Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > Press > TOK Joins CEA-Leti IMAGINE Program to Develop Multiple E-Beam Lithography Sub-20nm Resists and Processes

Abstract:
TOK and CEA-Leti today announced that TOK will join the new industry/research multi-partner program IMAGINE that is developing maskless lithography for IC manufacturing.

TOK Joins CEA-Leti IMAGINE Program to Develop Multiple E-Beam Lithography Sub-20nm Resists and Processes

Kawasaki, Japan | Posted on January 17th, 2011

The three-year project is led by CEA-Leti, a research center committed to creating and commercializing innovation in micro- and nanotechnologies, and also includes semiconductor manufacturers TSMC and STMicroelectronics. It is evaluating a maskless lithography infrastructure and the use of MAPPER Lithography tools for high throughput. The multiple e-beam-lithography program covers a global approach to the technology, including tool assessment, patterning and process integration, data handling, prototyping and cost analysis.

"TOK's material development beyond the 20nm node covers a broad range of technology- platform and lithography-process candidates, such as EUVL, ML2, and DSA. The IMAGINE program at CEA-Leti, which focuses on multiple e-beam lithography, is a very attractive program especially for understanding the fundamental RLS (resolution, line edge roughness and sensitivity) issue in photoresist development," said Kazufumi Sato, TOK R&D general manager. "TOK will contribute to the program by providing a materials perspective based on our deep knowledge of the electron-beam resist and recent discoveries from the EUV resist development."

"The development of new chemically amplified resist platforms achieving resolution below 20nm with a line-edge roughness in the nanometer range is one of the main challenges for next-generation lithography," said Serge Tedesco, CEA-Leti program manager. "We have already built a long and fruitful collaboration with TOK by working together at the introduction of e-beam lithography at the STMicroelectronics Crolles Line. We are very pleased to continue this relationship with a worldwide leader in resist technology, ensuring a boost for the IMAGINE program and reinforcing the semiconductor industry's commitment to introduce ML2 in manufacturing."

####

About CEA-Leti
CEA is a French research and technology public organization, with activities in four main areas: energy, information technologies, healthcare technologies and defence and security. Within CEA, the Laboratory for Electronics & Information Technology (CEA-Leti) works with companies in order to increase their competitiveness through technological innovation and transfers. CEA-Leti is focused on micro and nanotechnologies and their applications, from wireless devices and systems, to biology and healthcare or photonics. Nanoelectronics and microsystems (MEMS) are at the core of its activities. As a major player in MINATEC campus, CEA-Leti operates 8,000-m² state-of-the-art clean rooms, on 24/7 mode, on 200mm and 300mm wafer standards. With 1,200 employees, CEA-Leti trains more than 150 Ph.D. students and hosts 200 assignees from partner companies. Strongly committed to the creation of value for the industry, CEA-Leti puts a strong emphasis on intellectual property and owns more than 1,500 patent families.

About TOK
TOK is a world’s leading supplier of photoresists inevitably required for semiconductor and flat panel display. TOK has always been at the forefront of the leading edge microprocessing technologies based on photolithography as its core technology. And TOK also expands its business, applying the microprocessing technologies developed in semiconductor manufacturing into the fields such as LCD display, semiconductor packaging and other related sectors.

In addition to the above, as proposing new fields with innovative fabrication technologies, TOK is vigorously developing the Through Silicon Via (TSV) system which connects between the frontend and backend process in semiconductor manufacturing as well as deploying materials applied for solar cells paid a lot of attention as an energy resource.

Additional information about TOK is available at www.tok.co.jp/en/

For more information, please click here

Contacts:
TOK Contact:
Tomoyuki Yazawa
Phone +31 33 454 3527


Takeyuki Yokoyama
Phone +31 33 450 6028


CEA-Leti Contacts:
Serge Tedesco
Phone: +33 4 38 78 49 89


Agency
Amélie Ravier
Phone: +33 1 58 18 59 30

Copyright © CEA-Leti

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Thanks for the memory: NIST takes a deep look at memristors January 20th, 2018

New Method Uses DNA, Nanoparticles and Top-Down Lithography to Make Optically Active Structures: Technique could lead to new classes of materials that can bend light, such as for those used in cloaking devices January 18th, 2018

Arrowhead Pharmaceuticals Announces Pricing of Underwritten Public Offering of Common Stock January 18th, 2018

Leti to Demo New Curving Technology at Photonics West that Improves Performance of Optical Components January 18th, 2018

Chip Technology

Thanks for the memory: NIST takes a deep look at memristors January 20th, 2018

Leti to Demo New Curving Technology at Photonics West that Improves Performance of Optical Components January 18th, 2018

Ultra-thin memory storage device paves way for more powerful computing January 17th, 2018

'Gyroscope' molecules form crystal that's both solid and full of motion: New type of molecular machine designed by UCLA researchers could have wide-ranging applications in technology and science January 16th, 2018

Nanoelectronics

Viewing atomic structures of dopant atoms in 3-D relating to electrical activity in a semiconductor December 28th, 2017

Electronically-smooth '3-D graphene': A bright future for trisodium bismuthide: Electronically-smooth nature of trisodium bismuthide makes it a viable alternative to graphene/h-BN December 22nd, 2017

Columbia engineers create artificial graphene in a nanofabricated semiconductor structure: Researchers are the first to observe the electronic structure of graphene in an engineered semiconductor; finding could lead to progress in advanced optoelectronics and data processing December 13th, 2017

GLOBALFOUNDRIES, Fudan Team to Deliver Next Generation Dual Interface Smart Card November 14th, 2017

Announcements

Thanks for the memory: NIST takes a deep look at memristors January 20th, 2018

New Method Uses DNA, Nanoparticles and Top-Down Lithography to Make Optically Active Structures: Technique could lead to new classes of materials that can bend light, such as for those used in cloaking devices January 18th, 2018

Arrowhead Pharmaceuticals Announces Pricing of Underwritten Public Offering of Common Stock January 18th, 2018

Leti to Demo New Curving Technology at Photonics West that Improves Performance of Optical Components January 18th, 2018

Alliances/Trade associations/Partnerships/Distributorships

New era in high field superconducting magnets – opening new frontiers in science, nanotechnology and materials discovery January 9th, 2018

Leti Field Trials Demonstrate New Multicarrier Waveform for Rural, Maritime Broadband Radio: Field Trial in Orkney Islands Used New Filtered Multicarrier Waveform at 700MHz Band with Flexible Bandwidth Usage (Fragmented and Continuous Spectrum) December 18th, 2017

A new product to help combat mouldy walls, thanks to technology developed at the ICN2 December 14th, 2017

JPK Instruments announce partnership with Swiss company, Cytosurge AG. The partnership makes Cytosurge’s FluidFM® technology available on the JPK NanoWizard® AFM platform December 8th, 2017

Research partnerships

Ultra-thin memory storage device paves way for more powerful computing January 17th, 2018

New catalyst for hydrogen production is a step toward clean fuel: Carbon-based nanocomposite with embedded metal ions yields impressive performance as catalyst for electrolysis of water to generate hydrogen January 16th, 2018

New era in high field superconducting magnets – opening new frontiers in science, nanotechnology and materials discovery January 9th, 2018

Touchy nanotubes work better when clean: Rice, Swansea scientists show that decontaminating nanotubes can simplify nanoscale devices January 4th, 2018

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project