- About Us
- Career Center
- Nano-Social Network
- Nano Consulting
- My Account
|Nanoparticle arrays on a topographically uneven surface|
Nanolithography, or surface patterning on a nanoscale, is critical for modern technology, but has been developed largely for patterning flat surfaces until recently. A team of University of Akron scientists discovered a new method for patterning curved surfaces. The technique creates patterns on curved or topographically uneven surfaces with stand-alone nanoparticles, opening new technology opportunities.
Findings by UA graduate students Sarang P. Bhawalkar, Jun Qian (a visiting student from Tianjin University, China), Michael C. Heiber, and assistant professor of polymer science Dr. Li Jia are available in the Nov. 16, 2010 issue of Langmuir, a publication of the American Chemical Society. See "Development of a Colloidal Lithography Method for Patterning Nonplanar Surfaces" at pubs.acs.org/doi/abs/10.1021/la1035147.
"Nanoparticles arranged in hexagonal patterns have been widely used for surface patterning before our work, but these particles touch and support each other," explains Jia. "We were curious to learn if we could use stand-alone particles not supporting each other. There are several advantages to this. Among them is the possibility of patterning curved or uneven surfaces. Consider traditional photolithography, which is highly efficient in putting complex circuits on flat computer chips, but inapt at patterning surfaces that are not flat."
The challenge, according to Jia, was to secure the pattern against the lateral capillary force. When this challenge was presented to Sarang, his solution was to dip-coat a layer of polymer adhesive.
"It worked like a charm," Jia says.
According to Jia, the method is a breakthrough due to adaptation to topographic features ranging from macroscopic to microscopic scales. The team is currently working on fabrication of surfaces with a combination of several advanced properties such as self-cleaning, anti-reflection and anti-icing, says Jia, who notes the desirability of these surface properties in skyscrapers, aircrafts, solar panels and residential windows.
The researchers are testing their lithography method on large surfaces and durability of the patterns when subjected to temperature fluctuations and abrasion. Jia adds that he and his colleagues' next step, in collaboration with other experts, is to explore the applications of their lithography method in optical circuitry, imaging and sensing, and bioengineering.
About University of Akron
The University of Akron is the public research university for Northeast Ohio. The Princeton Review listed UA among the “Best in the Midwest” in its 2010 edition of Best Colleges: Region-by-Region. Approximately 29,300 students are enrolled in UA’s 300 associate, bachelor’s, master’s, doctorate and law degree programs and 100 certificate programs at sites in Summit, Wayne, Medina and Holmes counties.
For more information, please click here
Copyright © University of AkronIf you have a comment, please Contact us.
Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.
|Related News Press|
News and information
March 2016; 6th Int'l Conference on Nanostructures in Iran July 29th, 2015
Spintronics: Molecules stabilizing magnetism: Organic molecules fixing the magnetic orientation of a cobalt surface/ building block for a compact and low-cost storage technology/ publication in Nature Materials July 25th, 2015
An easy, scalable and direct method for synthesizing graphene in silicon microelectronics: Korean researchers grow 4-inch diameter, high-quality, multi-layer graphene on desired silicon substrates, an important step for harnessing graphene in commercial silicon microelectronics July 21st, 2015
Sol-gel capacitor dielectric offers record-high energy storage July 30th, 2015
Solar cells in the roof and nanotechnology in the walls June 16th, 2015
Industrial Nanotech, Inc. Continues Global Development Focus on Original Equipment Manufacturer (OEM) Applications: Industrial Nanotech Continues Connecting With Manufacturers Who Seek Out Their Patented Thermal Insulation and Protective Coatings June 11th, 2015
Springer and Tsinghua University Press present the second Nano Research Award: Paul Alivisatos of the University of California Berkeley receives the honor for outstanding contributions in nanoscience July 30th, 2015