Nanotechnology Now







Heifer International

Wikipedia Affiliate Button


DHgate

Home > Press > Nanoplas Extends Line of Dry Processing Systems With Tool for 200mm MEMS and 3D TSV Packaging

Abstract:
DSB 9000A Offers Component Manufacturers High Throughput, Lower Cost of Ownership and Flexibility of Process Choice

Nanoplas Extends Line of Dry Processing Systems With Tool for 200mm MEMS and 3D TSV Packaging

Orsay, France | Posted on October 26th, 2010

Nanoplas, a fast-growing global supplier of HDRF® plasma processing equipment for MEMS, 3D through-silicon vias (TSVs), IC packaging and III-V compounds, today introduced a fully automatic dry-processing batch system for high-volume 200mm production.

The DSB 9000A is based on Nanoplas's High Density Radical Flux (HDRF) technology and performs, in one tool, key production steps in microelectronic manufacturing, including:

• Removal of Bosch-process polymers, residues and photoresist from 80-250° C

• Isotropic etching of organic sacrificial layers, and

• Pre-wafer bonding activation

"The DSB 9000A, the newest tool in our growing line of plasma processing equipment, outperforms conventional radio-frequency plasma and microwave systems, while greatly reducing the risk of surface damage," said Gilles Baujon, CEO of Nanoplas. "This flexible, high-throughput, 200mm system offers MEMS manufacturers damage free dry processing, while eliminating costly steps, resulting in lower cost of ownership."

With 100 percent gas disassociation, the DSB 9000A ICP source produces free-radical concentration levels of up to 1,000 times greater than conventional plasma sources, thus providing enhanced process performance, including higher cleaning performance for high aspect ratio structures. The system's proprietary technology eliminates the charging effects and UV radiation normally associated with conventional plasma, allowing stiction-free processing and low-temperature operation.

HDRF gives process engineers outstanding flexibility, offering three distinct modes of operation covering a wide range of processes, from ultra-sensitive surface cleaning to removal of non-reactive residues. Typical throughput for photoresist stripping is 60-70 WPH, and greater than 100 WPH, per process module, for post-Bosch cleaning and surface activation.

####

About Nanoplas
Nanoplas is an innovator of specialized production solutions that deliver low-cost, green alternatives for treating wafer surfaces in next-generation devices, advanced MEMS, 3D TSVs, advanced packaging, power ICs, optoelectronic components and III-V compounds. The company’s High Density Radical Flux (HDRF®) plasma-processing technology delivers sophisticated cleaning techniques for removing Bosch polymers, resistant residues, and photoresist at low temperatures, while providing exceptional process quality, high yields and low cost of ownership. The company, which won a Best Process award in 2008 from EuroAsia Semiconductor, is based in Orsay, France. Its wholly owned subsidiary, Nanoplas North America Inc., operates a lab in Dallas, TX, and is headquartered in San Francisco, CA. Visit www.nanoplas.eu for more information.

For more information, please click here

Contacts:
Jana Yuen
Account Coordinator

loomis::group
www.loomisgroup.com
phone +33 (0)1 58 18 59 30

Copyright © Nanoplas

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Maximum Precision in 3D Printing: New complete solution makes additive manufacturing standard for microfabrication February 26th, 2015

Real-time observation of bond formation by using femtosecond X-ray liquidography February 26th, 2015

Bruker-Sponsored Sixth AFM BioMed Conference Highlights Increasing Impact of AFM in Biological Applications February 26th, 2015

Graphene shows potential as novel anti-cancer therapeutic strategy: University of Manchester scientists have used graphene to target and neutralise cancer stem cells while not harming other cells February 26th, 2015

Chip Technology

New nanowire structure absorbs light efficiently: Dual-type nanowire arrays can be used in applications such as LEDs and solar cells February 25th, 2015

SUNY Poly CNSE Researchers and Corporate Partners to Present Forty Papers at Globally Recognized Lithography Conference: SUNY Poly CNSE Research Group Awarded Both ‘Best Research Paper’ and ‘Best Research Poster’ at SPIE Advanced Lithography 2015 forum February 25th, 2015

Ultra-thin nanowires can trap electron 'twisters' that disrupt superconductors February 24th, 2015

Silicon Catalyst Announces Partnership With imec to Support Semiconductor Start-Ups February 23rd, 2015

Nanoelectronics

New nanowire structure absorbs light efficiently: Dual-type nanowire arrays can be used in applications such as LEDs and solar cells February 25th, 2015

Ultra-thin nanowires can trap electron 'twisters' that disrupt superconductors February 24th, 2015

Improved fire detection with new ultra-sensitive, ultraviolet light sensor February 17th, 2015

Nanotechnology facility planned in Lund, Sweden: A production facility for start-ups in the field of nanotechnology may be built in the Science Village in Lund, a world-class research and innovation village that is also home to ESS, the European Spallation Source February 15th, 2015

Announcements

Maximum Precision in 3D Printing: New complete solution makes additive manufacturing standard for microfabrication February 26th, 2015

Real-time observation of bond formation by using femtosecond X-ray liquidography February 26th, 2015

Bruker-Sponsored Sixth AFM BioMed Conference Highlights Increasing Impact of AFM in Biological Applications February 26th, 2015

Graphene shows potential as novel anti-cancer therapeutic strategy: University of Manchester scientists have used graphene to target and neutralise cancer stem cells while not harming other cells February 26th, 2015

Tools

Hiden CATLAB Microreactor System at ARABLAB 2015 | Visit us on Booth 1011 February 26th, 2015

Renishaw and Bruker team up for a workshop on TERS and co-localised AFM Raman February 26th, 2015

Maximum Precision in 3D Printing: New complete solution makes additive manufacturing standard for microfabrication February 26th, 2015

Real-time observation of bond formation by using femtosecond X-ray liquidography February 26th, 2015

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More










ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2015 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE