Nanotechnology Now

Our NanoNews Digest Sponsors





Heifer International

Wikipedia Affiliate Button


android tablet pc

Home > Press > Molecular Imprints Ships Semiconductor Industry-First Nanoimprint Mask Replication System to Dai Nippon Printing Co., Ltd.

Abstract:
Perfecta™ MR5000 Positioned to Support Semiconductor Volume Manufacturing with 6025 Form Factor Nanoimprint Mask

Molecular Imprints Ships Semiconductor Industry-First Nanoimprint Mask Replication System to Dai Nippon Printing Co., Ltd.

Austin, TX | Posted on January 13th, 2011

Molecular Imprints, Inc., the market and technology leader for nanoimprint lithography systems and solutions, today introduced the Perfecta MR5000 — its new Jet and Flash™ Imprint Lithography (J-FIL™) imprint mask replication platform for the semiconductor industry. Representing the industry's first nanopatterning system specifically designed to replicate 6025 imprint masks, the Perfecta MR5000 enables multiple identical replica masks to be fabricated from a single e-beam master, substantially reducing mask costs, an important component in delivering low cost of ownership for imprint's use in advanced non-volatile memory architectures.

Molecular Imprints is also pleased to announce that Dai Nippon Printing Co., Ltd. (DNP), the leading merchant supplier of masks to the semiconductor industry, has taken delivery of the first MR5000 system, furthering the close and continuing collaboration between the two companies in the development of nanoimprint masks for semiconductor manufacturing at 2Xnm and beyond.

"A viable low-cost patterning technology will be an essential enabler in producing next generations of solid state memories cost effectively, particularly given the lithography intensive architectures in advanced memory devices such as 3D memory," stated Mark Melliar-Smith, CEO of Molecular Imprints. "Semiconductor manufacturers are already leveraging the high-fidelity patterning performance of our J-FIL technology in their development programs. The ability of the Perfecta MR5000 to deliver leading-edge, high quality imprint masks puts in place key infrastructure components necessary for nanoimprint's manufacturing adoption."

"Our purchase of the Perfecta MR5000 reflects DNP's continued technical leadership and commitment to serve the semiconductor industry with advanced photomask solutions," according to Jun-Ichi Tsuchiya, General Manager of Electronic Device Operations at DNP. "We will be using this system to develop the mask replication process to provide replicas to our nanoimprint lithography customers and partners in 2011."

Perfecta MR5000 represents a significant advancement in nanopatterning technology. Taking e-beam written leading-edge 6025 "master" masks, the system is capable of transferring the patterns flawlessly onto 6025 replicas that can be accepted by a manufacturing wafer imprint lithography system. Featuring the company's enhanced IntelliJet™ Drop Pattern Generator technology, the Perfecta MR5000 dispenses picoliter resist droplets mapped to local feature density, enabling excellent residual layer thickness (RLT) uniformity for pattern transfer fidelity of 2Xnm features, while virtually eliminating the need for resist waste disposal. By generating multiple "replica" masks from a single "master," mask cost of ownership can be significantly reduced and contribute to an overall low cost-of-ownership for the wafer lithography process.

"Our customers and industry partners continue to invest in nanoimprint technology as an alternative to the increasingly expensive and complex vision presented by optical patterning," added Melliar-Smith. "Momentum continues to grow and the Perfecta MR5000 represents a critical step forward in building the infrastructure to deliver nanoimprint and J-FIL as a manufacturing solution for semiconductor memory applications."

####

About Molecular Imprints
Molecular Imprints, Inc. (MII) is the technology leader for high-resolution, low cost-of-ownership nanoimprint lithography systems. MII is leveraging its innovative Jet and Flash™ Imprint Lithography (J-FIL™) technology with IntelliJet™ material application to become the worldwide market and technology leader in high-volume patterning solutions for storage and memory devices, while enabling emerging markets in clean energy, biotechnology, and other industries. MII enables nanoscale patterning by delivering a comprehensive nanopatterning solution that is affordable, compatible and extendible to sub-10-nanometer resolution levels.

For more information, please click here

Contacts:
Corporate PR Contact
Paul Hofemann
Molecular Imprints, Inc.
1-512-339-7760 X311

Copyright © Molecular Imprints

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Haydale and Goodfellow Announce Major Distribution Agreement for Functionalised Graphene Materials July 21st, 2014

Relaunch of the Nanoscribe Website New design, optimized research, and impressive gallery of applications July 21st, 2014

Dongbu HiTek Unveils Low-Voltage BCDMOS Process for Efficient Power Management in Smart Phones and Tablet Computers July 21st, 2014

Iran to Host 1st Asian Congress on Nanostructures on Kish Island July 21st, 2014

Chip Technology

Dongbu HiTek Unveils Low-Voltage BCDMOS Process for Efficient Power Management in Smart Phones and Tablet Computers July 21st, 2014

Oregon chemists eye improved thin films with metal substitution: Solution-based inorganic process could drive more efficient electronics and solar devices July 21st, 2014

Carbyne morphs when stretched: Rice University calculations show carbon-atom chain would go metal to semiconductor July 21st, 2014

Martini Tech Inc. becomes the exclusive distributor for Yoshioka Seiko Co. porous chucks for Europe and North America July 20th, 2014

Memory Technology

Rice's silicon oxide memories catch manufacturers' eye: Use of porous silicon oxide reduces forming voltage, improves manufacturability July 10th, 2014

University of Illinois study advances limits for ultrafast nano-devices July 10th, 2014

Leti to Present Technological Platforms Targeting Industry’s Needs for the Future at Semicon West Workshop: Presentation at STS Session to Focus on Leti Advanced Lithography Programs for 1x Nodes and on Silicon Photonics at TechXPot June 25th, 2014

6TH CEA-LETI WORKSHOP ON INNOVATIVE MEMORY TECHNOLOGIES includes invited talks by Infineon, IBM, Schlumberger, Thales, Cisco and STMicroelectronics: June 24 Event to Explore NVM Application Horizons from Automotive to Oil & Gas: Responses from Innovative Technologies & Design June 12th, 2014

Nanoelectronics

3-D nanostructure could benefit nanoelectronics, gas storage: Rice U. researchers predict functional advantages of 3-D boron nitride July 15th, 2014

IBM Announces $3 Billion Research Initiative to Tackle Chip Grand Challenges for Cloud and Big Data Systems: Scientists and engineers to push limits of silicon technology to 7 nanometers and below and create post-silicon future July 10th, 2014

Carbodeon enables 20 percent increase in polymer thermal filler conductivity with 0.03 wt.% nanodiamond additive at a lower cost than with traditional fillers: Improved materials and processes enable nanodiamond cost reductions of up to 70 percent for electronics and LED app July 9th, 2014

Nanotechnology that will impact the Security & Defense sectors to be discussed at NanoSD2014 conference July 8th, 2014

Announcements

Oxford Instruments Asylum Research Opens an Atomic Force Microscopy Demonstration Lab in Mumbai, India July 21st, 2014

Steam from the sun: New spongelike structure converts solar energy into steam July 21st, 2014

More than glitter: Scientists explain how gold nanoparticles easily penetrate cells, making them useful for delivering drugs July 21st, 2014

Iran to Host 1st Asian Congress on Nanostructures on Kish Island July 21st, 2014

Tools

Dongbu HiTek Unveils Low-Voltage BCDMOS Process for Efficient Power Management in Smart Phones and Tablet Computers July 21st, 2014

Oxford Instruments Asylum Research Opens an Atomic Force Microscopy Demonstration Lab in Mumbai, India July 21st, 2014

Martini Tech Inc. becomes the exclusive distributor for Yoshioka Seiko Co. porous chucks for Europe and North America July 20th, 2014

Sono-Tek Corporation Announces New Clean Room Rated Laboratory Facility in China July 18th, 2014

New-Contracts/Sales/Customers

STFC takes delivery of the 100th Hitachi Tabletop SEM in the UK July 3rd, 2014

University of Maastricht Adds Complete Correlative Workflow from FEI to its Institute of Nanoscopy June 23rd, 2014

LatticeGear Sells First LatticeAx 300 Cleaving System to X-FAB: LatticeAx 300 provides fast, accurate cross-sectioning of samples for analysis — more accurately than manual methods and faster and less expensively than automated systems June 9th, 2014

UMass Amherst Purchases Nanonex Advanced 8" NIL Tool NX-2608BA May 28th, 2014

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More














ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2014 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE