Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > Press > Imec EUV mask cleaning program on track towards EUV mass manufacturing

Abstract:
Imec today reports promising results in its Extreme Ultraviolet Lithography (EUV) mask cleaning program for defect-free EUV masks which are crucial in achieving high chip manufacturing yield. The research program was initiated in collaboration with mask cleaning experts of HamaTech APE GmbH & Co. KG., a fully owned subsidiary of Süss MicroTec AG, and some of imec's core partners.

Imec EUV mask cleaning program on track towards EUV mass manufacturing

Leuven, Belgium | Posted on July 14th, 2010

The objective of the dedicated EUV mask cleaning program is to develop processes of record (POR's) for EUV mask cleaning that not only are effective in removing particles and organic contamination without damage to the vulnerable materials of the EUV masks, but do not reduce mask lifetime through repetitive cleaning. A specific EUV reticle back-side cleaning process is being developed, to protect the electrostatic reticle chuck of the EUV scanner from degraded performance which can negatively affect the "print on wafer" results. Project completion is targeted for the end of 2010.

Research started after successful installation of HamaTech's state-of-the-art MaskTrack Pro® photomask processing system at the imec 300mm cleanroom in early 2010, located close to the ASML EUV Alpha demo tool. A unique combination of physical and chemical cleaning technologies have demonstrated a highly-effective removal of organic and inorganic contamination without any negative effects on mask integrity. The vulnerable absorber and capping layer of the reticle presented no significant signs of deterioration.

Kurt Ronse, program director advanced lithography at imec said, "Defect-free EUV mask availability, for achieving high chip manufacturing yield, has become one of the major concerns for EUV lithography to become a manufacturable technology, taking over from 193nm immersion. Besides the lack of EUV mask inspection infrastructure and the difficulties to make defect free EUV masks, we experience day by day how vulnerable pellicle-less EUV masks are in the wafer fab, when moved from storage to the exposure tool and back. Until standardized EUV reticle handling procedures can demonstrate not to add contamination to EUV mask during its normal lifetime in the fab, the availability of an in-fab effective cleaning process is crucial. With the results obtained so far, we are confident that it is possible to develop effective front- and back-side cleaning processes without risks to jeopardize the mask integrity after multiple repeated cleans."

"We are very pleased to collaborate with imec and its leading-edge industry partners on critical mask cleaning technology for next generation lithography processes," said Wilma Koolen-Hermkens, CEO of HamaTech APE. "MaskTrack Pro is the first proven platform in the industry that can address EUVL zero tolerance levels for particles and defects on the mask prior to exposure. With a world-class design, the MaskTrack Pro allows clustering of metrology systems and pod-in-pod stocking for a holistic mask management approach throughout the life of the mask. Imec is our partner of choice to jointly develop the necessary POR's for our valued customers."

####

About imec
Imec performs world-leading research in nanoelectronics. Imec leverages its scientific knowledge with the innovative power of its global partnerships in ICT, healthcare and energy. Imec delivers industry-relevant technology solutions. In a unique high-tech environment, its international top talent is committed to providing the building blocks for a better life in a sustainable society. Imec is headquartered in Leuven, Belgium, and has offices in Belgium, the Netherlands, Taiwan, US, China and Japan. Its staff of more than 1,750 people includes over 550 industrial residents and guest researchers. In 2009, imec's revenue (P&L) was 275 million euro. Further information on imec can be found at www.imec.be.

NOTE: Imec is a registered trademark for the activities of IMEC International (a legal entity set up under Belgian law as a "stichting van openbaar nut”), imec Belgium (IMEC vzw supported by the Flemish Government), imec the Netherlands (Stichting IMEC Nederland, part of Holst Centre which is supported by the Dutch Government), imec Taiwan (IMEC Taiwan Co.) and imec China (IMEC Microelectronics (Shangai) Co. Ltd.).

About HamaTech’s MaskTrack Pro® photomask processing system
The MaskTrack Pro platform, offers innovative cleaning, post-exposure bake and develop technology for a sophisticated mask integrity system focused on 193i 22nm hp double patterning, EUV and nano-imprint lithography technologies. MaskTrack Pro BD combines a unique ASonicTM develop technology with unmatched bake techniques for extreme pattern fidelity and perfect critical dimension (CD) uniformity matching, whereas MaskTrack Pro Clean ensures that the mask is defect-free at point-of-exposure, offering customers a dramatic increase in exposure tool availability and uptime.

For more information, please click here

Contacts:
imec: Katrien Marent, Director of External Communications, T: +32 16 28 18 80, Mobile: +32 474 30 28 66,

Barbara Kalkis, Maestro Marketing & PR, T: +1 408 996 9975, M: +1 408 529 4210,

Copyright © imec

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

UTSA study describes new minimally invasive device to treat cancer and other illnesses: Medicine diffusion capsule could locally treat multiple ailments and diseases over several weeks December 3rd, 2016

Novel Electrode Structure Provides New Promise for Lithium-Sulfur Batteries December 3rd, 2016

Research Study: MetaSOLTM Shatters Solar Panel Efficiency Forecasts with Innovative New Coating: Coating Provides 1.2 Percent Absolute Enhancement to Triple Junction Solar Cells December 2nd, 2016

Deep insights from surface reactions: Researchers use Stampede supercomputer to study new chemical sensing methods, desalination and bacterial energy production December 2nd, 2016

Chip Technology

Quantum obstacle course changes material from superconductor to insulator December 1st, 2016

Bumpy surfaces, graphene beat the heat in devices: Rice University theory shows way to enhance heat sinks in future microelectronics November 29th, 2016

Scientists shrink electron gun to matchbox size: Terahertz technology has the potential to enable new applications November 25th, 2016

Uncovering the secrets of friction on graphene: Sliding on flexible graphene surfaces has been uncharted territory until now November 23rd, 2016

Nanoelectronics

Supersonic spray yields new nanomaterial for bendable, wearable electronics: Film of self-fused nanowires clear as glass, conducts like metal November 23rd, 2016

What a twist: Silicon nanoantennas turn light around: The theoretical results will allow scientists to design nanodevices with extraordinary features for use in optoelectronics November 21st, 2016

2-D material a brittle surprise: Rice University researchers finds molybdenum diselenide not as strong as they thought November 14th, 2016

UCR researchers discover new method to dissipate heat in electronic devices: By modulating the flow of phonons through semiconductor nanowires, engineers can create smaller and faster devices November 13th, 2016

Announcements

UTSA study describes new minimally invasive device to treat cancer and other illnesses: Medicine diffusion capsule could locally treat multiple ailments and diseases over several weeks December 3rd, 2016

Novel Electrode Structure Provides New Promise for Lithium-Sulfur Batteries December 3rd, 2016

Research Study: MetaSOLTM Shatters Solar Panel Efficiency Forecasts with Innovative New Coating: Coating Provides 1.2 Percent Absolute Enhancement to Triple Junction Solar Cells December 2nd, 2016

Deep insights from surface reactions: Researchers use Stampede supercomputer to study new chemical sensing methods, desalination and bacterial energy production December 2nd, 2016

Tools

Deep insights from surface reactions: Researchers use Stampede supercomputer to study new chemical sensing methods, desalination and bacterial energy production December 2nd, 2016

Controlled electron pulses November 30th, 2016

Scientists shrink electron gun to matchbox size: Terahertz technology has the potential to enable new applications November 25th, 2016

News from Quorum: The Agricultural Research Service of the USDA uses a Quorum Cryo-SEM preparation system for the study of mites, ticks and other soft bodied organisms November 22nd, 2016

Alliances/Trade associations/Partnerships/Distributorships

Leti and Grenoble Partners Demonstrate World’s 1st Qubit Device Fabricated in CMOS Process: Paper by Leti, Inac and University of Grenoble Alpes Published in Nature Communications November 28th, 2016

Mechanism for sodium storage in 2-D material: Tin selenide is an effective host for storing sodium ions, making it a promising material for sodium ion batteries October 27th, 2016

Enterprise In Space Partners with Sketchfab and 3D Hubs for NewSpace Education October 13th, 2016

Arrowhead and Spring Bank Announce Clinical Collaboration for ARC-520 and SB 9200 in Chronic Hepatitis B October 6th, 2016

Research partnerships

Deep insights from surface reactions: Researchers use Stampede supercomputer to study new chemical sensing methods, desalination and bacterial energy production December 2nd, 2016

Quantum obstacle course changes material from superconductor to insulator December 1st, 2016

Novel silicon etching technique crafts 3-D gradient refractive index micro-optics November 28th, 2016

Single photon converter -- a key component of quantum internet November 28th, 2016

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project