Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > Press > EV Group to Collaborate with Applied Materials On Thin Wafer Bonding Technology for 3D IC Development

Abstract:
EV Group (EVG) today announced a joint effort with Applied Materials, Inc. to develop wafer bonding processes for the manufacture of through-silicon vias (TSVs) in three-dimensional integrated circuit (3D IC) packaging applications. The two companies will be working together as members of the EMC-3D Semiconductor 3D Equipment and Materials Consortium.

EV Group to Collaborate with Applied Materials On Thin Wafer Bonding Technology for 3D IC Development

St. Florian, Austria | Posted on July 16th, 2009

Growing consumer demand for smaller, lower-power electronic devices with greater functionality is driving the need for TSV technology - a new approach to increase packaging density by vertically stacking chips. However, while conventional ICs use wafers approximately 750-um thick, 3D ICs require thinner wafers of about 100 um or less. Processed by themselves, these paper-thin wafers lose structural and edge integrity in high-temperature, high-stress processes such as metallization, which poses manufacturing challenges and impacts device reliability. EVG and Applied will work together to address these issues by bonding temporary carrier wafers to device wafers prior to thinning. The carriers will support the ultra-thin device wafers during subsequent process steps and can be removed afterwards.

The collaboration will explore the use of silicon and glass carrier wafers to determine substrate stability using EVG's wafer bonding and thin-wafer handling expertise and Applied's advanced etch, CVD, PVD and CMP process systems. The goal of this effort is to yield baseline processes and recommendations for the use of carrier-mounted wafers throughout the individual process steps offered by both parties. Results from the partnership will be shared with EMC-3D member companies.

"This is a continuation of our strategy to form alliances with leading equipment suppliers such as EVG to deliver fully-characterized TSV process flows to accelerate customers' time to market," said Hans Stork, group vice president and chief technology officer of Applied's Silicon Systems Group. "We look forward to working with EVG at Applied's Maydan Technology Center in advancing this disruptive technology and expediting the adoption of TSVs for mainstream manufacturing."

"We are excited to collaborate with an industry leader like Applied, to expedite temporary bonding and debonding capabilities for 3D IC development," said Markus Wimplinger, Corporate Technology Development and IP Director at EV Group "As a co-founder of EMC-3D, EVG is committed to the consortium's mission to develop cost-effective and manufacturable TSVs for advanced semiconductors. This opportunity to work with Applied complements those efforts and brings us closer to realizing 3D IC production for our customers."

About Applied Materials

Applied Materials, Inc. is the global leader in Nanomanufacturing Technology(TM) solutions with a broad portfolio of innovative equipment, service and software products for the fabrication of semiconductor chips, flat panels, solar photovoltaic cells, flexible electronics and energy efficient glass. At Applied Materials, we apply Nanomanufacturing Technology to improve the way people live. Learn more at www.appliedmaterials.com.

####

About EV Group (EVG)
EV Group (EVG) is a world leader in wafer-processing solutions for semiconductor, MEMS and nanotechnology applications. Through close collaboration with its global customers, the company implements its flexible manufacturing model to develop reliable, high-quality, low-cost-of-ownership systems that are easily integrated into customers' fab lines. Key products include wafer bonding, lithography/nanoimprint lithography (NIL) and metrology equipment, as well as photoresist coaters, cleaners and inspection systems.

In addition to its leading market share for wafer bonders, EVG holds a leading position in NIL and lithography for advanced packaging and MEMS. Along these lines, the company co-founded the EMC-3D consortium in 2006 to create and help drive implementation of a cost-effective through-silicon via (TSV) process for major ICs and MEMS/sensors. Other target semiconductor-related markets include silicon-on-insulator (SOI), compound semiconductor and silicon-based power-device solutions.

Founded in 1980, EVG is headquartered in St. Florian, Austria, and operates via a global customer support network, with subsidiaries in Tempe, Ariz.; Albany, N.Y.; Yokohama and Fukuoka, Japan; Seoul, Korea and Chung-Li, Taiwan. The company's unique Triple i-approach (invent - innovate - implement) is supported by a vertical integration, allowing EVG to respond quickly to new technology developments, apply the technology to manufacturing challenges and expedite device manufacturing in high volume. More information is available at www.EVGroup.com.

* CVD = chemical vapor deposition; PVD = physical vapor deposition; CMP = chemical-mechanical planarization

For more information, please click here

Copyright © PR Newswire Association LLC.

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

A big nano boost for solar cells: Kyoto University and Osaka Gas effort doubles current efficiencies January 21st, 2017

A toolkit for transformable materials: How to design materials with reprogrammable shape and function January 20th, 2017

Explaining how 2-D materials break at the atomic level January 20th, 2017

New research helps to meet the challenges of nanotechnology: Research helps to make the most of nanoscale catalytic effects for nanotechnology January 20th, 2017

Chip Technology

Explaining how 2-D materials break at the atomic level January 20th, 2017

New research helps to meet the challenges of nanotechnology: Research helps to make the most of nanoscale catalytic effects for nanotechnology January 20th, 2017

Ultra-precise chip-scale sensor detects unprecedentedly small changes at the nanoscale January 20th, 2017

Nanometrics to Announce Fourth Quarter and Full Year Financial Results on February 7, 2017 January 19th, 2017

Announcements

A big nano boost for solar cells: Kyoto University and Osaka Gas effort doubles current efficiencies January 21st, 2017

A toolkit for transformable materials: How to design materials with reprogrammable shape and function January 20th, 2017

New research helps to meet the challenges of nanotechnology: Research helps to make the most of nanoscale catalytic effects for nanotechnology January 20th, 2017

Ultra-precise chip-scale sensor detects unprecedentedly small changes at the nanoscale January 20th, 2017

Alliances/Trade associations/Partnerships/Distributorships

GLOBALFOUNDRIES Expands Partner Program to Speed Time-to-Market of FDX™ Solutions: Increased support affirms FDXcelerator™ Program’s vital role in promoting broader deployment of GLOBALFOUNDRIES’ FDX™ portfolio December 15th, 2016

Infrared instrumentation leader secures exclusive use of Vantablack coating December 5th, 2016

Leti and Grenoble Partners Demonstrate World’s 1st Qubit Device Fabricated in CMOS Process: Paper by Leti, Inac and University of Grenoble Alpes Published in Nature Communications November 28th, 2016

Mechanism for sodium storage in 2-D material: Tin selenide is an effective host for storing sodium ions, making it a promising material for sodium ion batteries October 27th, 2016

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project