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Michael Polcari to outline challenges and strategies for the mask industry
At the upcoming SPIE Photomask Technology Symposium SEMATECH President and CEO Dr. Michael R. Polcari will call for increased industry collaboration to close a critical gap in the mask infrastructure for EUV (extreme ultra-violet) lithography. Polcari will address conference attendees on Tuesday, September 15, 2009 at 8:10 a.m. at the Monterey Marriott and Monterey Conference Center in Monterey, CA.
"Although we recognize that there are multiple technologies to meet the semiconductor industry's ever-growing lithography demand, we believe EUV can be the cost-effective solution," said Polcari. "Masks are becoming a major component of lithography costs for advanced semiconductor manufacturing and a mask infrastructure must be available to address the growing demand for high-resolution, low-cost of ownership lithography."
In his keynote, entitled "Global Collaboration in Semiconductors and Strategies for the Mask Industry," Polcari will share insights on:
* the challenges facing the global semiconductor industry and collaborative approaches being taken to address them,
* how EUV can be the cost-effective lithography solution below 22 nm if issues such as EUV mask defects can be resolved, and
* how a collaborative strategy to develop new metrology tools will enable EUV and benefit the mask industry.
Dr. Polcari has served as president and CEO of SEMATECH since 2003, directing the global consortium's advanced technology and manufacturing programs. Previously, Polcari was vice president of Procurement Engineering for IBM Global Procurement. He holds a doctorate in solid state physics from Stevens Institute of Technology, and has served on various industry and university advisory boards.
In addition to Polcari's address, leading-edge research from SEMATECH's lithography program will be presented during the following SPIE/BACUS sessions:
Session 1: Invited Session
Tuesday, September 15 at 8:30 a.m.
"Mask Industry Assessment: 2009"
Authors: Gregory P. Hughes, Henry K. Yun, SEMATECH
Session 9: EUV Mask Substrates and Processing
Wednesday, September 16 at 8:00 a.m.
"Correlation of overlay performance and reticle substrate non-flatness effects in EUV lithography"
Authors: Sudharshanan Raghunathan, John G. Hartley, Univ. at Albany; Jaewoong Sohn, Kevin Orvek, SEMATECH
Session 19: EUV Mask Contamination and Cleaning
Thursday, September 17 at 8:20 a.m.
"Impact of carbon contamination on EUV masks"
Authors: Yu-Jen Fan, Leonid Yankulin, Gregory P. Denbeaux, Univ. at Albany; Andrea F. WŁest, Francis Goodwin, Sungmin Huh, SEMATECH; Patrick P. Naulleau, Kenneth A. Goldberg, Lawrence Berkeley National Lab.
The 29th Annual SPIE/BACUS Photomask Symposium is the premier worldwide technical conference and exhibition for the photomask industry. This year's symposium will give attendees the chance to hear the latest research on the emerging and on-going issues facing the photomask industry. For more information or to register, please visit spie.org/pm.
For over 20 years, SEMATECHģ (www.sematech.org) has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Today, we continue accelerating the next technology revolution with our nanoelectronics and emerging technology partners.
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Note to editors: To arrange an interview, please contact Erica McGill at or 518-649-1041
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