Nanotechnology Now

Our NanoNews Digest Sponsors


Heifer International

Wikipedia Affiliate Button

Home > Press > SEMATECH President and CEO to Deliver Keynote at SPIE/BACUS Photomask Symposium

Abstract:
Michael Polcari to outline challenges and strategies for the mask industry

SEMATECH President and CEO to Deliver Keynote at SPIE/BACUS Photomask Symposium

Albany, NY and Austin, TX | Posted on September 1st, 2009

At the upcoming SPIE Photomask Technology Symposium SEMATECH President and CEO Dr. Michael R. Polcari will call for increased industry collaboration to close a critical gap in the mask infrastructure for EUV (extreme ultra-violet) lithography. Polcari will address conference attendees on Tuesday, September 15, 2009 at 8:10 a.m. at the Monterey Marriott and Monterey Conference Center in Monterey, CA.

"Although we recognize that there are multiple technologies to meet the semiconductor industry's ever-growing lithography demand, we believe EUV can be the cost-effective solution," said Polcari. "Masks are becoming a major component of lithography costs for advanced semiconductor manufacturing and a mask infrastructure must be available to address the growing demand for high-resolution, low-cost of ownership lithography."

In his keynote, entitled "Global Collaboration in Semiconductors and Strategies for the Mask Industry," Polcari will share insights on:

* the challenges facing the global semiconductor industry and collaborative approaches being taken to address them,

* how EUV can be the cost-effective lithography solution below 22 nm if issues such as EUV mask defects can be resolved, and

* how a collaborative strategy to develop new metrology tools will enable EUV and benefit the mask industry.

Dr. Polcari has served as president and CEO of SEMATECH since 2003, directing the global consortium's advanced technology and manufacturing programs. Previously, Polcari was vice president of Procurement Engineering for IBM Global Procurement. He holds a doctorate in solid state physics from Stevens Institute of Technology, and has served on various industry and university advisory boards.

In addition to Polcari's address, leading-edge research from SEMATECH's lithography program will be presented during the following SPIE/BACUS sessions:

Session 1: Invited Session
Tuesday, September 15 at 8:30 a.m.
"Mask Industry Assessment: 2009"
Authors: Gregory P. Hughes, Henry K. Yun, SEMATECH

Session 9: EUV Mask Substrates and Processing
Wednesday, September 16 at 8:00 a.m.
"Correlation of overlay performance and reticle substrate non-flatness effects in EUV lithography"
Authors: Sudharshanan Raghunathan, John G. Hartley, Univ. at Albany; Jaewoong Sohn, Kevin Orvek, SEMATECH

Session 19: EUV Mask Contamination and Cleaning
Thursday, September 17 at 8:20 a.m.
"Impact of carbon contamination on EUV masks"
Authors: Yu-Jen Fan, Leonid Yankulin, Gregory P. Denbeaux, Univ. at Albany; Andrea F. Wüest, Francis Goodwin, Sungmin Huh, SEMATECH; Patrick P. Naulleau, Kenneth A. Goldberg, Lawrence Berkeley National Lab.

The 29th Annual SPIE/BACUS Photomask Symposium is the premier worldwide technical conference and exhibition for the photomask industry. This year's symposium will give attendees the chance to hear the latest research on the emerging and on-going issues facing the photomask industry. For more information or to register, please visit spie.org/pm.

####

About SEMATECH
For over 20 years, SEMATECH® (www.sematech.org) has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Today, we continue accelerating the next technology revolution with our nanoelectronics and emerging technology partners.

For more information, please click here

Contacts:
Note to editors: To arrange an interview, please contact Erica McGill at or 518-649-1041

Copyright © SEMATECH

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Vortex laser offers hope for Moore's Law: The optics advancement may solve an approaching data bottleneck by helping to boost computing power and information transfer rates tenfold July 30th, 2016

New method for making green LEDs enhances their efficiency and brightness July 30th, 2016

Novel state of matter: Observation of a quantum spin liquid July 29th, 2016

A new type of quantum bits July 29th, 2016

Chip Technology

Vortex laser offers hope for Moore's Law: The optics advancement may solve an approaching data bottleneck by helping to boost computing power and information transfer rates tenfold July 30th, 2016

Novel state of matter: Observation of a quantum spin liquid July 29th, 2016

A new type of quantum bits July 29th, 2016

Beating the heat a challenge at the nanoscale: Rice University scientists detect thermal boundary that hinders ultracold experiments July 28th, 2016

Nanomedicine

Scientists change properties of zeolites to improve hemodialysis July 29th, 2016

Pixel-array quantum cascade detector paves the way for portable thermal imaging devices: Research team from TU-Wien Center for Micro- and Nanostructures have developed a new 'cooler' sensing instrument thereby increasing energy-efficiency and enhancing mobility for diagnostic tes July 28th, 2016

Starpharma initiates new DEP™ drug delivery program with AstraZeneca July 27th, 2016

Scientists test nanoparticle drug delivery in dogs with osteosarcoma July 26th, 2016

Announcements

Vortex laser offers hope for Moore's Law: The optics advancement may solve an approaching data bottleneck by helping to boost computing power and information transfer rates tenfold July 30th, 2016

New method for making green LEDs enhances their efficiency and brightness July 30th, 2016

Novel state of matter: Observation of a quantum spin liquid July 29th, 2016

A new type of quantum bits July 29th, 2016

Events/Classes

Nanometrics Announces Upcoming Investor Events July 20th, 2016

n-tech Research Announces August 3, 2016 Date for Smart Coatings Webinar July 18th, 2016

Instrumented Indentation Expert Addresses Trends with Industry Leaders: Leading nanoindentation expert hosts webinar discussing theory and practice of instrumented indentation July 14th, 2016

SUNY Poly Celebrates Its 10th Year Exhibiting at SEMICON West with Cutting Edge Developments in Integrated Photonics and Power Electronics July 8th, 2016

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







Car Brands
Buy website traffic