Nanotechnology Now







Heifer International

Wikipedia Affiliate Button


DHgate

Home > Press > SEMATECH and Carl Zeiss Demonstrate Mask Pattern Alignment and Registration to Enable Double Patterning Lithography

Abstract:
Next generation overlay metrology system improves photomask registration measurement to advance manufacturing

SEMATECH and Carl Zeiss Demonstrate Mask Pattern Alignment and Registration to Enable Double Patterning Lithography

Albany, NY, and Jena, Germany | Posted on July 30th, 2010

SEMATECH and the Semiconductor Metrology Systems (SMS) division from Carl Zeiss announced today that Zeiss' next-generation photomask registration and overlay metrology system has successfully passed a key development milestone. The jointly developed system - called PROVE™ - demonstrated the measurement capability for advanced photomasks for the 32 nm node and below. In a series of test runs, the key specifications -- 0.5 nm repeatability and 1.0 nm accuracy in image placement, registration and overlay measurement -- were verified.

"The mask pattern placement metrology tool project builds upon an already successful partnership between Carl Zeiss SMS and SEMATECH for past work on mask Aerial Image Metrology Systems (AIMS™) tool platforms. The partnership has resulted in a working metrology tool that is meeting specifications for repeatability, reproducibility, and accuracy at the 32 nm half-pitch node," said Bryan Rice, director of lithography at SEMATECH. "The industry now has the capability to determine smaller image placement errors than could be measured before. Achieving these specifications is a major milestone toward enabling the International Technology Roadmap for Semiconductors (ITRS) mask requirements for the 32 nm node and below. This accomplishment will help to advance the development of photomasks with tighter overlay requirements, demanded by memory devices and double patterning methods."

The performance targets of the tool were driven by the requirements for advanced memory and double exposure/double patterning mask pattern placement and overlay that will help extend 193nm lithography according to the ITRS.

"To achieve the performance specification of the PROVE™ system is a major milestone in the project and crucial for our customers in the mask making industry. The system is based on a completely new developed platform enabling in-die and sub-nanometer pattern placement metrology in a most versatile way. The measurements can be done on arbitrary production features in the active area of the photomask for accurate and cost efficient metrology and is extendable to EUV technology," said Dr. Oliver Kienzle, Managing Director of Carl Zeiss SMS. "We will now roll-out the PROVE™ product with deliveries to our customers."

This technology represents a significant improvement over previous capability due primarily to the incorporation of high-resolution 193nm wavelength imaging optics, a flexible illuminator that maximizes image contrast, a highly versatile in-die registration analysis algorithm, and a state-of-the-art metrology platform. The system can be fully extended to measure EUV photomasks. The tool will play a vital role in enabling next generation mask-making technology.

SEMATECH's Lithography Program is leading the industry in providing critical information about and solutions to current and emerging lithography systems. Carl Zeiss was chosen to develop the system in April 2007 by an evaluation team of mask makers and SEMATECH member companies. Carl Zeiss' proposal included a novel design allowing mask manufacturers to measure position deviation of photomask features with high precision and accuracy. Since that time Carl Zeiss and SEMATECH engineers have partnered to develop the concept into a working metrology tool.

####

About SEMATECH
For 20 years, SEMATECH® (www.sematech.org) has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Today, we continue accelerating the next technology revolution with our nanoelectronics and emerging technology partners.

About Carl Zeiss SMT AG
Carl Zeiss SMT is one of the leading manufacturers of lithography optics and light, electron and ion-optical inspection, analysis and measuring systems. Its Semiconductor Metrology Systems Division focuses on a key component in semiconductor manufacturing, the photomask. Core expertise in light and electron optics, complemented by a femto-second laser technology form the foundation of a product portfolio comprising in-die metrology, actinic qualification, repair and tuning of photomasks.

For more information, please click here

Contacts:
SEMATECH Media Contact:
Erica McGill
518-649-1041


Carl Zeiss Media Contact:
Nadine Schütze
+49 3641 64 2242

Copyright © SEMATECH

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

French Institutes IRT Nanoelec and CMP Team up to Offer World’s First Service for Post-process 3D Technologies on Multi-Project-Wafer March 5th, 2015

The George Washington University Opens Science and Engineering Hall, Largest Building of Its Kind in D.C.: Building Represents Significant Investment in Research Programs and Facilities; Commitment to Solve Global Problems, Improve Lives of Millions March 5th, 2015

Anousheh Ansari Wins the National Space Society's Space Pioneer Award for "Service to the Space Community" March 5th, 2015

Enhanced Graphene Components for Next Generation Racing Yacht March 5th, 2015

Chip Technology

French Institutes IRT Nanoelec and CMP Team up to Offer World’s First Service for Post-process 3D Technologies on Multi-Project-Wafer March 5th, 2015

Experiment and theory unite at last in debate over microbial nanowires: New model and experiments settle debate over metallic-like conductivity of microbial nanowires in bacterium March 4th, 2015

Magnetic vortices in nanodisks reveal information: Researchers from Dresden and Jülich use microwaves to read out information from smallest storage devices March 4th, 2015

The taming of magnetic vortices: Unified theory for skyrmion-materials March 3rd, 2015

Nanoelectronics

New nanowire structure absorbs light efficiently: Dual-type nanowire arrays can be used in applications such as LEDs and solar cells February 25th, 2015

Ultra-thin nanowires can trap electron 'twisters' that disrupt superconductors February 24th, 2015

Improved fire detection with new ultra-sensitive, ultraviolet light sensor February 17th, 2015

Nanotechnology facility planned in Lund, Sweden: A production facility for start-ups in the field of nanotechnology may be built in the Science Village in Lund, a world-class research and innovation village that is also home to ESS, the European Spallation Source February 15th, 2015

Announcements

The George Washington University Opens Science and Engineering Hall, Largest Building of Its Kind in D.C.: Building Represents Significant Investment in Research Programs and Facilities; Commitment to Solve Global Problems, Improve Lives of Millions March 5th, 2015

Anousheh Ansari Wins the National Space Society's Space Pioneer Award for "Service to the Space Community" March 5th, 2015

Enhanced Graphene Components for Next Generation Racing Yacht March 5th, 2015

Get ready for NanoDays! March 5th, 2015

Tools

Keysight Technologies Shifts to Direct Sales of High-Performance Products in North America March 3rd, 2015

Forbidden quantum leaps possible with high-res spectroscopy March 2nd, 2015

International research partnership tricks the light fantastic March 2nd, 2015

Important step towards quantum computing: Metals at atomic scale March 2nd, 2015

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More










ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2015 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE