Nanotechnology Now

Our NanoNews Digest Sponsors
Heifer International



Home > Press > SEMATECH and Carl Zeiss Demonstrate Mask Pattern Alignment and Registration to Enable Double Patterning Lithography

Abstract:
Next generation overlay metrology system improves photomask registration measurement to advance manufacturing

SEMATECH and Carl Zeiss Demonstrate Mask Pattern Alignment and Registration to Enable Double Patterning Lithography

Albany, NY, and Jena, Germany | Posted on July 30th, 2010

SEMATECH and the Semiconductor Metrology Systems (SMS) division from Carl Zeiss announced today that Zeiss' next-generation photomask registration and overlay metrology system has successfully passed a key development milestone. The jointly developed system - called PROVE™ - demonstrated the measurement capability for advanced photomasks for the 32 nm node and below. In a series of test runs, the key specifications -- 0.5 nm repeatability and 1.0 nm accuracy in image placement, registration and overlay measurement -- were verified.

"The mask pattern placement metrology tool project builds upon an already successful partnership between Carl Zeiss SMS and SEMATECH for past work on mask Aerial Image Metrology Systems (AIMS™) tool platforms. The partnership has resulted in a working metrology tool that is meeting specifications for repeatability, reproducibility, and accuracy at the 32 nm half-pitch node," said Bryan Rice, director of lithography at SEMATECH. "The industry now has the capability to determine smaller image placement errors than could be measured before. Achieving these specifications is a major milestone toward enabling the International Technology Roadmap for Semiconductors (ITRS) mask requirements for the 32 nm node and below. This accomplishment will help to advance the development of photomasks with tighter overlay requirements, demanded by memory devices and double patterning methods."

The performance targets of the tool were driven by the requirements for advanced memory and double exposure/double patterning mask pattern placement and overlay that will help extend 193nm lithography according to the ITRS.

"To achieve the performance specification of the PROVE™ system is a major milestone in the project and crucial for our customers in the mask making industry. The system is based on a completely new developed platform enabling in-die and sub-nanometer pattern placement metrology in a most versatile way. The measurements can be done on arbitrary production features in the active area of the photomask for accurate and cost efficient metrology and is extendable to EUV technology," said Dr. Oliver Kienzle, Managing Director of Carl Zeiss SMS. "We will now roll-out the PROVE™ product with deliveries to our customers."

This technology represents a significant improvement over previous capability due primarily to the incorporation of high-resolution 193nm wavelength imaging optics, a flexible illuminator that maximizes image contrast, a highly versatile in-die registration analysis algorithm, and a state-of-the-art metrology platform. The system can be fully extended to measure EUV photomasks. The tool will play a vital role in enabling next generation mask-making technology.

SEMATECH's Lithography Program is leading the industry in providing critical information about and solutions to current and emerging lithography systems. Carl Zeiss was chosen to develop the system in April 2007 by an evaluation team of mask makers and SEMATECH member companies. Carl Zeiss' proposal included a novel design allowing mask manufacturers to measure position deviation of photomask features with high precision and accuracy. Since that time Carl Zeiss and SEMATECH engineers have partnered to develop the concept into a working metrology tool.

####

About SEMATECH
For 20 years, SEMATECH® (www.sematech.org) has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Today, we continue accelerating the next technology revolution with our nanoelectronics and emerging technology partners.

About Carl Zeiss SMT AG
Carl Zeiss SMT is one of the leading manufacturers of lithography optics and light, electron and ion-optical inspection, analysis and measuring systems. Its Semiconductor Metrology Systems Division focuses on a key component in semiconductor manufacturing, the photomask. Core expertise in light and electron optics, complemented by a femto-second laser technology form the foundation of a product portfolio comprising in-die metrology, actinic qualification, repair and tuning of photomasks.

For more information, please click here

Contacts:
SEMATECH Media Contact:
Erica McGill
518-649-1041


Carl Zeiss Media Contact:
Nadine Schütze
+49 3641 64 2242

Copyright © SEMATECH

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Researchers develop artificial building blocks of life March 8th, 2024

How surface roughness influences the adhesion of soft materials: Research team discovers universal mechanism that leads to adhesion hysteresis in soft materials March 8th, 2024

Two-dimensional bimetallic selenium-containing metal-organic frameworks and their calcinated derivatives as electrocatalysts for overall water splitting March 8th, 2024

Curcumin nanoemulsion is tested for treatment of intestinal inflammation: A formulation developed by Brazilian researchers proved effective in tests involving mice March 8th, 2024

Chip Technology

New chip opens door to AI computing at light speed February 16th, 2024

HKUST researchers develop new integration technique for efficient coupling of III-V and silicon February 16th, 2024

Electrons screen against conductivity-killer in organic semiconductors: The discovery is the first step towards creating effective organic semiconductors, which use significantly less water and energy, and produce far less waste than their inorganic counterparts February 16th, 2024

NRL discovers two-dimensional waveguides February 16th, 2024

Nanoelectronics

Interdisciplinary: Rice team tackles the future of semiconductors Multiferroics could be the key to ultralow-energy computing October 6th, 2023

Key element for a scalable quantum computer: Physicists from Forschungszentrum Jülich and RWTH Aachen University demonstrate electron transport on a quantum chip September 23rd, 2022

Reduced power consumption in semiconductor devices September 23rd, 2022

Atomic level deposition to extend Moore’s law and beyond July 15th, 2022

Announcements

What heat can tell us about battery chemistry: using the Peltier effect to study lithium-ion cells March 8th, 2024

Curcumin nanoemulsion is tested for treatment of intestinal inflammation: A formulation developed by Brazilian researchers proved effective in tests involving mice March 8th, 2024

The Access to Advanced Health Institute receives up to $12.7 million to develop novel nanoalum adjuvant formulation for better protection against tuberculosis and pandemic influenza March 8th, 2024

Nanoscale CL thermometry with lanthanide-doped heavy-metal oxide in TEM March 8th, 2024

Tools

First direct imaging of small noble gas clusters at room temperature: Novel opportunities in quantum technology and condensed matter physics opened by noble gas atoms confined between graphene layers January 12th, 2024

New laser setup probes metamaterial structures with ultrafast pulses: The technique could speed up the development of acoustic lenses, impact-resistant films, and other futuristic materials November 17th, 2023

Ferroelectrically modulate the Fermi level of graphene oxide to enhance SERS response November 3rd, 2023

The USTC realizes In situ electron paramagnetic resonance spectroscopy using single nanodiamond sensors November 3rd, 2023

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project