwarzites November 16th, 2017

The stacked color sensor: True colors meet minimization November 16th, 2017

Nanometrics to Participate in the 6th Annual NYC Investor Summit 2017 November 16th, 2017

Alliances/Trade associations/Partnerships/Distributorships

EC Project Aims at Creating and Commercializing Cyber-Physical-System Solutions November 14th, 2017

GLOBALFOUNDRIES, Fudan Team to Deliver Next Generation Dual Interface Smart Card November 14th, 2017

Leti Coordinating Project to Develop Innovative Drivetrains for 3rd-generation Electric Vehicles: CEA Tech’s Contribution Includes Liten’s Knowhow in Magnetic Materials and Simulation And Leti’s Expertise in Wide-bandgap Semiconductors October 20th, 2017

More 22 of 59,885 Print all In new window Leti to Present Update of CoolCube/3DVLSI Technologies Development at 2017 IEEE S3S: Future Developments and Tape-Out Vehicles to Be Presented during Oct. 17 Workshop October 12th, 2017

Research partnerships

EC Project Aims at Creating and Commercializing Cyber-Physical-System Solutions November 14th, 2017

Leti Joins DARPA-Funded Project to Develop Implantable Device for Restoring Vision November 9th, 2017

Nanoshells could deliver more chemo with fewer side effects: In vitro study verifies method for remotely triggering release of cancer drugs November 8th, 2017

Ames Laboratory, UConn discover superconductor with bounce October 25th, 2017

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project