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Nanometrics Incorporated (Nasdaq: NANO), a leading provider of advanced process control metrology systems, today announced that a major semiconductor company in Japan has ordered a complete suite of Nanometrics optical critical dimension (OCD) products in support of capacity expansion for devices at the most advanced process nodes. The order includes the Lynx™ cluster metrology platform, IMPULSE® systems for in-line OCD control and Nanometrics' proprietary NanoCD™ Suite.
"This competitive win is further evidence of the industry-leading performance of our products, the growing strength of our customer relationships, and the increasing importance of OCD technologies for advanced process control applications," commented Tim Stultz, president and chief executive officer of Nanometrics. "We are working closely with this customer in cooperative development of their technology roadmap, and expect further expansion of this relationship in 2011."
"Our IMPULSE modules, when combined with our Lynx platform and NanoCD capabilities, enable the lowest cost of ownership for in-line critical dimension and thin film metrology," commented David Doyle, vice president of the Silicon Solutions Business Unit at Nanometrics. "Through this selection of our comprehensive OCD metrology solution, including our innovative hardware platforms, proprietary data modeling and analysis software, and continued applications support, Nanometrics becomes a partner with our customer in helping to accelerate product development, increase yields and reduce manufacturing costs."
The IMPULSE is a leading solution for thin film and OCD metrology when qualified as an integrated module on OEM systems or when configured with Nanometrics' Lynx cluster metrology platform. IMPULSE systems are deployed for applications in front-end-of-line semiconductor device manufacturing processes for applications including lithography, etch, chemical mechanical polishing (CMP) and thin film deposition, providing in-line process control metrology for device geometries from 65nm down to the 2x node.
Forward Looking Statements
This press release contains forward-looking statements including, but not limited to, statements regarding the capabilities of the company's metrology products, technological leadership and expected future collaboration. Although Nanometrics believes that the expectations reflected in the forward-looking statements are reasonable, expectations regarding product capabilities and future collaboration are subject to a number of risks, including changes in customer spending plans, worldwide economic conditions and the continued technological leadership of our products. For additional information and considerations regarding the risks faced by Nanometrics, see its annual report on Form 10-K for the year ended January 2, 2010 as filed with the Securities and Exchange Commission, as well as other periodic reports filed with the SEC from time to time. Nanometrics disclaims any obligation to update information contained in any forward-looking statement.
Nanometrics is a leading provider of advanced, high-performance process control metrology systems used primarily in the fabrication of semiconductors, high-brightness LEDs, data storage devices and solar photovoltaics. Nanometrics’ automated and integrated metrology systems measure critical dimensions, device structures, overlay registration, topography and various thin film properties, including film thickness as well as optical, electrical and material properties. The company’s process control solutions are deployed throughout the fabrication process, from front-end-of-line substrate manufacturing, to high-volume production of semiconductors and other devices, to advanced wafer-scale packaging applications. Nanometrics’ systems enable device manufacturers to improve yields, increase productivity and lower their manufacturing costs. The company maintains its headquarters in Milpitas, California, with sales and service offices worldwide. Nanometrics is traded on NASDAQ Global Select Market under the symbol NANO.
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