Nanotechnology Now

Our NanoNews Digest Sponsors



Heifer International

Wikipedia Affiliate Button


android tablet pc

Home > Press > Molecular Imprints Ships Semiconductor Industry-First Nanoimprint Mask Replication System to Dai Nippon Printing Co., Ltd.

Abstract:
Perfecta™ MR5000 Positioned to Support Semiconductor Volume Manufacturing with 6025 Form Factor Nanoimprint Mask

Molecular Imprints Ships Semiconductor Industry-First Nanoimprint Mask Replication System to Dai Nippon Printing Co., Ltd.

Austin, TX | Posted on January 13th, 2011

Molecular Imprints, Inc., the market and technology leader for nanoimprint lithography systems and solutions, today introduced the Perfecta MR5000 — its new Jet and Flash™ Imprint Lithography (J-FIL™) imprint mask replication platform for the semiconductor industry. Representing the industry's first nanopatterning system specifically designed to replicate 6025 imprint masks, the Perfecta MR5000 enables multiple identical replica masks to be fabricated from a single e-beam master, substantially reducing mask costs, an important component in delivering low cost of ownership for imprint's use in advanced non-volatile memory architectures.

Molecular Imprints is also pleased to announce that Dai Nippon Printing Co., Ltd. (DNP), the leading merchant supplier of masks to the semiconductor industry, has taken delivery of the first MR5000 system, furthering the close and continuing collaboration between the two companies in the development of nanoimprint masks for semiconductor manufacturing at 2Xnm and beyond.

"A viable low-cost patterning technology will be an essential enabler in producing next generations of solid state memories cost effectively, particularly given the lithography intensive architectures in advanced memory devices such as 3D memory," stated Mark Melliar-Smith, CEO of Molecular Imprints. "Semiconductor manufacturers are already leveraging the high-fidelity patterning performance of our J-FIL technology in their development programs. The ability of the Perfecta MR5000 to deliver leading-edge, high quality imprint masks puts in place key infrastructure components necessary for nanoimprint's manufacturing adoption."

"Our purchase of the Perfecta MR5000 reflects DNP's continued technical leadership and commitment to serve the semiconductor industry with advanced photomask solutions," according to Jun-Ichi Tsuchiya, General Manager of Electronic Device Operations at DNP. "We will be using this system to develop the mask replication process to provide replicas to our nanoimprint lithography customers and partners in 2011."

Perfecta MR5000 represents a significant advancement in nanopatterning technology. Taking e-beam written leading-edge 6025 "master" masks, the system is capable of transferring the patterns flawlessly onto 6025 replicas that can be accepted by a manufacturing wafer imprint lithography system. Featuring the company's enhanced IntelliJet™ Drop Pattern Generator technology, the Perfecta MR5000 dispenses picoliter resist droplets mapped to local feature density, enabling excellent residual layer thickness (RLT) uniformity for pattern transfer fidelity of 2Xnm features, while virtually eliminating the need for resist waste disposal. By generating multiple "replica" masks from a single "master," mask cost of ownership can be significantly reduced and contribute to an overall low cost-of-ownership for the wafer lithography process.

"Our customers and industry partners continue to invest in nanoimprint technology as an alternative to the increasingly expensive and complex vision presented by optical patterning," added Melliar-Smith. "Momentum continues to grow and the Perfecta MR5000 represents a critical step forward in building the infrastructure to deliver nanoimprint and J-FIL as a manufacturing solution for semiconductor memory applications."

####

About Molecular Imprints
Molecular Imprints, Inc. (MII) is the technology leader for high-resolution, low cost-of-ownership nanoimprint lithography systems. MII is leveraging its innovative Jet and Flash™ Imprint Lithography (J-FIL™) technology with IntelliJet™ material application to become the worldwide market and technology leader in high-volume patterning solutions for storage and memory devices, while enabling emerging markets in clean energy, biotechnology, and other industries. MII enables nanoscale patterning by delivering a comprehensive nanopatterning solution that is affordable, compatible and extendible to sub-10-nanometer resolution levels.

For more information, please click here

Contacts:
Corporate PR Contact
Paul Hofemann
Molecular Imprints, Inc.
1-512-339-7760 X311

Copyright © Molecular Imprints

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

NREL Announces New Center Directors to lead R&D, Analysis Efforts September 30th, 2014

Yale University and Leica Microsystems Partner to Establish Microscopy Center of Excellence: Yale Welcomes Scientists to Participate in Core Facility Opening and Super- Resolution Workshops October 20 Through 31, 2014 September 30th, 2014

Speed at its limits September 30th, 2014

Research mimics brain cells to boost memory power September 30th, 2014

Chip Technology

Speed at its limits September 30th, 2014

Research mimics brain cells to boost memory power September 30th, 2014

'Pixel' engineered electronics have growth potential: Rice, Oak Ridge, Vanderbilt, Penn scientists lead creation of atom-scale semiconducting composites September 29th, 2014

Future flexible electronics based on carbon nanotubes: Study in Applied Physics Letters show how to improve nanotube transistor and circuit performance with fluoropolymers September 23rd, 2014

Memory Technology

Research mimics brain cells to boost memory power September 30th, 2014

SouthWest NanoTechnologies (SWeNT) Receives NIST Small Business Innovation Research (SBIR) Phase 1 Award to Produce Greater than 99% Semiconducting Single-Wall Carbon Nanotubes September 19th, 2014

IEEE International Electron Devices Meeting To Celebrate 60th Anniversary as The Leading Technical Conference for Advanced Semiconductor Devices September 18th, 2014

Promising Ferroelectric Materials Suffer From Unexpected Electric Polarizations: Brookhaven Lab scientists find surprising locked charge polarizations that impede performance in next-gen materials that could otherwise revolutionize data-driven devices August 18th, 2014

Nanoelectronics

Grenoble Hosting SEMICON Europa Oct. 7-9, First Time Event Held in France: Leti’s 90-square-meter Booth Will Feature Portable Showroom To Demonstrate New Technology Innovations September 24th, 2014

SouthWest NanoTechnologies (SWeNT) Receives NIST Small Business Innovation Research (SBIR) Phase 1 Award to Produce Greater than 99% Semiconducting Single-Wall Carbon Nanotubes September 19th, 2014

Rice rolls 'neat' nanotube fibers: Rice University researchers' acid-free approach leads to strong conductive carbon threads September 15th, 2014

Excitonic Dark States Shed Light on TMDC Atomic Layers: Berkeley Lab Discovery Holds Promise for Nanoelectronic and Photonic Applications September 11th, 2014

Announcements

Park Systems Announces Outsourced Analytical Services Including AFM Surface Imaging, Data Analysis and Interpretation September 30th, 2014

Ad-REIC vaccine: A magic bullet for cancer treatment September 30th, 2014

New Topical Hemostatic Agent: Neutral Self-Assembling Peptide Hydrogel September 30th, 2014

Chemical interactions between silver nanoparticles and thiols: A comparison of mercaptohexanol again September 30th, 2014

Tools

Yale University and Leica Microsystems Partner to Establish Microscopy Center of Excellence: Yale Welcomes Scientists to Participate in Core Facility Opening and Super- Resolution Workshops October 20 Through 31, 2014 September 30th, 2014

Park Systems Announces Outsourced Analytical Services Including AFM Surface Imaging, Data Analysis and Interpretation September 30th, 2014

Iranian Scientists Determine Grain Size, Minimize Time of Nanocomposite Synthesis September 29th, 2014

Oxford Instruments launches 3rd annual Indian nanotechnology seminars in Kolkata and Delhi - sharing expertise with Nanotechnology researchers in India September 25th, 2014

New-Contracts/Sales/Customers

Fullerex: Talga Resources Joins INSCX™ Exchange September 4th, 2014

Global Energy Systems Signs Master Sales Agreement with China Aviation Supplies Group September 4th, 2014

East China University of Science and Technology Purchases Nanonex Advanced Nanoimprint Tool NX-B200 July 30th, 2014

University of Manchester selects Anasys AFM-IR for coatings and corrosion research July 30th, 2014

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More














ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2014 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE