Nanotechnology Now

Our NanoNews Digest Sponsors





Heifer International

Wikipedia Affiliate Button


android tablet pc

Home > Press > Leti and MAPPER launch IMAGINE Program with Delivery of MAPPER's Massively Parallel Electron Beam Platform

Abstract:
CEA-Leti and MAPPER Lithography announce today that MAPPER has delivered one of its massively parallel electron beam platforms to CEA-Leti

Leti and MAPPER launch IMAGINE Program with Delivery of MAPPER's Massively Parallel Electron Beam Platform

Grenoble, France, and delft, The Netherlands | Posted on July 21st, 2009

This delivery is part of the collaboration program between MAPPER and CEA-Leti targeting development of maskless lithography for IC manufacturing for 22nm and beyond. The 300mm, 110-beam platform will be upgraded over the coming two years to reach industrial maturity. The MAPPER platform is the core technology on which the three-year IMAGINE program is built. This program provides the world's major chip manufacturers with the opportunity to assess the maskless lithography technology in a real manufacturing environment. In addition, this program will develop and qualify the complete infrastructure from data preparation to process integration, in preparation for its industrial introduction.

July 2009 is an important month in MAPPER's history, since we will be shipping our first two machines," said Christopher Hegarty, MAPPER's CEO. "Given CEA-Leti's extensive expertise in e-beam lithography, we are delighted that one of our machines is installed at their fab in line with our roadmap. We are looking forward to working with industry partners to get this technology to a manufacturing level."

Olivier Demolliens, head of Nanotec at CEA-Leti said, "This is a very important step as it is the first attempt to install such equipment in an industrial environment, and we are very excited to do it at CEA-Leti. By sharing developments with our partners, we are on the way to establishing the potential of the multibeam technology and to offer new promising perspectives to the semiconductor industry."

####

About CEA-Leti
CEA is a French Research and Technology Organisation, with activities in three main areas: Energy, Technologies for Information and Healthcare, and Defence and Security. Within CEA, the Laboratory for Electronics & Information Technology (CEA-Leti) works with companies in order to increase their competitiveness through technological innovation and transfers. Leti is focused on micro and nanotechnologies and their applications, from wireless devices and systems, to biology and healthcare or photonics. Nanoelectronics and Microsystems (MEMS) are at the core of its activities. As a major player in MINATEC excellence centre, Leti operates 8,000 m˛ state-of-the-art clean rooms, on 24/7 mode, on 200 mm and 300 mm wafer standards. With 1,200 employees, Leti trains more than 150 Ph.D. students and hosts 200 assignees from partner companies. Strongly committed to the creation of value for the industry, Leti puts a strong emphasis on Intellectual Property and owns more than 1,400 patent families. In 2008, contractual income covered more than 75% of its budget worth 205 M€.

About MAPPER Lithography

MAPPER’s offices are located in Delft, The Netherlands, near Delft University of Technology, one of the company’s shareholders. MAPPER has a headcount of 170 people.

Shareholders of MAPPER also include professional investors – Capital-C Ventures, KT Venture Group, Hoving and Partners, Quest for Growth and KBC Private Equity - and private investors.

MAPPER’s technology:

MAPPER develops lithography machines for the chip industry. These machines utilize a new and innovative technology with which the chips of the future can be made cost effectively. MAPPER´s machine provides a highly cost-effective way of making the next generation of chips because it makes the mask redundant and combines high resolution and high productivity. Current lithography machines use photographic techniques to create minute electrical circuits smaller than 1/100th of a human hair on a silicon wafer. They use a mask which contains the blueprint of the chip and transfer this pattern on to a photosensitive layer (comparable to a photograph being exposed on film).

For more information, please click here

Contacts:
CEA-Leti Contacts:
Bert Jan Kampherbeek
Serge Tedesco
Phone: +31 15888 0250
Phone: +33 4 38 78 49 89


Copyright © CEA-Leti

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Characterizing inkjet inks: Malvern Instruments presents new rheological research April 23rd, 2014

NanoSafe, Inc. announces the addition of the Labconco Protector® Glove Box to its NanoSafe Tested™ registry April 23rd, 2014

Study finds long-term survival of human neural stem cells transplanted into primate brain April 23rd, 2014

High-Performance, Low-Cost Ultracapacitors Built with Graphene and Carbon Nanotubes: Future devices based on technology could bridge gap between batteries and conventional capacitors in portable electronics and hybrid electric vehicles April 23rd, 2014

Chip Technology

Harris & Harris Group Notes the Receipt of Proceeds From the Sale of Molecular Imprints' Semiconductor Business to Canon April 22nd, 2014

Progress made in developing nanoscale electronics: New research directs charges through single molecules April 21st, 2014

'Exotic' material is like a switch when super thin April 18th, 2014

Scientists open door to better solar cells, superconductors and hard-drives: Research enhances understanding of materials interfaces April 14th, 2014

Nanoelectronics

Progress made in developing nanoscale electronics: New research directs charges through single molecules April 21st, 2014

Better solar cells, better LED light and vast optical possibilities April 12th, 2014

Catching the (Invisible) Wave: UC Santa Barbara researchers create a unique semiconductor that manipulates light in the invisible infrared/terahertz range, paving the way for new and enhanced applications April 11th, 2014

Nanotech Business Review 2013-2014 April 9th, 2014

Announcements

Characterizing inkjet inks: Malvern Instruments presents new rheological research April 23rd, 2014

NanoSafe, Inc. announces the addition of the Labconco Protector® Glove Box to its NanoSafe Tested™ registry April 23rd, 2014

Study finds long-term survival of human neural stem cells transplanted into primate brain April 23rd, 2014

High-Performance, Low-Cost Ultracapacitors Built with Graphene and Carbon Nanotubes: Future devices based on technology could bridge gap between batteries and conventional capacitors in portable electronics and hybrid electric vehicles April 23rd, 2014

Tools

Characterizing inkjet inks: Malvern Instruments presents new rheological research April 23rd, 2014

MRI, on a molecular scale: Researchers develop system that could one day peer into the atomic structure of individual molecules April 20th, 2014

Oxford Instruments Asylum Research Introduces the MFP-3D InfinityTM AFM Featuring Powerful New Capabilities and Stunning High Performance April 18th, 2014

More effective kidney stone treatment, from the macroscopic to the nanoscale April 17th, 2014

NanoNews-Digest
The latest news from around the world, FREE







  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More














ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2014 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE