Nanotechnology Now







Heifer International

Wikipedia Affiliate Button


DHgate

Home > Press > Molecular Imprints Ships Semiconductor Industry-First Nanoimprint Mask Replication System to Dai Nippon Printing Co., Ltd.

Abstract:
Perfecta™ MR5000 Positioned to Support Semiconductor Volume Manufacturing with 6025 Form Factor Nanoimprint Mask

Molecular Imprints Ships Semiconductor Industry-First Nanoimprint Mask Replication System to Dai Nippon Printing Co., Ltd.

Austin, TX | Posted on January 13th, 2011

Molecular Imprints, Inc., the market and technology leader for nanoimprint lithography systems and solutions, today introduced the Perfecta MR5000 — its new Jet and Flash™ Imprint Lithography (J-FIL™) imprint mask replication platform for the semiconductor industry. Representing the industry's first nanopatterning system specifically designed to replicate 6025 imprint masks, the Perfecta MR5000 enables multiple identical replica masks to be fabricated from a single e-beam master, substantially reducing mask costs, an important component in delivering low cost of ownership for imprint's use in advanced non-volatile memory architectures.

Molecular Imprints is also pleased to announce that Dai Nippon Printing Co., Ltd. (DNP), the leading merchant supplier of masks to the semiconductor industry, has taken delivery of the first MR5000 system, furthering the close and continuing collaboration between the two companies in the development of nanoimprint masks for semiconductor manufacturing at 2Xnm and beyond.

"A viable low-cost patterning technology will be an essential enabler in producing next generations of solid state memories cost effectively, particularly given the lithography intensive architectures in advanced memory devices such as 3D memory," stated Mark Melliar-Smith, CEO of Molecular Imprints. "Semiconductor manufacturers are already leveraging the high-fidelity patterning performance of our J-FIL technology in their development programs. The ability of the Perfecta MR5000 to deliver leading-edge, high quality imprint masks puts in place key infrastructure components necessary for nanoimprint's manufacturing adoption."

"Our purchase of the Perfecta MR5000 reflects DNP's continued technical leadership and commitment to serve the semiconductor industry with advanced photomask solutions," according to Jun-Ichi Tsuchiya, General Manager of Electronic Device Operations at DNP. "We will be using this system to develop the mask replication process to provide replicas to our nanoimprint lithography customers and partners in 2011."

Perfecta MR5000 represents a significant advancement in nanopatterning technology. Taking e-beam written leading-edge 6025 "master" masks, the system is capable of transferring the patterns flawlessly onto 6025 replicas that can be accepted by a manufacturing wafer imprint lithography system. Featuring the company's enhanced IntelliJet™ Drop Pattern Generator technology, the Perfecta MR5000 dispenses picoliter resist droplets mapped to local feature density, enabling excellent residual layer thickness (RLT) uniformity for pattern transfer fidelity of 2Xnm features, while virtually eliminating the need for resist waste disposal. By generating multiple "replica" masks from a single "master," mask cost of ownership can be significantly reduced and contribute to an overall low cost-of-ownership for the wafer lithography process.

"Our customers and industry partners continue to invest in nanoimprint technology as an alternative to the increasingly expensive and complex vision presented by optical patterning," added Melliar-Smith. "Momentum continues to grow and the Perfecta MR5000 represents a critical step forward in building the infrastructure to deliver nanoimprint and J-FIL as a manufacturing solution for semiconductor memory applications."

####

About Molecular Imprints
Molecular Imprints, Inc. (MII) is the technology leader for high-resolution, low cost-of-ownership nanoimprint lithography systems. MII is leveraging its innovative Jet and Flash™ Imprint Lithography (J-FIL™) technology with IntelliJet™ material application to become the worldwide market and technology leader in high-volume patterning solutions for storage and memory devices, while enabling emerging markets in clean energy, biotechnology, and other industries. MII enables nanoscale patterning by delivering a comprehensive nanopatterning solution that is affordable, compatible and extendible to sub-10-nanometer resolution levels.

For more information, please click here

Contacts:
Corporate PR Contact
Paul Hofemann
Molecular Imprints, Inc.
1-512-339-7760 X311

Copyright © Molecular Imprints

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

How to maximize the superconducting critical temperature in a molecular superconductor: International team led by Tohoku University opens new route for discovering high Tc superconductors April 19th, 2015

Engineer improves rechargeable batteries with MoS2 nano 'sandwich' April 18th, 2015

Nanocomposites Play Effective Role in Production of Smart Fibers April 18th, 2015

Dais Analytic Corporation Appoints Eliza Wang to Board of Directors: Company's Newest Director Brings Expertise in Commercial and Legal Matters Both in the United States and China; Joins on the Heels of Successful Business Development Trade Mission to China April 18th, 2015

Chip Technology

Nanotubes with two walls have singular qualities: Rice University lab calculates unique electronic qualities of double-walled carbon nanotubes April 16th, 2015

Graphenea embarks on a new era April 16th, 2015

Quantization of 'surface Dirac states' could lead to exotic applications April 15th, 2015

Study shows novel pattern of electrical charge movement through DNA April 14th, 2015

Memory Technology

DWI scientists program the lifetime of self-assembled nanostructures April 9th, 2015

Computers that mimic the function of the brain: A new step forward in memristor technology could bring us closer to brain-like computing April 6th, 2015

Mind the gap: Nanoscale speed bump could regulate plasmons for high-speed data flow April 1st, 2015

Next important step toward quantum computer: Scientists at the University of Bonn have succeeded in linking 2 different quantum systems March 30th, 2015

Nanoelectronics

Nanotubes with two walls have singular qualities: Rice University lab calculates unique electronic qualities of double-walled carbon nanotubes April 16th, 2015

Solution-grown nanowires make the best lasers April 14th, 2015

Water makes wires even more nano: Rice University lab extends meniscus-mask process to make sub-10 nanometer paths April 6th, 2015

Demonstration of 50GHz Ge Waveguide Electro-Absorption Modulator April 2nd, 2015

Announcements

How to maximize the superconducting critical temperature in a molecular superconductor: International team led by Tohoku University opens new route for discovering high Tc superconductors April 19th, 2015

Iranian Foodstuff, Agricultural Industries Welcome Nanotechnology Packaging Bags April 18th, 2015

Nanocomposites Play Effective Role in Production of Smart Fibers April 18th, 2015

Dais Analytic Corporation Appoints Eliza Wang to Board of Directors: Company's Newest Director Brings Expertise in Commercial and Legal Matters Both in the United States and China; Joins on the Heels of Successful Business Development Trade Mission to China April 18th, 2015

Tools

Oxford Instruments commissions high field outsert magnet system for the National High Magnetic Field Laboratory 32 Tesla magnet program April 17th, 2015

Lanthanide-Organic Framework Nanothermometers Prepared by Spray-Drying April 16th, 2015

Combined effort for structural determination April 15th, 2015

Deben reports on the research of Dr Sunita Ho from UCSF using a CCT500 tensile stage to study the behaviour of dental materials April 14th, 2015

New-Contracts/Sales/Customers

Oxford Instruments commissions high field outsert magnet system for the National High Magnetic Field Laboratory 32 Tesla magnet program April 17th, 2015

JPK reports on the use of the NanoWizard® 3 AFM system at the Hebrew University of Jerusalem April 14th, 2015

Deben reports on the research of Dr Sunita Ho from UCSF using a CCT500 tensile stage to study the behaviour of dental materials April 14th, 2015

UK National Graphene Institute Selects Bruker as Official Partner: World-Leading Graphene Research Facility Purchases Multiple Bruker AFMs April 7th, 2015

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More










ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2015 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE