Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button


DHgate

Home > Press > SEMATECH Researchers to Unveil Next-generation Device and Process Breakthroughs at IEDM

Abstract:
Workshop and technical papers outline emerging solutions for logic and memory devices

SEMATECH Researchers to Unveil Next-generation Device and Process Breakthroughs at IEDM

Austin, TX and Albany, NY | Posted on November 30th, 2009

Engineers from SEMATECH's Front End Processes (FEP) program will present technical papers revealing research breakthroughs at the 55th annual IEEE International Electron Devices Meeting (IEDM) from December 7-9, 2009, at the Hilton in Baltimore, MD.

SEMATECH experts will report on low defect density high-k gate stacks for alternative III-V channel materials and non-planar devices, and discuss a new dry etch approach to minimize etch related leakage—a significant process technology advancement for next-generation logic and memory technologies.

"SEMATECH continues to make critical contributions to materials and process technology advancements for next-generation logic and memory devices. The industry is always looking for cost-effective technical solutions that are practical for manufacturing and SEMATECH's front-end engineers are working to find new ways to extend CMOS in existing markets and to create opportunities for new emerging applications," said Raj Jammy, SEMATECH's vice president of materials and emerging technologies. "We are excited to share our research results with the technical community at the IEDM, which has always been a premier forum for sharing breakthrough developments in materials and process technologies for transistor and memory scaling."

Additionally, SEMATECH will host an invitational pre‑conference workshop entitled "Emerging Technologies in Solid State Devices" from December 5-6. The two-day workshop will focus on technical and manufacturing challenges affecting emerging memory technologies, energy-efficient devices, and III-V channel materials in CMOS devices. Co-sponsored by Tokyo Electron Limited and Aixtron AG, the workshop will feature experts from industry and academia debating the challenges and opportunities in these areas in a series of presentations and panel discussions.

During the IEDM conference, SEMATECH's FEP experts will present research results at the following sessions:

* Session 6, Monday, Dec. 7 at 2:25 p.m.: Impact of Dipole-Induced Dielectric Relaxation on High-frequency Performance in La-Incorporated HfSiON/Metal Gate nMOSFET - investigates the relationship of high frequency and dielectric relaxation of dipoles in La-doped HfSiON devices. This work was done in collaboration with POSTECH team from Korea.

* Session 12, Tuesday, Dec. 8 at 11:10 a.m.: Dual Channel FinFETs as a Single High-k/Metal Gate Solution Beyond 22nm Node - shows that pFinFETs with a SiGe channel on insulator (SiGeOI) fabricated using standard CMOS processing exhibit 3.6X better hole mobility than silicon (100) while controlling the threshold voltage in single high-k and metal gate stacks.

* Session 13, Tuesday, Dec. 8 at 10:45 a.m.: InGaAs MOSFET Performance and Reliability Improvement by Simultaneous Reduction of Oxide and Interface Charge in ALD (La)AlOx/ZrO2 Gate Stack - reports on the performance and reliability of ZrO2/In0.53Ga0.47As MOSFETs. An amorphous (La)AlOx interlayer at the ZrO2/In0.53Ga0.47As interface is key to reducing border and interface traps and moving the ZrO2 fixed charge away from the In0.53Ga0.47As.

* Session 17, Tuesday, Dec. 8 at 3:35 p.m.: A Novel Damage-Free High-k Etch Technique Using Neutral Beam-Assisted Atomic Layer Etching (NBALE) for Sub-32nm Technology Node Low Power Metal Gate/High-k Dielectric CMOSFETs - demonstrates a novel damage-free neutral beam-based atomic etching process that successfully removes the residual high-k dielectric layer after gate patterning. This research was a collaborative effort with Sungkyunkwan Univeristy, Korea, and was partially supported by the National Program for Tera-Level Nano devices of the Korea Ministry of Science and Technology.

The IEDM Conference draws an international audience of industry professionals for an intensive exploration of design, manufacturing, physics, and modeling of semiconductors and other electronic devices. The conference spotlights leading work from the world's top electronics scientists and engineers; it is one of many industry forums SEMATECH uses to collaborate with scientists and engineers from corporations, universities, and other research institutions, many of whom are research partners.

####

About SEMATECH
For over 20 years, SEMATECH®, the global consortium of leading semiconductor manufacturers, has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Today, we continue accelerating the next technology revolution with our nanoelectronics and emerging technology partners.

For more information, please click here

Contacts:
Erica McGill
SEMATECH
Media Relations
257 Fuller Road
Suite 2200
Albany, NY 12203
o: 518-649-1041
m: 518-487-8256

Copyright © SEMATECH

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Composite Pipe Long Term Testing Facility February 10th, 2016

Scientists take nanoparticle snapshots February 10th, 2016

Chemical cages: New technique advances synthetic biology February 10th, 2016

New thin film transistor may lead to flexible devices: Researchers engineer an electronics first, opening door to flexible electronics February 10th, 2016

Chip Technology

New thin film transistor may lead to flexible devices: Researchers engineer an electronics first, opening door to flexible electronics February 10th, 2016

SUNY Poly and GLOBALFOUNDRIES Announce New $500M R&D Program in Albany To Accelerate Next Generation Chip Technology: Arrival of Second Cutting Edge EUV Lithography Tool Launches New Patterning Center That Will Generate Over 100 New High Tech Jobs at SUNY Poly February 9th, 2016

Electron's 1-D metallic surface state observed: A step for the prediction of electronic properties of extremely-fine metal nanowires in next-generation semiconductors February 9th, 2016

Metal oxide sandwiches: New option to manipulate properties of interfaces February 8th, 2016

Memory Technology

A step towards keeping up with Moore's Law: POSTECH researchers develop a novel and efficient fabrication technology for cross-shaped memristor January 30th, 2016

Scientists build a neural network using plastic memristors: A group of Russian and Italian scientists have created a neural network based on polymeric memristors -- devices that can potentially be used to build fundamentally new computers January 28th, 2016

LC.300 Series Nanopositioning Controller from nPoint January 28th, 2016

First all-antiferromagnetic memory device could get digital data storage in a spin January 16th, 2016

Announcements

Composite Pipe Long Term Testing Facility February 10th, 2016

Scientists take nanoparticle snapshots February 10th, 2016

Chemical cages: New technique advances synthetic biology February 10th, 2016

New thin film transistor may lead to flexible devices: Researchers engineer an electronics first, opening door to flexible electronics February 10th, 2016

Events/Classes

Nanotech Security to Present at the Optical Document Security Conference February 11, 2016 February 4th, 2016

New research uses nanotechnology to prevent preterm birth: March of Dimes honors abstract on prematurity at SMFM Annual Meeting February 2nd, 2016

NBC LEARN DEBUTS SIX-PART VIDEO SERIES, “NANOTECHNOLOGY: SUPER SMALL SCIENCE” Produced by NBC Learn in partnership with the National Science Foundation, and narrated by NBC News/MSNBC’s Kate Snow, series highlights leading research in nanotechnology January 25th, 2016

Leti to Host Workshop on New Photonics Applications During SPIE Photonics West: Researchers also Will Present Four Invited Papers At Feb. 13-18 Conference, 14 Papers, Overall January 25th, 2016

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







Car Brands
Buy website traffic