Nanotechnology Now

Our NanoNews Digest Sponsors





Heifer International

Wikipedia Affiliate Button


android tablet pc

Home > Press > Replisaurus and Leti Partner to Drive Innovative Metallization Technology Into Final Stages

Abstract:
As Company Prepares Clean ECPR Technology for Chip Market, Leti Collaboration Will Boost Mastering Fabrication Process

Replisaurus and Leti Partner to Drive Innovative Metallization Technology Into Final Stages

KISTA, Sweden | Posted on July 7th, 2009

Replisaurus Technologies, Inc. today announced a common laboratory agreement with CEA-Leti, which maintains one of the world's leading research centers for applied electronics in Grenoble, France. The agreement marks a major step towards commercialization of Replisaurus' innovative ElectroChemical Pattern Replication (ECPR™) metallization process, and allows the company to move full speed ahead as it prepares to meet the high-volume, short cycle demands of the device interconnect market.

Under the multi-year agreement, Replisaurus and Leti personnel will collaborate and take advantage of the lab's extensive manufacturing facilities, experience in both semiconductor and MEMS technology, and expertise with 200mm and 300mm wafer technologies. The team will initially focus on optimizing the development of reusable master electrodes, a key component of the ECPR process which employs a template to fabricate metal patterns in a single replication step. They will also investigate the opportunities for ECPR in new applications, notably in key growth sectors such as integrated passives, copper pillars and 3D integration. The team will optimize electrode design and fabrication flow for each application area, ensuring the best yield, endurance and cycle time.

In order to create a platform to build its mastering business, Replisaurus has started a new company called Replisaurus Mastering, and the program is already up and running at Leti's facility in Grenoble.

"The mastering process is a central part of our business model and a unique component of our technology, so Leti's practical, business-oriented approach to IP rights was a major factor in our decision to partner with them," said James Quinn, CEO of Replisaurus. "We are moving forward according to plans to roll out our technology, and through this partnership Leti will support us in transferring it to a foundry partner."

The ECPR process reduces metallization complexity and accelerates production by eliminating many steps from the traditional process. ECPR also provides improved patterning and significant cost and time savings, with a fab-friendly, environmentally clean process that doesn't use solvents or strippers. Along with its significant environmental benefits, ECPR reduces metallization complexity, boosts production speed, and represents a genuine step forward for the chip industry.

"This new project with Replisaurus is a very exciting challenge as we help integrate its innovative clean metallization technology into a high-volume manufacturing solution. All of the necessary technical developments are already underway, and this collaboration got off to a great start," said Laurent Malier, general manager of CEA-Leti. "In addition, access to ECPR technology through this agreement will enable Leti to position itself at the leading edge of research into advanced interconnect and device packaging technologies for diverse applications."

The development program will explore 3D technology and applications and employ technology from Replisaurus subsidiary SET, including the FC300, a high-accuracy, high force device bonder system for die-to-die and die-to-wafer bonding on wafers up to 300mm.

"CEA-Leti has advanced capabilities with CMOS and MEMS applications that will be a great testbed for our technology as we look to apply it in other application areas," said Alan Cuthbertson, vice president of Mastering Technology at Replisaurus. "We will focus on 200mm silicon and 300mm through this project and Leti's world-class facility is the perfect place to enhance our technology for the chip market."

####

About Replisaurus Technologies, Inc.
Replisaurus Technologies, Inc. has developed a revolutionary metallization technology targeted at key growth markets such as integrated passives, copper pillars and 3D integration (TSV). The ElectroChemical Pattern Replication (ECPR™) process offers a simple and cost effective integrated solution eliminating several traditional process steps thereby reducing complexity. ECPR is a fab-friendly, environmentally clean process which does not use any solvents, developers or strippers and has extremely fast plating rates. In 2008, Replisaurus acquired SET, a world leading supplier of high accuracy die-to-die, die-to-wafer bonding and nanoimprint lithography solutions.

About CEA-Leti

CEA is a French public research and technology organisation, with activities in three main areas: Energy, Technologies for Information and Healthcare, and Defence and Security. Within CEA, the Laboratory for Electronics & Information Technology (Leti) works with companies in order to increase their competitiveness through technological innovation and transfers. Leti is focused on micro and nanotechnologies and their applications, from wireless devices and systems, to biology and healthcare or photonics. Nanoelectronics and Microsystems (MEMS) are at the core of its activities. As a major player in MINATEC excellence centre, Leti operates 8,000 m² state-of-the-art clean rooms, in 24/7 mode, on 200 mm and 300 mm wafer standards. With 1,200 employees, Leti trains more than 150 Ph.D. students and hosts 200 assignees from partner companies. Strongly committed to the creation of value for the industry, Leti puts a strong emphasis on Intellectual Property and owns more than 1,400 patent families. In 2008, contractual income covered more than 75% of its budget worth 205 M€. For more information, visit www.leti.fr.

For more information, please click here

Contacts:
Replisaurus:
James Quinn
CEO
Phone: +46 70 66 55 160


Agency:
Sarah Lyle Dampoux
Phone: +33 1 58 18 59 30


CEA-Leti :
Clément Moulet
Attaché de presse
Téléphone : +33 4 38 78 03 26

Copyright © Replisaurus Technologies, Inc.

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Imec Reports Four Percent Growth for 2013 Fiscal Year End —Continues to Accelerate Innovation Through Global Collaborations and Technological Breakthroughs in Nanoelectronics— April 24th, 2014

Multicapacity Microreactor for Catalyst Characterisation April 24th, 2014

Making graphene work for real-world devices: Fundamental research in phonon scattering helps researchers design graphene materials for applications April 24th, 2014

Return on investment for kit and promotion materials April 24th, 2014

Laboratories

Atomic switcheroo explains origins of thin-film solar cell mystery April 23rd, 2014

Berkeley Lab Researchers Demonstrate First Size-based Chromatography Technique for the Study of Living Cells April 22nd, 2014

'Life Redesigned: The Emergence of Synthetic Biology' Lecture at Brookhaven Lab on Wednesday, April 30: Biomedical Engineer James Collins to Speak for BSA Distinguished Lecture Series April 16th, 2014

Relieving electric vehicle range anxiety with improved batteries: Lithium-sulfur batteries last longer with nanomaterial-packed cathode April 16th, 2014

Chip Technology

Making graphene work for real-world devices: Fundamental research in phonon scattering helps researchers design graphene materials for applications April 24th, 2014

Return on investment for kit and promotion materials April 24th, 2014

Harris & Harris Group Notes the Receipt of Proceeds From the Sale of Molecular Imprints' Semiconductor Business to Canon April 22nd, 2014

Progress made in developing nanoscale electronics: New research directs charges through single molecules April 21st, 2014

Announcements

Imec Reports Four Percent Growth for 2013 Fiscal Year End —Continues to Accelerate Innovation Through Global Collaborations and Technological Breakthroughs in Nanoelectronics— April 24th, 2014

Multicapacity Microreactor for Catalyst Characterisation April 24th, 2014

Making graphene work for real-world devices: Fundamental research in phonon scattering helps researchers design graphene materials for applications April 24th, 2014

Return on investment for kit and promotion materials April 24th, 2014

NanoNews-Digest
The latest news from around the world, FREE







  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More














ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2014 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE