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Home > News > Execs weigh in on right path for litho

March 24th, 2010

Execs weigh in on right path for litho

Abstract:
Intel Corp. led the formation of EUV LLC consortium in 1997, which planned to commercialize extreme ultraviolet lithography (EUV) by 2005. Advanced Micro Devices, IBM, Infineon and Micron were among the companies that signed on to the effort.


EUV was supposed to have replaced conventional optical lithography by now. But optical lithography is still driving the semiconductor engine, while EUV now is targeted for early production in 2012—or perhaps 2015 or 2016—depending on who's offering the estimate. Some say it may never work.

Others are pushing for nanoimprint, maskless lithography or an emerging technology called self-assembly. And there are those who hope to extend today's optical lithography indefinitely.

Source:
eetasia.com

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