Nanotechnology Now

Our NanoNews Digest Sponsors





Heifer International

Wikipedia Affiliate Button


android tablet pc

Home > Press > Proximity Effect Correction software seamlessly integrates with Nanometer Pattern Generation Systems

SEM micrograph of 20nm lines, 50nm pitch that highlights very stable and dense HSQ structure using the optimal doses provided by the NanoMaker software.  HSQ resist thickness is 180nm.
SEM micrograph of 20nm lines, 50nm pitch that highlights very stable and dense HSQ structure using the optimal doses provided by the NanoMaker software. HSQ resist thickness is 180nm.

Abstract:
The NanoMaker Workbench software automatically generates a Proximity Effect Corrected runfile, compatible with NPGS systems, for SEM-based electron beam lithography.

Proximity Effect Correction software seamlessly integrates with Nanometer Pattern Generation Systems

North Billerica, MA | Posted on May 20th, 2009

The newly designed NanoMaker software has been successfully demonstrated at the Nanoscale Integration Laboratory, University of Texas at Dallas. The hardware platform included a Zeiss Supra 40 Field Emission Scanning Electron Microscope (SEM) with a NPGS 9.2 pattern generator.

The experiment consisted of fabricating 20nm and 25nm lines with 50nm and 100nm pitched arrays, respectively, separated by a large solid rectangle in the middle. The HSQ resist thickness on Si was 180nm. Before using the NanoMaker Proximity Effect Correction (PEC) software, many different doses were tried to fabricate the structure correctly without success. Upon using the NanoMaker PEC software, the optimal doses were automatically assigned, the data exported to the NPGS, and the device was successfully fabricated.

"Usually, it is difficult to fabricate dense nanolines with higher aspect ratios because of the proximity effect," states Professor Walter Hu, of the Nanoscale Integration Lab at UTD, "The preliminary NanoMaker results that show its ability to get down to uniform 20nm lines in width with 50nm pitch is remarkable."

Scanning Electron Microscopes are typically limited in acceleration voltage to 30kV. This is where proximity effects are dominant. For organizations that need to create dense nano-patterns with a SEM, the NanoMaker design and PEC software package adds tremendous value to existing NPGS systems.

Your browser may not support display of this image."We are grateful to Professor Walter Hu and his team for allowing us the opportunity to prove the power of the NanoMaker software," states Dr. Sergey Zaitsev, CTO of NanoMaker and Head of the Theoretical Department at the Institute of Microelectronics Technology - Russian Academy of Sciences (IMT RAS), "We look forward to a continued partnership with UTD and other research institutes interested in electron/ion beam fabrication of nanodevices and structures using the NanoMaker system."

####

About SEMTech Solutions, Inc.
NanoMaker is a powerful software/hardware system for SEM/FIB based lithography that is intended for state-of-the-art design and manufacturing of micro and nano electronic devices and structures. For more information on the NanoMaker software/hardware system, visit www.nanomaker.com, or contact our North American representative directly at SEMTech Solutions, (978) 663-9822, www.semtechsolutions.com.

About the Nanoscale Integration Laboratory at UTD:

The Nanoscale Integration Laboratory is focused on integrating nanoscale elements of electronics, chemistry, and biology. Such nano-bio-engineering fusion may provide rare opportunities to explore new science and applications. For more information visit the Nanoscale Integration Laboratory website at the University of Texas at Dallas.

For more information, please click here

Contacts:
Gary Brake, Marketing Manager
SEMTech Solutions, Inc.
(978) 663-9822 x235

Copyright © NanoMaker

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

JPK announces expansion of its global sales and service activities in China and USA April 15th, 2014

Nanobiotix Appoints Thierry Otin as Head of Manufacturing and Supply April 15th, 2014

PAM-XIAMEN Offers UV LED wafer April 15th, 2014

Engineers develop new materials for hydrogen storage April 15th, 2014

Software

New Integrated Raman Spectroscopy & Imaging Software from CRAIC Technologies: CRAIC Technologies introduces Lambdafire-R™ integrated Raman microspectroscopy & imaging software for Windows 8 ® March 26th, 2014

First methodology to analyse nanometer line pattern images March 18th, 2014

Agilent Technologies to Demonstrate New PXI Functional Test System at IPC APEX EXPO March 17th, 2014

Thin Film Thickness Measurements of Sub-Micron Sampling Areas from CRAIC Technologies February 28th, 2014

Chip Technology

Scientists open door to better solar cells, superconductors and hard-drives: Research enhances understanding of materials interfaces April 14th, 2014

Obducat has launched a new generation of SINDRE® Nano Imprint production system April 11th, 2014

Scientists in Singapore develop novel ultra-fast electrical circuits using light-generated tunneling currents April 10th, 2014

Clean Shot at Manufacturing Course…For Less April 9th, 2014

Announcements

Tiny particles could help verify goods: Chemical engineers hope smartphone-readable microparticles could crack down on counterfeiting April 15th, 2014

A molecular approach to solar power: Switchable material could harness the power of the sun — even when it’s not shining April 15th, 2014

Targeting cancer with a triple threat: MIT chemists design nanoparticles that can deliver three cancer drugs at a time April 15th, 2014

Biologists Develop Nanosensors to Visualize Movements and Distribution of Plant Stress Hormone April 15th, 2014

Tools

JPK announces expansion of its global sales and service activities in China and USA April 15th, 2014

Affordable High Precision XY Nanopositioning Piezo Stage April 15th, 2014

Obducat has launched a new generation of SINDRE® Nano Imprint production system April 11th, 2014

Catching the (Invisible) Wave: UC Santa Barbara researchers create a unique semiconductor that manipulates light in the invisible infrared/terahertz range, paving the way for new and enhanced applications April 11th, 2014

NanoNews-Digest
The latest news from around the world, FREE







  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More














ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2014 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE