Nanotechnology Now







Heifer International

Wikipedia Affiliate Button


DHgate

Home > Press > Nanonex Launches NX-2600 Tool to Offer Sub-5 nm Imprinting Resolution and Sub-1 Micrometer Alignment Accuracy

NX-2600
NX-2600

Abstract:
Nanonex launches new NX-2600 tool which combines full wafer nanoimprinter and photolithography aligner to offer sub-5 nm imprinting resolution and sub-1 micrometer alignment accuracy

Nanonex Launches NX-2600 Tool to Offer Sub-5 nm Imprinting Resolution and Sub-1 Micrometer Alignment Accuracy

Princeton, NJ | Posted on November 3rd, 2010

Nanonex Corporation, the inventor and world's leading provider in nanoimprint lithography solutions with the longest history, is proud to launch its new Nanonex NX-2600 tool for supporting the cutting edge nano-/micro-technologies.

The Nanonex NX-2600 is a full wafer nanoimprinter and photolithography aligner. It is capable of all imprint forms: thermal, photo-curable, embossing and photolithography, with sub-5nm imprinting resolution and sub-1 micrometer alignment accuracy. Based on the Nanonex unique patented Air Cushion PressTM technology, the NX-2600 offers unsurpassed uniformity regardless of backside topology, wafer or mask flatness, or backside contamination. This ACP technology also eliminates lateral shifting between the mask and substrate, which significantly increases mask lifetime.

Nanonex has successfully delivered the NX-2600 tools to Wright-Patterson Laboratory, University of Massachusetts at Lowell and University of Cincinnati. The multifunctional NX-2600 will be used to support the cutting edge nano-/micro-technologies research and development at these top tier research laboratories.

For more detailed information about NX-2600 tool, nanoimprint solution and application please visit Nanonex at: www.nanonex.com.

####

About Nanonex
Nanonex Corporation is the inventor of “nanoimprint lithography”, the world’s first nanoimprint lithography company, and the world’s leading provider of nanoimprint solutions that include equipment, masks, resists and processes. Nanonex’s patented and proprietary nanoimprint lithography (NIL) solutions and Air-Cushion PressTM can manufacture 3D nanostructures with sub-5 nm resolution, large-area uniformity, accurate overlay alignment, high throughput, and low cost. Nanonex NIL solutions have been adopted by a broad spectrum of industry applications, such as optical devices, data storage, displays, light emitting diodes, semiconductor ICs, biotech, chemical synthesis, and advanced materials. Nanonex has over 100 customers and an installed base of more than 50 tools world-wide.

For more information, please click here

Contacts:
Nanonex Corp.
1 Deer Park Drive, Suite O
Monmouth Junction, NJ 08852
Tel: 732-355-1600
Fax: 732-355-1608

Copyright © Nanonex

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Mass spectrometers with optimised hydrogen pumping March 1st, 2015

Imec Demonstrates Compact Wavelength-Division Multiplexing CMOS Silicon Photonics Transceiver March 1st, 2015

onic Present breakthrough in CMOS-based Transceivers for mm-Wave Radar Systems March 1st, 2015

Graphene Shows Promise In Eradication Of Stem Cancer Cells March 1st, 2015

Chip Technology

onic Present breakthrough in CMOS-based Transceivers for mm-Wave Radar Systems March 1st, 2015

New nanowire structure absorbs light efficiently: Dual-type nanowire arrays can be used in applications such as LEDs and solar cells February 25th, 2015

SUNY Poly CNSE Researchers and Corporate Partners to Present Forty Papers at Globally Recognized Lithography Conference: SUNY Poly CNSE Research Group Awarded Both ‘Best Research Paper’ and ‘Best Research Poster’ at SPIE Advanced Lithography 2015 forum February 25th, 2015

Ultra-thin nanowires can trap electron 'twisters' that disrupt superconductors February 24th, 2015

Nanoelectronics

New nanowire structure absorbs light efficiently: Dual-type nanowire arrays can be used in applications such as LEDs and solar cells February 25th, 2015

Ultra-thin nanowires can trap electron 'twisters' that disrupt superconductors February 24th, 2015

Improved fire detection with new ultra-sensitive, ultraviolet light sensor February 17th, 2015

Nanotechnology facility planned in Lund, Sweden: A production facility for start-ups in the field of nanotechnology may be built in the Science Village in Lund, a world-class research and innovation village that is also home to ESS, the European Spallation Source February 15th, 2015

Announcements

Imec, Murata, and Huawei Introduce Breakthrough Solution for TX-to-RX Isolation in Reconfigurable, Multiband Front-End Modules for Mobile Phones: Electrical-Balance Duplexers Pave the Way to Integrated Solution for TX-to-RX Isolation March 1st, 2015

Imec Demonstrates Compact Wavelength-Division Multiplexing CMOS Silicon Photonics Transceiver March 1st, 2015

onic Present breakthrough in CMOS-based Transceivers for mm-Wave Radar Systems March 1st, 2015

Graphene Shows Promise In Eradication Of Stem Cancer Cells March 1st, 2015

Tools

Mass spectrometers with optimised hydrogen pumping March 1st, 2015

Hiden CATLAB Microreactor System at ARABLAB 2015 | Visit us on Booth 1011 February 26th, 2015

Renishaw and Bruker team up for a workshop on TERS and co-localised AFM Raman February 26th, 2015

Real-time observation of bond formation by using femtosecond X-ray liquidography February 26th, 2015

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More










ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2015 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE