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Nanometrics Incorporated (Nasdaq: NANO), a leading supplier of advanced process control metrology systems used primarily in the manufacturing and packaging of semiconductors, solar photovoltaics and high-brightness LEDs, today announced that additional UniFire™ 7900 metrology systems have been delivered and qualified by an existing customer, and are currently in production for high volume manufacturing process control of advanced wafer-level packaging processes.
This multi-system follow-on installation is part of an ongoing program to deploy Nanometrics' UniFire technology across multiple manufacturing sites. The systems are being used to measure critical dimensions (CD), topography and overlay registration at the 32nm node for die preparation applications.
"This follow-on order further extends the success of the UniFire technology as it transitions from development into high volume production," commented Bruce Crawford, COO of Nanometrics. "We have worked to seamlessly integrate the UniFire product and personnel, while continually focusing on uninterrupted product development and customer support during the transition. Nanometrics' technology is gaining acceptance as the tool of choice for complex topography applications in the die metallization segment, where we provide a cost of ownership advantage over competing technologies, backed by our worldwide applications and service organizations."
The UniFire platform has now been successfully deployed in both front-end-of-line and back-end-of-line semiconductor manufacturing processes, for applications including advanced packaging, lithography, etch, chemical mechanical polishing (CMP) and thin film deposition.
The UniFire has unique capabilities for high precision measurement of two-dimensional and three-dimensional structures for depth, critical dimension, profile, and film thickness control for advanced semiconductor manufacturing processes.
Forward Looking Statements
This press release contains forward-looking statements including, but not limited to, statements regarding the capabilities of its metrology systems and software, and the expected shipment and qualification of the orders announced in this release. Although Nanometrics believes that the expectations reflected in the forward-looking statements are reasonable, actual results could differ materially from the expectations due to a variety of factors. For additional information and considerations regarding the risks faced by Nanometrics, see its annual report on Form 10-K for the fiscal year ending January 2, 2010 as filed with the Securities and Exchange Commission, as well as other periodic reports filed with the SEC from time to time. Nanometrics disclaims any obligation to update information contained in any forward-looking statement.
Nanometrics is a leader in the design, manufacture and marketing of high-performance process control metrology systems used primarily in the manufacturing of semiconductors, advanced wafer-scale packaging, solar photovoltaics and high-brightness LEDs, as well as by customers in the silicon wafer and data storage industries. Nanometrics standalone and integrated metrology systems measure various thin film properties, critical dimensions, overlay control, topography, and optical, electrical and material properties, including the structural composition of silicon, compound semiconductor and photovoltaic devices, during various steps of the manufacturing process, from front end of line substrate manufacturing through die preparation for
advanced packaging. These systems enable device manufacturers to improve yields, increase productivity and lower their manufacturing costs. The company maintains its headquarters in Milpitas, California, with sales and service offices worldwide. Nanometrics is traded on NASDAQ Global Market under the symbol NANO.
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