Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button


DHgate

Home > Press > Industry Leaders at SEMATECH Litho Forum Expect EUV Lithography for Semiconductor Manufacturing in 2014

Abstract:
Industry collaboration is required to tackle business and technical challenges facing lithography

Industry Leaders at SEMATECH Litho Forum Expect EUV Lithography for Semiconductor Manufacturing in 2014

New York, NY | Posted on May 24th, 2010

At SEMATECH's Litho Forum, May 10-12, semiconductor business leaders and technology experts gained valuable insight on the industry's perceptions about and intentions for lithography development.

The Forum, a three-day gathering of global lithography experts, featured an impressive line-up of senior executives and technical experts in the semiconductor industry who shared perspectives on why collaboration is imperative for semiconductor innovation and what challenges the development of next-generation technologies must tackle to make lithography successful.

"The fundamental enabler of the industry is improving the cost per function," said Dan Armbrust, president and CEO of SEMATECH. "For the industry to evolve, business models need to take into account collaborations to control costs and extend current technologies while building the infrastructure for future solutions."

"Lithography is the backbone of the semiconductor industry, and it will be a driving force for future application opportunities and business growth," said Bryan Rice, director of Lithography at SEMATECH. "The resulting information and guidance from this year's Forum will be invaluable in helping SEMATECH members extend current technologies, build infrastructure for emerging ones, and overcome the technical and cost challenges of next-generation lithography."

Key highlights of the Forum included the following:

o Keynote speaker Gary Patton of IBM focused on the need for industry collaboration and innovation to continue the roadmap forward and pointed to SEMATECH's collaboration on EUV infrastructure as a good example of the type of collaborative innovation to make EUV happen.

o Presenters from IBM, TSMC, Tokyo Electron Limited, and GLOBALFOUNDRIES reviewed the current state of lithography and activities supporting lithography options, including EUV insertion, mask inspection challenges, double patterning process development, multiple e-beam decisions for 22 nm and sub-22 nm, and overall tool readiness.

o Equipment and material suppliers emphasized that the overall development costs and risk reduction must be secured by ensuring that development progresses at a pace compatible with the EUV mask and resist infrastructure.

Additionally, more than 130 attendees were surveyed on their plans and preferences on lithographic approaches for future manufacturing. Key survey results included the following:

o As identified at previous Forums, 193 nm immersion double patterning continues to be the suitable lithographic technology for volume manufacturing in 2012.

o While some manufacturers will use the technology sooner, EUV would be capable of being placed into manufacturing in 2014, with extendibility into manufacturing in 2016.

o For immersion double patterning, cost of ownership, overlay capability, and extendibility to the next-generation device are still the top challenges.

o For EUV technology, mask defects, source power, exposure tool throughput, and cost of ownership were rated the top challenges.

o 193 nm and EUV were chosen as the technologies that would be considered for manufacturing at the 32 nm node or beyond.

With an industry cycle of about two years per lithography node, SEMATECH's biennial Litho Forum provides an opportunity for lithography users and suppliers to evaluate the progress of various technology options. The previous Forums helped coordinate industry consensus on the 32 nm half-pitch generation and beyond.

####

About SEMATECH
For over 20 years, SEMATECH® (www.sematech.org), the international consortium of leading semiconductor manufacturers, has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Today, we continue accelerating the next technology revolution with our nanoelectronics and emerging technology partners.

For more information, please click here

Contacts:
Erica McGill
SEMATECH | Media Relations
257 Fuller Road | Suite 2200 | Albany, NY | 12203
o: 518-649-1041
m: 518-487-8256

Copyright © SEMATECH

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Electric-car battery materials could harm key soil bacteria February 11th, 2016

Creating a color printer that uses a colorless, non-toxic ink inspired by nature February 11th, 2016

SLAC X-ray laser turns crystal imperfections into better images of important biomolecules: New method could remove major obstacles to studying structures of complex biological machines February 11th, 2016

Nanoparticle reduces targeted cancer drug's toxicity February 11th, 2016

Chip Technology

Research reveals carbon films can give microchips energy storage capability: International team from Drexel University and Paul Sabatier University reveals versatility of carbon films February 11th, 2016

New thin film transistor may lead to flexible devices: Researchers engineer an electronics first, opening door to flexible electronics February 10th, 2016

SUNY Poly and GLOBALFOUNDRIES Announce New $500M R&D Program in Albany To Accelerate Next Generation Chip Technology: Arrival of Second Cutting Edge EUV Lithography Tool Launches New Patterning Center That Will Generate Over 100 New High Tech Jobs at SUNY Poly February 9th, 2016

Electron's 1-D metallic surface state observed: A step for the prediction of electronic properties of extremely-fine metal nanowires in next-generation semiconductors February 9th, 2016

Nanoelectronics

Electron's 1-D metallic surface state observed: A step for the prediction of electronic properties of extremely-fine metal nanowires in next-generation semiconductors February 9th, 2016

The iron stepping stones to better wearable tech without semiconductors February 8th, 2016

Spin dynamics in an atomically thin semi-conductor February 1st, 2016

New type of nanowires, built with natural gas heating: UNIST research team developed a new simple nanowire manufacturing technique February 1st, 2016

Announcements

Research reveals carbon films can give microchips energy storage capability: International team from Drexel University and Paul Sabatier University reveals versatility of carbon films February 11th, 2016

Creating a color printer that uses a colorless, non-toxic ink inspired by nature February 11th, 2016

SLAC X-ray laser turns crystal imperfections into better images of important biomolecules: New method could remove major obstacles to studying structures of complex biological machines February 11th, 2016

Nanoparticle reduces targeted cancer drug's toxicity February 11th, 2016

Events/Classes

Cima NanoTech Debuts Large Interactive Touch Screens with European Customers at ISE 2016: For the first time in Europe, Cima NanoTech’s wide range of high performance, projected capacitive touch modules are showcased February 11th, 2016

Nanotech Security to Present at the Optical Document Security Conference February 11, 2016 February 4th, 2016

New research uses nanotechnology to prevent preterm birth: March of Dimes honors abstract on prematurity at SMFM Annual Meeting February 2nd, 2016

NBC LEARN DEBUTS SIX-PART VIDEO SERIES, “NANOTECHNOLOGY: SUPER SMALL SCIENCE” Produced by NBC Learn in partnership with the National Science Foundation, and narrated by NBC News/MSNBC’s Kate Snow, series highlights leading research in nanotechnology January 25th, 2016

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







Car Brands
Buy website traffic