Nanotechnology Now

Our NanoNews Digest Sponsors


Heifer International

Wikipedia Affiliate Button


DHgate

Home > Press > Molecular Imprints Ships Semiconductor Industry-First Nanoimprint Mask Replication System to Dai Nippon Printing Co., Ltd.

Abstract:
Perfecta™ MR5000 Positioned to Support Semiconductor Volume Manufacturing with 6025 Form Factor Nanoimprint Mask

Molecular Imprints Ships Semiconductor Industry-First Nanoimprint Mask Replication System to Dai Nippon Printing Co., Ltd.

Austin, TX | Posted on January 13th, 2011

Molecular Imprints, Inc., the market and technology leader for nanoimprint lithography systems and solutions, today introduced the Perfecta MR5000 — its new Jet and Flash™ Imprint Lithography (J-FIL™) imprint mask replication platform for the semiconductor industry. Representing the industry's first nanopatterning system specifically designed to replicate 6025 imprint masks, the Perfecta MR5000 enables multiple identical replica masks to be fabricated from a single e-beam master, substantially reducing mask costs, an important component in delivering low cost of ownership for imprint's use in advanced non-volatile memory architectures.

Molecular Imprints is also pleased to announce that Dai Nippon Printing Co., Ltd. (DNP), the leading merchant supplier of masks to the semiconductor industry, has taken delivery of the first MR5000 system, furthering the close and continuing collaboration between the two companies in the development of nanoimprint masks for semiconductor manufacturing at 2Xnm and beyond.

"A viable low-cost patterning technology will be an essential enabler in producing next generations of solid state memories cost effectively, particularly given the lithography intensive architectures in advanced memory devices such as 3D memory," stated Mark Melliar-Smith, CEO of Molecular Imprints. "Semiconductor manufacturers are already leveraging the high-fidelity patterning performance of our J-FIL technology in their development programs. The ability of the Perfecta MR5000 to deliver leading-edge, high quality imprint masks puts in place key infrastructure components necessary for nanoimprint's manufacturing adoption."

"Our purchase of the Perfecta MR5000 reflects DNP's continued technical leadership and commitment to serve the semiconductor industry with advanced photomask solutions," according to Jun-Ichi Tsuchiya, General Manager of Electronic Device Operations at DNP. "We will be using this system to develop the mask replication process to provide replicas to our nanoimprint lithography customers and partners in 2011."

Perfecta MR5000 represents a significant advancement in nanopatterning technology. Taking e-beam written leading-edge 6025 "master" masks, the system is capable of transferring the patterns flawlessly onto 6025 replicas that can be accepted by a manufacturing wafer imprint lithography system. Featuring the company's enhanced IntelliJet™ Drop Pattern Generator technology, the Perfecta MR5000 dispenses picoliter resist droplets mapped to local feature density, enabling excellent residual layer thickness (RLT) uniformity for pattern transfer fidelity of 2Xnm features, while virtually eliminating the need for resist waste disposal. By generating multiple "replica" masks from a single "master," mask cost of ownership can be significantly reduced and contribute to an overall low cost-of-ownership for the wafer lithography process.

"Our customers and industry partners continue to invest in nanoimprint technology as an alternative to the increasingly expensive and complex vision presented by optical patterning," added Melliar-Smith. "Momentum continues to grow and the Perfecta MR5000 represents a critical step forward in building the infrastructure to deliver nanoimprint and J-FIL as a manufacturing solution for semiconductor memory applications."

####

About Molecular Imprints
Molecular Imprints, Inc. (MII) is the technology leader for high-resolution, low cost-of-ownership nanoimprint lithography systems. MII is leveraging its innovative Jet and Flash™ Imprint Lithography (J-FIL™) technology with IntelliJet™ material application to become the worldwide market and technology leader in high-volume patterning solutions for storage and memory devices, while enabling emerging markets in clean energy, biotechnology, and other industries. MII enables nanoscale patterning by delivering a comprehensive nanopatterning solution that is affordable, compatible and extendible to sub-10-nanometer resolution levels.

For more information, please click here

Contacts:
Corporate PR Contact
Paul Hofemann
Molecular Imprints, Inc.
1-512-339-7760 X311

Copyright © Molecular Imprints

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Oxford Instruments and Dresden High Magnetic Field Laboratory collaborate to develop HTS magnet technology components for high field superconducting magnet systems June 29th, 2016

Texas A&M Chemist Says Trapped Electrons To Blame For Lack Of Battery Efficiency: Forget mousetraps — today’s scientists will get the cheese if they manage to build a better battery June 28th, 2016

Building a smart cardiac patch: 'Bionic' cardiac patch could one day monitor and respond to cardiac problems June 28th, 2016

New, better way to build circuits for world's first useful quantum computers June 28th, 2016

Chip Technology

New, better way to build circuits for world's first useful quantum computers June 28th, 2016

GraphExeter illuminates bright new future for flexible lighting devices June 23rd, 2016

Soft decoupling of organic molecules on metal June 23rd, 2016

Particle zoo in a quantum computer: First experimental quantum simulation of particle physics phenomena June 23rd, 2016

Memory Technology

Ensuring the future affordability of wind turbines, computers and electric cars June 2nd, 2016

Automating DNA origami opens door to many new uses: Like 3-D printing did for larger objects, method makes it easy to build nanoparticles out of DNA May 30th, 2016

Hybrid nanoantennas -- next-generation platform for ultradense data recording April 28th, 2016

Magnetic vortices defy temperature fluctuations: Common magnetic mineral is reliable witness to Earth's history April 19th, 2016

Nanoelectronics

Soft decoupling of organic molecules on metal June 23rd, 2016

Tailored DNA shifts electrons into the 'fast lane': DNA nanowire improved by altering sequences June 22nd, 2016

Scientists engineer tunable DNA for electronics applications June 21st, 2016

Novel energy inside a microcircuit chip: VTT developed an efficient nanomaterial-based integrated energy June 10th, 2016

Announcements

Oxford Instruments and Dresden High Magnetic Field Laboratory collaborate to develop HTS magnet technology components for high field superconducting magnet systems June 29th, 2016

Texas A&M Chemist Says Trapped Electrons To Blame For Lack Of Battery Efficiency: Forget mousetraps — today’s scientists will get the cheese if they manage to build a better battery June 28th, 2016

Building a smart cardiac patch: 'Bionic' cardiac patch could one day monitor and respond to cardiac problems June 28th, 2016

New, better way to build circuits for world's first useful quantum computers June 28th, 2016

Tools

Oxford Instruments and Dresden High Magnetic Field Laboratory collaborate to develop HTS magnet technology components for high field superconducting magnet systems June 29th, 2016

Texas A&M Chemist Says Trapped Electrons To Blame For Lack Of Battery Efficiency: Forget mousetraps — today’s scientists will get the cheese if they manage to build a better battery June 28th, 2016

FEI Launches Helios G4 DualBeam Series for Materials Science: The Helios G4 DualBeam Series features new capabilities to enable scientists and engineers to answer the most demanding and challenging scientific questions June 27th, 2016

Nanoscientists develop the 'ultimate discovery tool': Rapid discovery power is similar to what gene chips offer biology June 25th, 2016

New-Contracts/Sales/Customers

Oxford Instruments and Dresden High Magnetic Field Laboratory collaborate to develop HTS magnet technology components for high field superconducting magnet systems June 29th, 2016

Nanometrics Selected for Third-Generation 3D-NAND Process Control: Atlas® Systems Extend Advanced Device Manufacturing Capability June 14th, 2016

Industrial Nanotech, Inc. Signs Agreement With and Receives First Purchase Order from Major New Customer in China June 6th, 2016

Deep Space Industries and SFL selected to provide satellites for HawkEye 360’s Pathfinder mission: The privately-funded space-based global wireless signal monitoring system will be developed by Deep Space Industries and UTIAS Space Flight Laboratory May 26th, 2016

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







Car Brands
Buy website traffic