Nanotechnology Now

Our NanoNews Digest Sponsors







Heifer International

Wikipedia Affiliate Button


Home > Press > SEMATECH President and CEO to Deliver Keynote at SPIE/BACUS Photomask Symposium

Abstract:
Michael Polcari to outline challenges and strategies for the mask industry

SEMATECH President and CEO to Deliver Keynote at SPIE/BACUS Photomask Symposium

Albany, NY and Austin, TX | Posted on September 1st, 2009

At the upcoming SPIE Photomask Technology Symposium SEMATECH President and CEO Dr. Michael R. Polcari will call for increased industry collaboration to close a critical gap in the mask infrastructure for EUV (extreme ultra-violet) lithography. Polcari will address conference attendees on Tuesday, September 15, 2009 at 8:10 a.m. at the Monterey Marriott and Monterey Conference Center in Monterey, CA.

"Although we recognize that there are multiple technologies to meet the semiconductor industry's ever-growing lithography demand, we believe EUV can be the cost-effective solution," said Polcari. "Masks are becoming a major component of lithography costs for advanced semiconductor manufacturing and a mask infrastructure must be available to address the growing demand for high-resolution, low-cost of ownership lithography."

In his keynote, entitled "Global Collaboration in Semiconductors and Strategies for the Mask Industry," Polcari will share insights on:

* the challenges facing the global semiconductor industry and collaborative approaches being taken to address them,

* how EUV can be the cost-effective lithography solution below 22 nm if issues such as EUV mask defects can be resolved, and

* how a collaborative strategy to develop new metrology tools will enable EUV and benefit the mask industry.

Dr. Polcari has served as president and CEO of SEMATECH since 2003, directing the global consortium's advanced technology and manufacturing programs. Previously, Polcari was vice president of Procurement Engineering for IBM Global Procurement. He holds a doctorate in solid state physics from Stevens Institute of Technology, and has served on various industry and university advisory boards.

In addition to Polcari's address, leading-edge research from SEMATECH's lithography program will be presented during the following SPIE/BACUS sessions:

Session 1: Invited Session
Tuesday, September 15 at 8:30 a.m.
"Mask Industry Assessment: 2009"
Authors: Gregory P. Hughes, Henry K. Yun, SEMATECH

Session 9: EUV Mask Substrates and Processing
Wednesday, September 16 at 8:00 a.m.
"Correlation of overlay performance and reticle substrate non-flatness effects in EUV lithography"
Authors: Sudharshanan Raghunathan, John G. Hartley, Univ. at Albany; Jaewoong Sohn, Kevin Orvek, SEMATECH

Session 19: EUV Mask Contamination and Cleaning
Thursday, September 17 at 8:20 a.m.
"Impact of carbon contamination on EUV masks"
Authors: Yu-Jen Fan, Leonid Yankulin, Gregory P. Denbeaux, Univ. at Albany; Andrea F. Wüest, Francis Goodwin, Sungmin Huh, SEMATECH; Patrick P. Naulleau, Kenneth A. Goldberg, Lawrence Berkeley National Lab.

The 29th Annual SPIE/BACUS Photomask Symposium is the premier worldwide technical conference and exhibition for the photomask industry. This year's symposium will give attendees the chance to hear the latest research on the emerging and on-going issues facing the photomask industry. For more information or to register, please visit spie.org/pm.

####

About SEMATECH
For over 20 years, SEMATECH® (www.sematech.org) has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Today, we continue accelerating the next technology revolution with our nanoelectronics and emerging technology partners.

For more information, please click here

Contacts:
Note to editors: To arrange an interview, please contact Erica McGill at or 518-649-1041

Copyright © SEMATECH

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Beautiful "flowers" self-assemble in a beaker: Elaborate nanostructures blossom from a chemical reaction perfected at Harvard May 17th, 2013

Artificial Forest for Solar Water-Splitting: Berkeley Lab Researchers Report First Fully Integrated Artificial Photosynthesis Nanosystem May 17th, 2013

Moth-Inspired Nanostructures Take the Color Out of Thin Films May 17th, 2013

NIA Public Briefing: Nanotechnology and the Council of Europe May 17th, 2013

Chip Technology

UC Riverside scientists discovering new uses for tiny carbon nanotubes: Adding ionic liquid to nanotube films could build smaller gadgets, and create more cost effective 'Smart Windows' that darken in bright sun May 15th, 2013

Nanometrics Announces Upcoming Investor Events May 14th, 2013

HELIOS Program Develops Complete Supply Chain for Integrating Photonics with CMOS Circuit via IC Fabrication Processes May 14th, 2013

Silex Microsystems Joins ENIAC Project PROMINENT To Bring Flexible and Cost Effective Inkjet Technologies to the MEMS Manufacturing Process: Silex Will Develop New Solutions for Through-Silicon Via Manufacture and Hermetic Wafer Bonding May 13th, 2013

Nanomedicine

Nanotechnology could help fight diabetes: Injectable nanogel can monitor blood-sugar levels and secrete insulin when needed May 16th, 2013

Nanobiotix Revenue for the 1st quarter of 2013 May 15th, 2013

Pitt Chemists Demonstrate Nanoscale Alloys So Bright They Could Have Potential Medical Applications: “Think about a particle that will not only help researchers detect cancer sooner but be used to treat the tumor, too.” May 15th, 2013

Using clay to grow bone: Researchers use synthetic silicate to stimulate stem cells into bone cells May 15th, 2013

Announcements

Artificial Forest for Solar Water-Splitting: Berkeley Lab Researchers Report First Fully Integrated Artificial Photosynthesis Nanosystem May 17th, 2013

Moth-Inspired Nanostructures Take the Color Out of Thin Films May 17th, 2013

NIA Public Briefing: Nanotechnology and the Council of Europe May 17th, 2013

Scientists capture first direct proof of Hofstadter butterfly effect May 17th, 2013

Events/Classes

Interactive Printed Products – New Applications Enabled by Organic and Printed Electronics May 16th, 2013

Nanometrics Announces Upcoming Investor Events May 14th, 2013

INSCX™ exchange to present a nanotechnology-based Emission Reduction Programme, Ankara, Turkey, June 2013 May 14th, 2013

VDMA: New “Photonics Industry Report 2013” presented May 14th, 2013

NanoNews-Digest
The latest news from around the world, FREE





  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More












ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project








abbigliamento uomo
Computer Accessories
© Copyright 1999-2013 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE