Nanotechnology Now







Heifer International

Wikipedia Affiliate Button


DHgate

Home > Press > SEMATECH Gate-Stack Symposium Identifies Post-22 nm Strategies

Abstract:
Participants at the recent 7th Annual International Symposium on Advanced Gate Stack Technology discussed strategies for implementing advanced logic and memory technologies for sub-16 nm node and beyond process technologies.

SEMATECH Gate-Stack Symposium Identifies Post-22 nm Strategies

Albany, NY | Posted on October 13th, 2010

The Symposium, hosted by SEMATECH, drew more than 100 international researchers from industry and academia that shared recent discoveries and outlined new gate stack strategies for the 16 nm technology generation and beyond.

"We are very pleased with the global participation in the conference, and with the outcome - in the exploration of solutions for functional stacks for future devices," said Paul Kirsch, SEMATECH's director of front end processes. "The Symposium's success can be attributed to the breadth and depth of its participants and their research findings. SEMATECH will continue to work collaboratively with the industry on fundamental issues on extending CMOS logic and memory technologies."

The technologies covered were high-k/metal gate stacks for Silicon (Si), Silicon Germanium (SiGe), III-V high performance MOSFETs, metal/high-k/metal stacks for resistance change memory, flash memory, and phase change memory.

Key observations include:

· Progress is being made on Ge and III-V alternative channel material devices, although there was general acknowledgement among Symposium attendees that this area will require more effort and more resources to demonstrate manufacturable solutions.

· Various presenters addressed the functional stack challenges for logic and memory centered on high-k metal gate for Si, SiGe as well as concerns over III-V high performance MOSFETs.

· Consensus of the participants is although there are many hurdles to overcome, vertical stacking seems the most promising pathway for continued scaling.

· To offset the slowdown in scaling and achieve uniformity and address reliability, newer, more innovative materials and switching mechanisms of non-volatile memories need to be investigated further.

Other findings disclosed at the Symposium:

· Keynote presenters, from Intel's Technology and Manufacturing Group and Macronix provided a comprehensive overview of transistor scaling options beyond the 15 nm node and the challenges of non-volatile memories including floating gate for planar and non-planar devices.

· High-k / metal gate process issues were discussed by SONY, Toshiba, IBM and GLOBALFOUNDRIES, highlighting issues with stack scaling.

· Andrew Kummel of the University of California, San Diego discussed the density-functional theory (DFT) simulations suggesting practical pathways to improve the quality of high-k oxides on both Ge and III-V interfaces.

· In the area of emerging memory development, resistance change memory is considered to be one of the most promising candidates for the next generation of memory. Various materials, selector devices and architectures were showcased. Cross bar architectures were discussed for future memory.

· The impressive progress on Spin Torque Transfer (STTRAM) was discussed by Grandis, Everspin and the University of Virginia.

· Several presentations explored new or alternative materials and architectures beyond CMOS devices for 2020, including electron spin devices, graphene, and nanowire transistors. Prof. Kang Wang of University of California at Los Angeles reported efficient spin injection into Ge was realized using magnesium oxide (MgO) and is being optimized for spin transfer torque.

The International Symposium on Advanced Gate Stack Technology is part of the SEMATECH Knowledge Series, a set of public, single-focused industry meetings designed to increase global knowledge in key areas of semiconductor R&D.

####

About SEMATECH
For 20 years, SEMATECH® (www.sematech.org) has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Today, we continue accelerating the next technology revolution with our nanoelectronics and emerging technology partners.

For more information, please click here

Contacts:
Erica McGill
SEMATECH | Media Relations
257 Fuller Road, Suite 2200
Albany, NY 12203
o: 518-649-1041
m: 518-487-8256

Copyright © SEMATECH

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

The laser pulse that gets shorter all by itself: Ultrashort laser pulses have become an indispensable tool for atomic and molecular research; A new technology makes creating short infrared pulses easy and cheap January 27th, 2015

New pathway to valleytronics January 27th, 2015

Stomach acid-powered micromotors get their first test in a living animal January 27th, 2015

Entanglement on a chip: Breakthrough promises secure communications and faster computers January 27th, 2015

Possible Futures

GS7 Graphene Sensor maybe Solution in Fight Against Cancer January 25th, 2015

Nanotechnology in Energy Applications Market Research Report 2014-2018: Radiant Insights, Inc January 15th, 2015

'Mind the gap' between atomically thin materials December 23rd, 2014

A novel method for identifying the body’s ‘noisiest’ networks November 19th, 2014

Chip Technology

New pathway to valleytronics January 27th, 2015

Entanglement on a chip: Breakthrough promises secure communications and faster computers January 27th, 2015

Electronic circuits with reconfigurable pathways closer to reality January 26th, 2015

The latest fashion: Graphene edges can be tailor-made: Rice University theory shows it should be possible to tune material's properties January 24th, 2015

Nanotubes/Buckyballs

Chromium-centered cycloparaphenylene rings for making functionalized nanocarbons January 26th, 2015

GS7 Graphene Sensor maybe Solution in Fight Against Cancer January 25th, 2015

Toyocolor to Launch New Carbon Nanotube Materials at nano tech 2015 January 24th, 2015

Carbon nanotube finding could lead to flexible electronics with longer battery life January 14th, 2015

Nanoelectronics

Electronic circuits with reconfigurable pathways closer to reality January 26th, 2015

Rice-sized laser, powered one electron at a time, bodes well for quantum computing January 15th, 2015

Rapid journey through a crystal lattice: Researchers measure how fast electrons move through single atomic layers January 14th, 2015

A new step towards using graphene in electronic applications January 14th, 2015

Announcements

The laser pulse that gets shorter all by itself: Ultrashort laser pulses have become an indispensable tool for atomic and molecular research; A new technology makes creating short infrared pulses easy and cheap January 27th, 2015

New pathway to valleytronics January 27th, 2015

Entanglement on a chip: Breakthrough promises secure communications and faster computers January 27th, 2015

Engineering self-assembling amyloid fibers January 26th, 2015

Events/Classes

Toyocolor to Launch New Carbon Nanotube Materials at nano tech 2015 January 24th, 2015

NANOPOSTER 2015 - 5th Virtual Nanotechnology Conference - call for abstracts January 24th, 2015

PEN Inc. New Product Development Highlighted for Emerging Nanotechnology Enterprises: Scott Rickert, PEN Chairman, Addresses Webinar for National Nanotechnology Coordination Office January 22nd, 2015

New conductive coatings for flexible touchscreens – presentation at nano tech 2015 in Japan January 22nd, 2015

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More










ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2015 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE