Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > Press > SOKUDO Joins CEA-Leti IMAGINE Program to Develop Multiple E-Beam Lithography Process

Abstract:
SOKUDO Co., Ltd., the lithography coat/develop track, process equipment, joint venture company, and CEA-Leti today announced that SOKUDO will join the new industry/research multi-partner program IMAGINE that is developing maskless lithography for IC manufacturing.

SOKUDO Joins CEA-Leti IMAGINE Program to Develop Multiple E-Beam Lithography Process

Kyoto, Japan & Grenoble, France | Posted on September 16th, 2010

The three-year project is led by CEA-Leti, the leading French semiconductor research institute, and also includes semiconductor manufacturers TSMC and STMicroelectronics. It is evaluating a maskless lithography infrastructure and the use of MAPPER Lithography tools for high throughput. The multiple e-beam-lithography program covers a global approach to the technology, including tool assessment, patterning and process integration, data handling, prototyping and cost analysis.

"E-beam has the potential to be a viable technology for many sub-22nm lithography process layers in logic/foundry semiconductor manufacturing," said Tadahiro Suhara, SOKUDO president and CEO. "SOKUDO is taking a comprehensive approach to being prepared for coat/develop track process readiness in multiple sub-22nm lithography technologies, including immersion ArF lithography extensions, EUV and e-beam lithography. The CEA-Leti IMAGINE collaboration brings together a focused effort to enable production-worthy e-beam lithography, including multiple resist manufacturers key to sub-22nm process development."

"We have been working with SOKUDO's RF3 coat-and-develop track system for many years and the IMAGINE program will benefit from the strong knowledge and support of SOKUDO in developing the necessary processes to support maskless technology," said Serge Tedesco, CEA-Leti program manager. "The experience of CEA-Leti in e-beam technology combined with SOKUDO's coat-and-develop track expertise will help secure the necessary process infrastructure for multi e-beam lithography."

MAPPER Lithography B.V., based in Delft, The Netherlands, makes maskless-lithography machines for the semiconductor industry. It is supporting the IMAGINE project with its massively parallel electron-beam platforms.

####

About CEA-Leti
CEA is a French research and technology public organisation, with activities in four main areas: energy, information technologies, healthcare technologies and defence and security. Within CEA, the Laboratory for Electronics & Information Technology (CEA-Leti) works with companies in order to increase their competitiveness through technological innovation and transfers. CEA-Leti is focused on micro and nanotechnologies and their applications, from wireless devices and systems, to biology and healthcare or photonics. Nanoelectronics and microsystems (MEMS) are at the core of its activities. As a major player in MINATEC campus, CEA-Leti operates 8,000-m˛ state-of-the-art clean rooms, on 24/7 mode, on 200mm and 300mm wafer standards. With 1,200 employees, CEA-Leti trains more than 150 Ph.D. students and hosts 200 assignees from partner companies. Strongly committed to the creation of value for the industry, CEA-Leti puts a strong emphasis on intellectual property and owns more than 1,500 patent families.

About SOKUDO Co., Ltd.
SOKUDO Co., Ltd. (Headquarters: Kyoto, Japan) is a joint venture company owned by Dainippon Screen Mfg. Co., Ltd. and Applied Materials, Inc. SOKUDO was established in 2006 for the development, manufacturing, sales and service of advanced coat/develop track equipment for semiconductor production. Additional information on SOKUDO can be found at www.sokudo.com.

For more information, please click here

Contacts:
SOKUDO Contact:
Charles Pieczulewski
Senior Manager, Strategic Marketing
+81 75 256 8245


CEA-LETI Contacts:
Serge Tedesco
+33 4 38 78 49 89


Thierry Bosc
+33 4 38 78 31 95


Agency
Amélie Ravier
+33 1 58 18 59 30

Copyright © CEA-Leti

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Atomic imperfections move quantum communication network closer to reality June 25th, 2017

Research accelerates quest for quicker, longer-lasting electronics: UC Riverside-led research makes topological insulators magnetic well above room temperatures June 25th, 2017

U.S. Air Force Research Lab Taps IBM to Build Brain-Inspired AI Supercomputing System: Equal to 64 million neurons, new neurosynaptic supercomputing system will power complex AI tasks at unprecedented speed and energy efficiency June 23rd, 2017

Rice U. chemists create 3-D printed graphene foam June 22nd, 2017

Chip Technology

Atomic imperfections move quantum communication network closer to reality June 25th, 2017

Research accelerates quest for quicker, longer-lasting electronics: UC Riverside-led research makes topological insulators magnetic well above room temperatures June 25th, 2017

U.S. Air Force Research Lab Taps IBM to Build Brain-Inspired AI Supercomputing System: Equal to 64 million neurons, new neurosynaptic supercomputing system will power complex AI tasks at unprecedented speed and energy efficiency June 23rd, 2017

Alloying materials of different structures offers new tool for controlling properties June 19th, 2017

Nanoelectronics

Research accelerates quest for quicker, longer-lasting electronics: UC Riverside-led research makes topological insulators magnetic well above room temperatures June 25th, 2017

GLOBALFOUNDRIES on Track to Deliver Leading-Performance 7nm FinFET Technology: New 7LP technology offers 40 percent performance boost over 14nm FinFET June 13th, 2017

Seeing the invisible with a graphene-CMOS integrated device June 6th, 2017

IBM Research Alliance Builds New Transistor for 5nm Technology: Less than two years since announcing a 7nm test chip, scientists have achieved another breakthrough June 5th, 2017

Announcements

Atomic imperfections move quantum communication network closer to reality June 25th, 2017

Research accelerates quest for quicker, longer-lasting electronics: UC Riverside-led research makes topological insulators magnetic well above room temperatures June 25th, 2017

U.S. Air Force Research Lab Taps IBM to Build Brain-Inspired AI Supercomputing System: Equal to 64 million neurons, new neurosynaptic supercomputing system will power complex AI tasks at unprecedented speed and energy efficiency June 23rd, 2017

Rice U. chemists create 3-D printed graphene foam June 22nd, 2017

Alliances/Trade associations/Partnerships/Distributorships

U.S. Air Force Research Lab Taps IBM to Build Brain-Inspired AI Supercomputing System: Equal to 64 million neurons, new neurosynaptic supercomputing system will power complex AI tasks at unprecedented speed and energy efficiency June 23rd, 2017

Cambridge Nanotherm partners with Inabata for global sales and distribution June 20th, 2017

Thought Leaders and Experts Join National Graphene Association Advisory Board June 16th, 2017

Microsoft, Purdue collaborate to advance quantum computing May 30th, 2017

Research partnerships

Research accelerates quest for quicker, longer-lasting electronics: UC Riverside-led research makes topological insulators magnetic well above room temperatures June 25th, 2017

Rice U. chemists create 3-D printed graphene foam June 22nd, 2017

Alloying materials of different structures offers new tool for controlling properties June 19th, 2017

Learning with light: New system allows optical “deep learning”: Neural networks could be implemented more quickly using new photonic technology June 12th, 2017

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project