Nanotechnology Now

Our NanoNews Digest Sponsors



Heifer International

Wikipedia Affiliate Button


android tablet pc

Home > Press > CEA-Leti Makes a R&D 20nm Fully Depleted SOI Process available through CMP

Abstract:
CEA-Leti and CMP (Circuits Multi Projets®) announced during the FDSOI Workshop at Tokyo University the launch of an Exploratory MPW (Multi Project Wafers) initiative based on FDSOI (Fully Depleted SOI) 20nm process, opening the access of its 300mm infrastructure to the design community. This MPW offer is partly supported by EUROSOI+ network that gathers the main European academic partners on SOI.

CEA-Leti Makes a R&D 20nm Fully Depleted SOI Process available through CMP

Grenoble and Tokyo | Posted on October 1st, 2010

"Leti has pioneered the SOI technology for years, leading track records in the most advanced research in FDSOI, assessing its key advantages for low power high performance applications with several industrial customers," said Laurent Malier, CEO of CEA-Leti. "It is time now to enlarge the diffusion of the FDSOI technology enabling test cases on 20nm process and beyond. This hit will change the game, breaking the wall of technology to give an open access to the R&D international design community and a unique opportunity to touch silicon with innovative designs."

"CMP is very proud to offer such a very advanced process to the community. Such a process will allow researchers and engineers to experiment with the benefits of SOI on an advanced technology node," said Bernard Courtois, head of CMP.

CEA-Leti has been involved with FDSOI R&D for a number of years and has developed internally both an advanced High-K/Metal Gate FDSOI process and a number of specific design and simulation tools based on industry-standard design-flow packages. FDSOI technology presents key advantages over conventional bulk technology for future nodes. The electrostatic integrity of the transistors is ensured by the thinness of the body without the need for extra litho steps, like in the case of FinFETs, or of channel doping. The consequence is a planar technology that exhibits at the same time excellent short channel behavior and significant improvement of the variability as shown in a number of recent papers.

The basis of the technology offer will be the following:

- CMOS transistors with an undoped channel and a silicon film thickness of 6nm

- High-k / Metal Gate stack

- Single threshold voltage (Vth) n- and pMOSFET with balanced Vth of ±0.4V

- Associated Design Kit, including SPICE model (Verilog-A language), model cards extracted from silicon data, p-cells, DRC, LVS, schematic, parasitics

- Design Kit documentation

The first run is scheduled to be launched in September 2011. All details will be available on the CMP website.

####

About CEA-Leti
CEA is a French research and technology public organisation, with activities in four main areas: energy, information technologies, healthcare technologies and defence and security. Within CEA, the Laboratory for Electronics & Information Technology (CEA-Leti) works with companies in order to increase their competitiveness through technological innovation and transfers. CEA-Leti is focused on micro and nanotechnologies and their applications, from wireless devices and systems, to biology and healthcare or photonics. Nanoelectronics and microsystems (MEMS) are at the core of its activities. As a major player in MINATEC campus, CEA-Leti operates 8,000-m” state-of-the-art clean rooms, on 24/7 mode, on 200mm and 300mm wafer standards. With 1,200 employees, CEA-Leti trains more than 150 Ph.D. students and hosts 200 assignees from partner companies. Strongly committed to the creation of value for the industry, CEA-Leti puts a strong emphasis on intellectual property and owns more than 1,500 patent families. 
For more information about Leti, please visit www.leti.fr.

About CMP
CMP is a broker in ICs and MEMS for prototyping and low volume production. Circuits are fabricated for Universities, Research Laboratories and Industrial Companies. Advanced industrial technologies are available in CMOS, BiCmos, SiGe BiCMOS and MEMS etc. CMP distributes and supports several CAD software tools for both Industrial Companies and Universities. Since 1981, more than 1000 institutions from 70 countries have been served, more than 6000 projects have been prototyped through 700 runs, and 56 different technologies have been interfaced.

For more information, visit: cmp.imag.fr

For more information, please click here

Contacts:
CEA-Leti
Thierry Bosc
+33 4 38 78 31 95


CMP
Kholdoun Torki
+33 4 76 57 47 63

Copyright © CEA-Leti

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

CiQUS researchers design an artificial nose to detect DNA differentiation with single nucleotide resolution September 18th, 2014

Big Results Require Big Ambitions: Three young UCSB faculty receive CAREER awards from the National Science Foundation September 18th, 2014

FEI Opens New Technology Center in Czech Republic: FEI expands its presence in Brno with the opening of a new, larger facility September 18th, 2014

Biosensors Get a Boost from Graphene Partnership: $5 Million Investment Supports Dozens of Jobs and Development of 300mm Fabrication Process and Wafer Transfer Facility September 18th, 2014

Chip Technology

IEEE International Electron Devices Meeting To Celebrate 60th Anniversary as The Leading Technical Conference for Advanced Semiconductor Devices September 18th, 2014

‘Small’ transformation yields big changes September 16th, 2014

Excitonic Dark States Shed Light on TMDC Atomic Layers: Berkeley Lab Discovery Holds Promise for Nanoelectronic and Photonic Applications September 11th, 2014

Researchers Create World’s Largest DNA Origami September 11th, 2014

Nanoelectronics

Rice rolls 'neat' nanotube fibers: Rice University researchers' acid-free approach leads to strong conductive carbon threads September 15th, 2014

Excitonic Dark States Shed Light on TMDC Atomic Layers: Berkeley Lab Discovery Holds Promise for Nanoelectronic and Photonic Applications September 11th, 2014

Researchers Create World’s Largest DNA Origami September 11th, 2014

Material development on the nanoscale: Doped graphene nanoribbons with potential September 8th, 2014

Announcements

Wear-resistant ceramic powder maximises component lifespan in high-stress applications: Innovnano’s nanostructured 3YSZ offers improved tribological performance for manufacturing components September 18th, 2014

IEEE International Electron Devices Meeting To Celebrate 60th Anniversary as The Leading Technical Conference for Advanced Semiconductor Devices September 18th, 2014

FEI Opens New Technology Center in Czech Republic: FEI expands its presence in Brno with the opening of a new, larger facility September 18th, 2014

Biosensors Get a Boost from Graphene Partnership: $5 Million Investment Supports Dozens of Jobs and Development of 300mm Fabrication Process and Wafer Transfer Facility September 18th, 2014

Events/Classes

IEEE International Electron Devices Meeting To Celebrate 60th Anniversary as The Leading Technical Conference for Advanced Semiconductor Devices September 18th, 2014

PEN Inc. Chairman, Scott Rickert, Will Webcast a Live Company Update September 25, 1 PM EDT September 17th, 2014

Dolomite to launch Meros TCU-100 temperature controller at Lab-on-a-Chip & Microarray World Congress September 15th, 2014

Seeking Nanoscale Defenses for Biological and Chemical Threats: WPI co-organizes a NATO workshop to improve the detection and decontamination of biological and chemical agents September 13th, 2014

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More














ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2014 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE