Nanotechnology Now







Heifer International

Wikipedia Affiliate Button


DHgate

Home > Press > Imec EUV mask cleaning program on track towards EUV mass manufacturing

Abstract:
Imec today reports promising results in its Extreme Ultraviolet Lithography (EUV) mask cleaning program for defect-free EUV masks which are crucial in achieving high chip manufacturing yield. The research program was initiated in collaboration with mask cleaning experts of HamaTech APE GmbH & Co. KG., a fully owned subsidiary of Süss MicroTec AG, and some of imec's core partners.

Imec EUV mask cleaning program on track towards EUV mass manufacturing

Leuven, Belgium | Posted on July 14th, 2010

The objective of the dedicated EUV mask cleaning program is to develop processes of record (POR's) for EUV mask cleaning that not only are effective in removing particles and organic contamination without damage to the vulnerable materials of the EUV masks, but do not reduce mask lifetime through repetitive cleaning. A specific EUV reticle back-side cleaning process is being developed, to protect the electrostatic reticle chuck of the EUV scanner from degraded performance which can negatively affect the "print on wafer" results. Project completion is targeted for the end of 2010.

Research started after successful installation of HamaTech's state-of-the-art MaskTrack Pro® photomask processing system at the imec 300mm cleanroom in early 2010, located close to the ASML EUV Alpha demo tool. A unique combination of physical and chemical cleaning technologies have demonstrated a highly-effective removal of organic and inorganic contamination without any negative effects on mask integrity. The vulnerable absorber and capping layer of the reticle presented no significant signs of deterioration.

Kurt Ronse, program director advanced lithography at imec said, "Defect-free EUV mask availability, for achieving high chip manufacturing yield, has become one of the major concerns for EUV lithography to become a manufacturable technology, taking over from 193nm immersion. Besides the lack of EUV mask inspection infrastructure and the difficulties to make defect free EUV masks, we experience day by day how vulnerable pellicle-less EUV masks are in the wafer fab, when moved from storage to the exposure tool and back. Until standardized EUV reticle handling procedures can demonstrate not to add contamination to EUV mask during its normal lifetime in the fab, the availability of an in-fab effective cleaning process is crucial. With the results obtained so far, we are confident that it is possible to develop effective front- and back-side cleaning processes without risks to jeopardize the mask integrity after multiple repeated cleans."

"We are very pleased to collaborate with imec and its leading-edge industry partners on critical mask cleaning technology for next generation lithography processes," said Wilma Koolen-Hermkens, CEO of HamaTech APE. "MaskTrack Pro is the first proven platform in the industry that can address EUVL zero tolerance levels for particles and defects on the mask prior to exposure. With a world-class design, the MaskTrack Pro allows clustering of metrology systems and pod-in-pod stocking for a holistic mask management approach throughout the life of the mask. Imec is our partner of choice to jointly develop the necessary POR's for our valued customers."

####

About imec
Imec performs world-leading research in nanoelectronics. Imec leverages its scientific knowledge with the innovative power of its global partnerships in ICT, healthcare and energy. Imec delivers industry-relevant technology solutions. In a unique high-tech environment, its international top talent is committed to providing the building blocks for a better life in a sustainable society. Imec is headquartered in Leuven, Belgium, and has offices in Belgium, the Netherlands, Taiwan, US, China and Japan. Its staff of more than 1,750 people includes over 550 industrial residents and guest researchers. In 2009, imec's revenue (P&L) was 275 million euro. Further information on imec can be found at www.imec.be.

NOTE: Imec is a registered trademark for the activities of IMEC International (a legal entity set up under Belgian law as a "stichting van openbaar nut”), imec Belgium (IMEC vzw supported by the Flemish Government), imec the Netherlands (Stichting IMEC Nederland, part of Holst Centre which is supported by the Dutch Government), imec Taiwan (IMEC Taiwan Co.) and imec China (IMEC Microelectronics (Shangai) Co. Ltd.).

About HamaTech’s MaskTrack Pro® photomask processing system
The MaskTrack Pro platform, offers innovative cleaning, post-exposure bake and develop technology for a sophisticated mask integrity system focused on 193i 22nm hp double patterning, EUV and nano-imprint lithography technologies. MaskTrack Pro BD combines a unique ASonicTM develop technology with unmatched bake techniques for extreme pattern fidelity and perfect critical dimension (CD) uniformity matching, whereas MaskTrack Pro Clean ensures that the mask is defect-free at point-of-exposure, offering customers a dramatic increase in exposure tool availability and uptime.

For more information, please click here

Contacts:
imec: Katrien Marent, Director of External Communications, T: +32 16 28 18 80, Mobile: +32 474 30 28 66,

Barbara Kalkis, Maestro Marketing & PR, T: +1 408 996 9975, M: +1 408 529 4210,

Copyright © imec

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

New method allows for greater variation in band gap tunability: The method can change a material's electronic band gap by up to 200 percent January 31st, 2015

Evidence mounts for quantum criticality theory: Findings bolster theory that quantum fluctuations drive strange electronic phenomena January 30th, 2015

Everything You Need To Know About Nanopesticides January 30th, 2015

DNA nanoswitches reveal how life's molecules connect: An accessible new way to study molecular interactions could lower cost and time associated with discovering new drugs January 30th, 2015

Chip Technology

Creating new materials with quantum effects for electronics January 29th, 2015

Advantest to Exhibit at SEMICON Korea in Seoul, South Korea February 4-6 Showcasing Broad Portfolio of Semiconductor Products, Technologies and Solutions January 29th, 2015

Researchers Make Magnetic Graphene: UC Riverside research could lead to new multi-functional electronic devices January 27th, 2015

Nanometrics to Present at the Stifel 2015 Technology, Internet and Media Conference January 27th, 2015

Nanoelectronics

Electronic circuits with reconfigurable pathways closer to reality January 26th, 2015

Rice-sized laser, powered one electron at a time, bodes well for quantum computing January 15th, 2015

Rapid journey through a crystal lattice: Researchers measure how fast electrons move through single atomic layers January 14th, 2015

A new step towards using graphene in electronic applications January 14th, 2015

Announcements

New method allows for greater variation in band gap tunability: The method can change a material's electronic band gap by up to 200 percent January 31st, 2015

Evidence mounts for quantum criticality theory: Findings bolster theory that quantum fluctuations drive strange electronic phenomena January 30th, 2015

Everything You Need To Know About Nanopesticides January 30th, 2015

DNA nanoswitches reveal how life's molecules connect: An accessible new way to study molecular interactions could lower cost and time associated with discovering new drugs January 30th, 2015

Tools

Hiden Gas Analysers at PITTCON 2015 | Visit us on Booth No. 1127 January 29th, 2015

Advantest to Exhibit at SEMICON Korea in Seoul, South Korea February 4-6 Showcasing Broad Portfolio of Semiconductor Products, Technologies and Solutions January 29th, 2015

Park Systems Announces Innovations in Bio Cell Analysis with the Launch of Park NX-Bio, the only 3-in-1 Imaging Nanoscale Tool Available for Life Science Researchers January 29th, 2015

2015 Nanonics Image Contest January 29th, 2015

Alliances/Partnerships/Distributorships

The Original Frameless Shower Doors Installs DFI's FuseCube™ to Offer Hydrophobic Protective Coating as a Standard Feature: First DFI FuseCube™ Installed on the East Coast to Enable Key Differentiator for the Original Frameless Shower Doors January 29th, 2015

Entanglement on a chip: Breakthrough promises secure communications and faster computers January 27th, 2015

Smart keyboard cleans and powers itself -- and can tell who you are January 21st, 2015

DNA 'glue' could someday be used to build tissues, organs January 14th, 2015

Research partnerships

Evidence mounts for quantum criticality theory: Findings bolster theory that quantum fluctuations drive strange electronic phenomena January 30th, 2015

DNA nanoswitches reveal how life's molecules connect: An accessible new way to study molecular interactions could lower cost and time associated with discovering new drugs January 30th, 2015

Made-in-Singapore rapid test kit detects dengue antibodies from saliva: IBN's MedTech innovation simplifies diagnosis of infectious diseases January 29th, 2015

Carbon nanoballs can greatly contribute to sustainable energy supply January 27th, 2015

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More










ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2015 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE