Nanotechnology Now

Our NanoNews Digest Sponsors





Heifer International

Wikipedia Affiliate Button


android tablet pc

Home > Press > SEMATECH SPCC Conference Featuring New Approaches to III-V Materials

Abstract:
Advanced technologies for cleaning, measuring and processing new III-V semiconductor materials for volume wafer manufacturing will be featured at SEMATECH's Surface Preparation and Cleaning Conference (SPCC), March 22-24, at the Sheraton Austin Hotel.

SEMATECH SPCC Conference Featuring New Approaches to III-V Materials

Austin, TX | Posted on March 13th, 2010

This year's annual SPCC will focus on particle removal, including next-generation materials, controlling processes to minimize impact on fragile device structures, non-damaging methods to remove resist, and new metrology approaches for measuring passivation and surface defects.

"As an industry, we're confronting the limits of physics in using silicon for advanced devices, which is forcing us to look for new materials among the III-V semiconductors," said Joel Barnett, SPCC chairman and Senior Member Technical Staff in SEMATECH's Front End Processes (FEP) division. "This year's conference focuses on current developments and roadmap challenges in advanced wafer and surface prep techniques for the 22 nm technology node and beyond."

For more than 10 years, SPCC has brought together leading researchers from industry and academia to focus on challenges in advanced wafer and mask cleaning and surface preparation. The conference presents cutting-edge information designed to help the industry meet technical goals outlined in the International Technology Roadmap for Semiconductors.

On opening day, Jimmy Price, Member Technical Staff, will deliver an invited paper on FEP's success in using second harmonic generation (SHG) to evaluate the effects of different surface cleans and passivization treatments on indium gallium arsenide (InGaAs), a promising III‑V material. The ability to accurately characterize III-V surfaces and interfaces using SHG highlights the potential of this technique as an in-line metrology system suitable for InGaAs-based chip manufacturing. "We now have a non-invasive method that process and device engineers can rely on to monitor the quality of III-V surfaces and interfaces," said Price. "We spent a year developing this application, and I will be explaining it in some detail."

Other highlights of SPCC 2010 include the following:

· A keynote address by SEMATECH president and CEO Dan Armbrust, on "Creative Collaboration: New Directions for Our Industry."

· A session addressing non-damaging wafer cleaning techniques, including wet laser shockwave, controllable collapsing bubbles, sonoluminescent signal, and controlled use of CO2-gasified deionized water. An invited panel will discuss these and other methodologies for removing particles in next-generation materials, including InGaAs.

· Talks on reducing damage to new materials from chemical-mechanical polishing (CMP) and resist removal. CMP can directly affect gate yield and is becoming more important in low temperature devices, where resists must be removed carefully to avoid damage to new III-V devices.

SPCC is part of the SEMATECH Knowledge Series: unique opportunities to focus on accelerating solutions for critical challenges in the nanoelectronics industry. For more information and registration details for SPCC 2010, go to www.sematech.org/meetings/spcc/.

####

For more information, please click here

Contacts:
Erica McGill
SEMATECH
Media Relations
257 Fuller Road, Suite 2200
Albany, NY 12203
o: 518-649-1041
m: 518-487-8256

Copyright © SEMATECH

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

New solar power material converts 90 percent of captured light into heat: SunShot Project aims to make solar cost competitive October 29th, 2014

Tiny carbon nanotube pores make big impact October 29th, 2014

Microrockets fueled by water neutralize chemical and biological warfare agents October 29th, 2014

Nanosafety research – there’s room for improvement October 29th, 2014

Chip Technology

Sussex physicists find simple solution for quantum technology challenge October 28th, 2014

Watching the hidden life of materials: Ultrafast electron diffraction experiments open a new window on the microscopic world October 27th, 2014

Breakthrough in molecular electronics paves the way for DNA-based computer circuits in the future: DNA-based programmable circuits could be more sophisticated, cheaper and simpler to make October 27th, 2014

QuantumWise guides the semiconductor industry towards the atomic scale October 24th, 2014

Nanoelectronics

Breakthrough in molecular electronics paves the way for DNA-based computer circuits in the future: DNA-based programmable circuits could be more sophisticated, cheaper and simpler to make October 27th, 2014

NIST offers electronics industry 2 ways to snoop on self-organizing molecules October 22nd, 2014

Materials for the next generation of electronics and photovoltaics: MacArthur Fellow develops new uses for carbon nanotubes October 21st, 2014

Crystallizing the DNA nanotechnology dream: Scientists have designed the first large DNA crystals with precisely prescribed depths and complex 3D features, which could create revolutionary nanodevices October 20th, 2014

Materials/Metamaterials

New solar power material converts 90 percent of captured light into heat: SunShot Project aims to make solar cost competitive October 29th, 2014

Watching the hidden life of materials: Ultrafast electron diffraction experiments open a new window on the microscopic world October 27th, 2014

Polymeric Scaffold Recreates Bladder Tissue October 27th, 2014

Iran to Hold 3rd Int'l Engineering Materials, Metallurgy Conference October 25th, 2014

Announcements

New solar power material converts 90 percent of captured light into heat: SunShot Project aims to make solar cost competitive October 29th, 2014

Tiny carbon nanotube pores make big impact October 29th, 2014

Microrockets fueled by water neutralize chemical and biological warfare agents October 29th, 2014

Nanosafety research – there’s room for improvement October 29th, 2014

Events/Classes

New Compact SIMS at 61st AVS | Visit us on Booth 311 October 28th, 2014

Iran to Hold 3rd Int'l Engineering Materials, Metallurgy Conference October 25th, 2014

Iran-Made Respiratory Nano Masks Provided to Hajj Pilgrims October 23rd, 2014

MEMS & Sensors Technology Showcase: Finalists Announced for MEMS Executive Congress US 2014 October 23rd, 2014

Alliances/Partnerships/Distributorships

'Electronic skin' could improve early breast cancer detection October 29th, 2014

European Commission opens the gate towards the implementation of Nanomedicine Translation Hub October 16th, 2014

IRLYNX and CEA-Leti to Streamline New CMOS-based Infrared Sensing Modules Dedicated to Human-activities Characterization October 15th, 2014

New VDMA Association "Electronics, Micro and Nano Technologies" founded: Inaugural Meeting in Frankfurt/Main, Germany October 15th, 2014

NanoNews-Digest
The latest news from around the world, FREE





  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More














ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2014 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE