Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > Press > Imec EUV mask cleaning program on track towards EUV mass manufacturing

Abstract:
Imec today reports promising results in its Extreme Ultraviolet Lithography (EUV) mask cleaning program for defect-free EUV masks which are crucial in achieving high chip manufacturing yield. The research program was initiated in collaboration with mask cleaning experts of HamaTech APE GmbH & Co. KG., a fully owned subsidiary of Süss MicroTec AG, and some of imec's core partners.

Imec EUV mask cleaning program on track towards EUV mass manufacturing

Leuven, Belgium | Posted on July 14th, 2010

The objective of the dedicated EUV mask cleaning program is to develop processes of record (POR's) for EUV mask cleaning that not only are effective in removing particles and organic contamination without damage to the vulnerable materials of the EUV masks, but do not reduce mask lifetime through repetitive cleaning. A specific EUV reticle back-side cleaning process is being developed, to protect the electrostatic reticle chuck of the EUV scanner from degraded performance which can negatively affect the "print on wafer" results. Project completion is targeted for the end of 2010.

Research started after successful installation of HamaTech's state-of-the-art MaskTrack Pro® photomask processing system at the imec 300mm cleanroom in early 2010, located close to the ASML EUV Alpha demo tool. A unique combination of physical and chemical cleaning technologies have demonstrated a highly-effective removal of organic and inorganic contamination without any negative effects on mask integrity. The vulnerable absorber and capping layer of the reticle presented no significant signs of deterioration.

Kurt Ronse, program director advanced lithography at imec said, "Defect-free EUV mask availability, for achieving high chip manufacturing yield, has become one of the major concerns for EUV lithography to become a manufacturable technology, taking over from 193nm immersion. Besides the lack of EUV mask inspection infrastructure and the difficulties to make defect free EUV masks, we experience day by day how vulnerable pellicle-less EUV masks are in the wafer fab, when moved from storage to the exposure tool and back. Until standardized EUV reticle handling procedures can demonstrate not to add contamination to EUV mask during its normal lifetime in the fab, the availability of an in-fab effective cleaning process is crucial. With the results obtained so far, we are confident that it is possible to develop effective front- and back-side cleaning processes without risks to jeopardize the mask integrity after multiple repeated cleans."

"We are very pleased to collaborate with imec and its leading-edge industry partners on critical mask cleaning technology for next generation lithography processes," said Wilma Koolen-Hermkens, CEO of HamaTech APE. "MaskTrack Pro is the first proven platform in the industry that can address EUVL zero tolerance levels for particles and defects on the mask prior to exposure. With a world-class design, the MaskTrack Pro allows clustering of metrology systems and pod-in-pod stocking for a holistic mask management approach throughout the life of the mask. Imec is our partner of choice to jointly develop the necessary POR's for our valued customers."

####

About imec
Imec performs world-leading research in nanoelectronics. Imec leverages its scientific knowledge with the innovative power of its global partnerships in ICT, healthcare and energy. Imec delivers industry-relevant technology solutions. In a unique high-tech environment, its international top talent is committed to providing the building blocks for a better life in a sustainable society. Imec is headquartered in Leuven, Belgium, and has offices in Belgium, the Netherlands, Taiwan, US, China and Japan. Its staff of more than 1,750 people includes over 550 industrial residents and guest researchers. In 2009, imec's revenue (P&L) was 275 million euro. Further information on imec can be found at www.imec.be.

NOTE: Imec is a registered trademark for the activities of IMEC International (a legal entity set up under Belgian law as a "stichting van openbaar nut”), imec Belgium (IMEC vzw supported by the Flemish Government), imec the Netherlands (Stichting IMEC Nederland, part of Holst Centre which is supported by the Dutch Government), imec Taiwan (IMEC Taiwan Co.) and imec China (IMEC Microelectronics (Shangai) Co. Ltd.).

About HamaTech’s MaskTrack Pro® photomask processing system
The MaskTrack Pro platform, offers innovative cleaning, post-exposure bake and develop technology for a sophisticated mask integrity system focused on 193i 22nm hp double patterning, EUV and nano-imprint lithography technologies. MaskTrack Pro BD combines a unique ASonicTM develop technology with unmatched bake techniques for extreme pattern fidelity and perfect critical dimension (CD) uniformity matching, whereas MaskTrack Pro Clean ensures that the mask is defect-free at point-of-exposure, offering customers a dramatic increase in exposure tool availability and uptime.

For more information, please click here

Contacts:
imec: Katrien Marent, Director of External Communications, T: +32 16 28 18 80, Mobile: +32 474 30 28 66,

Barbara Kalkis, Maestro Marketing & PR, T: +1 408 996 9975, M: +1 408 529 4210,

Copyright © imec

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

A nanoscale wireless communication system via plasmonic antennas: Greater control affords 'in-plane' transmission of waves at or near visible light August 27th, 2016

Forces of nature: Interview with microscopy innovators Gerd Binnig and Christoph Gerber August 26th, 2016

A promising route to the scalable production of highly crystalline graphene films August 26th, 2016

Graphene under pressure August 26th, 2016

Chip Technology

A nanoscale wireless communication system via plasmonic antennas: Greater control affords 'in-plane' transmission of waves at or near visible light August 27th, 2016

A promising route to the scalable production of highly crystalline graphene films August 26th, 2016

Analog DNA circuit does math in a test tube: DNA computers could one day be programmed to diagnose and treat disease August 25th, 2016

Silicon nanoparticles trained to juggle light: Research findings prove the capabilities of silicon nanoparticles for flexible data processing in optical communication systems August 25th, 2016

Nanoelectronics

Light and matter merge in quantum coupling: Rice University physicists probe photon-electron interactions in vacuum cavity experiments August 24th, 2016

New microchip demonstrates efficiency and scalable design: Increased power and slashed energy consumption for data centers August 24th, 2016

Down to the wire: ONR researchers and new bacteria August 18th, 2016

Smarter self-assembly opens new pathways for nanotechnology: Brookhaven Lab scientists discover a way to create billionth-of-a-meter structures that snap together in complex patterns with unprecedented efficiency August 9th, 2016

Announcements

A nanoscale wireless communication system via plasmonic antennas: Greater control affords 'in-plane' transmission of waves at or near visible light August 27th, 2016

Forces of nature: Interview with microscopy innovators Gerd Binnig and Christoph Gerber August 26th, 2016

A promising route to the scalable production of highly crystalline graphene films August 26th, 2016

Graphene under pressure August 26th, 2016

Tools

Nanofiber scaffolds demonstrate new features in the behavior of stem and cancer cells August 25th, 2016

50 years after the release of the film 'Fantastic Voyage,' science upstages fiction: Science upstages fiction with nanorobotic agents designed to travel in the human body to treat cancer August 25th, 2016

University of Puerto Rico and NASA back in the news – XEI reports August 23rd, 2016

Spider silk: Mother Nature's bio-superlens August 22nd, 2016

Alliances/Trade associations/Partnerships/Distributorships

Thomas Swan and NGI announce unique partnership July 28th, 2016

Starpharma initiates new DEP™ drug delivery program with AstraZeneca July 27th, 2016

XEI Scientific Partners with Electron Microscopy Sciences to Promote and Sell its Products in North and South America July 25th, 2016

Leti and Korea Institute of Science and Technology to Explore Collaboration on Advanced Technologies for Digital Era July 14th, 2016

Research partnerships

New electrical energy storage material shows its power: Nanomaterial combines attributes of both batteries and supercapacitors August 25th, 2016

New theory could lead to new generation of energy friendly optoelectronics: Researchers at Queen's University Belfast and ETH Zurich, Switzerland, have created a new theoretical framework which could help physicists and device engineers design better optoelectronics August 23rd, 2016

A new way to display the 3-D structure of molecules: Metal-organic frameworks provide a new platform for solving the structure of hard-to-study samples August 21st, 2016

Researchers watch catalysts at work August 19th, 2016

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







Car Brands
Buy website traffic