Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > Press > TOK Signs an LOI to Join SEMATECH for Joint Development on Next Generation Photoresists for EUV Lithography

Abstract:
Collaboration at UAlbany NanoCollege will address resolution, line-width roughness, and pattern collapse challenges

TOK Signs an LOI to Join SEMATECH for Joint Development on Next Generation Photoresists for EUV Lithography

Albany, NY and Austin, TX | Posted on February 24th, 2009

SEMATECH, a global consortium of chipmakers, announced today that it has signed a Letter of Intent (LOI) with Tokyo Ohka Kogyo Co., Ltd. (TOK), a leading manufacturer of photoresists, establishing the groundwork for a joint development agreement on collaborative efforts to optimize and develop new advanced imaging materials for extreme ultraviolet (EUV) lithography.

As a Resist member of SEMATECH's lithography program, TOK will collaborate with experts at SEMATECH's EUV Resist and Materials Development Center (RMDC) at the College of Nanoscale Science and Engineering (CNSE) of the University at Albany to develop and demonstrate advanced EUV photoresist for use at the 22 nm node and beyond.

"This LOI sets out the framework for a new level of collaboration between SEMATECH and TOK on next generation EUVL technologies," said John Warlaumont, vice president of advanced technologies, SEMATECH. "We believe that the ability and experience of TOK combined with SEMATECH's expertise in EUV photoresist will accelerate our progress in tackling key challenges - such as resolution, line-width roughness, and pattern collapse - in the critical area of advanced imaging."

"As the world-class research and development capabilities at the UAlbany NanoCollege enable critical advances in EUV technology, the addition of TOK to the SEMATECH-CNSE partnership will serve to enhance and expand those efforts," said Richard Brilla, vice president for strategy, alliances and consortia at CNSE. "We are delighted to welcome TOK to CNSE's Albany NanoTech, where it joins the growing number of worldwide corporate partners who recognize New York's global leadership in nanoscale education, innovation and economic development."

Over the past year, significant advances in EUV resists have been enabled by SEMATECH's EUV RMDC through its two micro-exposure tools (METs) located at the CNSE and at Lawrence Berkeley National Laboratory. Through SEMATECH's EUV resist development program, engineers and resist suppliers have made significant progress in improving resist resolution; the most recent results have demonstrated 22 nm half-pitch resolution.

The goal of SEMATECH's RMDC is to provide world-class exposure capability and serve as the leading center for supplier resist and materials research to enable 22 nm patterning technologies and beyond. As part of its ongoing effort to create flexible participation options for materials and equipment manufacturers, SEMATECH has opened its resist program to participation from companies such as TOK, to enable broader and deeper partnerships for advanced materials development.



About TOK:

Tokyo Ohka Kogyo Co.,Ltd is a leading manufacturer of photoresists, focusing on semiconductor photoresists and photoresist, ancillary chemical l, as well as LCD photoresists, dielectric materials, and processing equipment for semiconductors and LCDs. TOK, as it is commonly referred to in the industry (www.tok.co.jp), also has subsidiaries in the United States, Europe, and several Asian countries.



About CNSE:

The UAlbany CNSE is the first college in the world dedicated to research, development, education, and deployment in the emerging disciplines of nanoscience, nanoengineering, nanobioscience, and nanoeconomics. In May 2007, it was ranked as the world's number one college for nanotechnology and microtechnology in the Annual College Ranking by Small Times magazine. CNSE's Albany NanoTech complex is the most advanced research enterprise of its kind at any university in the world: a $4.5 billion, 450,000-square-foot complex that attracts corporate partners from around the world and offers students a one-of-a-kind academic experience. The UAlbany NanoCollege houses the only fully-integrated, 300mm wafer, computer chip pilot prototyping and demonstration line within 65,000 square feet of Class 1 capable cleanrooms. More than 2,000 scientists, researchers, engineers, students, and faculty work on site at CNSE's Albany NanoTech complex, from companies including IBM, AMD, SEMATECH, Toshiba, ASML, Applied Materials, Tokyo Electron, Vistec Lithography and Freescale. An expansion currently underway will increase the size of CNSE's Albany NanoTech complex to over 800,000 square feet, including over 80,000 square feet of Class 1 capable cleanroom space, to house over 2,500 scientists, researchers, engineers, students, and faculty by mid-2009. For more information, visit www.cnse.albany.edu.

####

About SEMATECH
For 20 years, SEMATECH® (www.sematech.org) has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Today, we continue accelerating the next technology revolution with our nanoelectronics and emerging technology partners.

For more information, please click here

Contacts:
Erica McGill
SEMATECH | Media Relations
257 Fuller Road | Suite 2200 | Albany, NY | 12203
o: 518-649-1041 | m: 518-487-8256

Copyright © SEMATECH

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Particles from outer space are wreaking low-grade havoc on personal electronics February 19th, 2017

Liquid metal nano printing set to revolutionize electronics: Creating integrated circuits just atoms thick February 18th, 2017

Engineers shrink microscope to dime-sized device February 17th, 2017

Francis Alexander Named Deputy Director of Brookhaven Lab's Computational Science Initiative February 16th, 2017

Chip Technology

Particles from outer space are wreaking low-grade havoc on personal electronics February 19th, 2017

Liquid metal nano printing set to revolutionize electronics: Creating integrated circuits just atoms thick February 18th, 2017

Research opens door to smaller, cheaper, more agile communications tech February 16th, 2017

Research reveals novel quantum state in strange insulating materials February 14th, 2017

Announcements

Particles from outer space are wreaking low-grade havoc on personal electronics February 19th, 2017

Liquid metal nano printing set to revolutionize electronics: Creating integrated circuits just atoms thick February 18th, 2017

Engineers shrink microscope to dime-sized device February 17th, 2017

Francis Alexander Named Deputy Director of Brookhaven Lab's Computational Science Initiative February 16th, 2017

Alliances/Trade associations/Partnerships/Distributorships

Leti Coordinating Project to Adapt Obstacle-Detection Technology Used in Autonomous Cars for Portable and Wearable Systems: INSPEX to Combine Knowhow of Nine European Organizations to Create Portable and Wearable Spatial-Exploration Systems February 2nd, 2017

GLOBALFOUNDRIES Expands Partner Program to Speed Time-to-Market of FDX™ Solutions: Increased support affirms FDXcelerator™ Program’s vital role in promoting broader deployment of GLOBALFOUNDRIES’ FDX™ portfolio December 15th, 2016

Infrared instrumentation leader secures exclusive use of Vantablack coating December 5th, 2016

Leti and Grenoble Partners Demonstrate World’s 1st Qubit Device Fabricated in CMOS Process: Paper by Leti, Inac and University of Grenoble Alpes Published in Nature Communications November 28th, 2016

Research partnerships

Graphene foam gets big and tough: Rice University's nanotube-reinforced material can be shaped, is highly conductive February 13th, 2017

Cedars-Sinai, UCLA Scientists Use New ‘Blood Biopsies’ With Experimental Device to Speed Cancer Diagnosis and Predict Disease Spread: Leading-Edge Research Is Part of National Cancer Moonshot Initiative February 13th, 2017

Highly sensitive gas sensors for volatile organic compound detection February 6th, 2017

UCLA physicists map the atomic structure of an alloy: Researchers measured the coordinates of more than 23,000 atoms in a technologically important material February 3rd, 2017

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project