Nanotechnology Now

Our NanoNews Digest Sponsors


Heifer International

Wikipedia Affiliate Button

Home > Press > TOK Signs an LOI to Join SEMATECH for Joint Development on Next Generation Photoresists for EUV Lithography

Abstract:
Collaboration at UAlbany NanoCollege will address resolution, line-width roughness, and pattern collapse challenges

TOK Signs an LOI to Join SEMATECH for Joint Development on Next Generation Photoresists for EUV Lithography

Albany, NY and Austin, TX | Posted on February 24th, 2009

SEMATECH, a global consortium of chipmakers, announced today that it has signed a Letter of Intent (LOI) with Tokyo Ohka Kogyo Co., Ltd. (TOK), a leading manufacturer of photoresists, establishing the groundwork for a joint development agreement on collaborative efforts to optimize and develop new advanced imaging materials for extreme ultraviolet (EUV) lithography.

As a Resist member of SEMATECH's lithography program, TOK will collaborate with experts at SEMATECH's EUV Resist and Materials Development Center (RMDC) at the College of Nanoscale Science and Engineering (CNSE) of the University at Albany to develop and demonstrate advanced EUV photoresist for use at the 22 nm node and beyond.

"This LOI sets out the framework for a new level of collaboration between SEMATECH and TOK on next generation EUVL technologies," said John Warlaumont, vice president of advanced technologies, SEMATECH. "We believe that the ability and experience of TOK combined with SEMATECH's expertise in EUV photoresist will accelerate our progress in tackling key challenges - such as resolution, line-width roughness, and pattern collapse - in the critical area of advanced imaging."

"As the world-class research and development capabilities at the UAlbany NanoCollege enable critical advances in EUV technology, the addition of TOK to the SEMATECH-CNSE partnership will serve to enhance and expand those efforts," said Richard Brilla, vice president for strategy, alliances and consortia at CNSE. "We are delighted to welcome TOK to CNSE's Albany NanoTech, where it joins the growing number of worldwide corporate partners who recognize New York's global leadership in nanoscale education, innovation and economic development."

Over the past year, significant advances in EUV resists have been enabled by SEMATECH's EUV RMDC through its two micro-exposure tools (METs) located at the CNSE and at Lawrence Berkeley National Laboratory. Through SEMATECH's EUV resist development program, engineers and resist suppliers have made significant progress in improving resist resolution; the most recent results have demonstrated 22 nm half-pitch resolution.

The goal of SEMATECH's RMDC is to provide world-class exposure capability and serve as the leading center for supplier resist and materials research to enable 22 nm patterning technologies and beyond. As part of its ongoing effort to create flexible participation options for materials and equipment manufacturers, SEMATECH has opened its resist program to participation from companies such as TOK, to enable broader and deeper partnerships for advanced materials development.



About TOK:

Tokyo Ohka Kogyo Co.,Ltd is a leading manufacturer of photoresists, focusing on semiconductor photoresists and photoresist, ancillary chemical l, as well as LCD photoresists, dielectric materials, and processing equipment for semiconductors and LCDs. TOK, as it is commonly referred to in the industry (www.tok.co.jp), also has subsidiaries in the United States, Europe, and several Asian countries.



About CNSE:

The UAlbany CNSE is the first college in the world dedicated to research, development, education, and deployment in the emerging disciplines of nanoscience, nanoengineering, nanobioscience, and nanoeconomics. In May 2007, it was ranked as the world's number one college for nanotechnology and microtechnology in the Annual College Ranking by Small Times magazine. CNSE's Albany NanoTech complex is the most advanced research enterprise of its kind at any university in the world: a $4.5 billion, 450,000-square-foot complex that attracts corporate partners from around the world and offers students a one-of-a-kind academic experience. The UAlbany NanoCollege houses the only fully-integrated, 300mm wafer, computer chip pilot prototyping and demonstration line within 65,000 square feet of Class 1 capable cleanrooms. More than 2,000 scientists, researchers, engineers, students, and faculty work on site at CNSE's Albany NanoTech complex, from companies including IBM, AMD, SEMATECH, Toshiba, ASML, Applied Materials, Tokyo Electron, Vistec Lithography and Freescale. An expansion currently underway will increase the size of CNSE's Albany NanoTech complex to over 800,000 square feet, including over 80,000 square feet of Class 1 capable cleanroom space, to house over 2,500 scientists, researchers, engineers, students, and faculty by mid-2009. For more information, visit www.cnse.albany.edu.

####

About SEMATECH
For 20 years, SEMATECH® (www.sematech.org) has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Today, we continue accelerating the next technology revolution with our nanoelectronics and emerging technology partners.

For more information, please click here

Contacts:
Erica McGill
SEMATECH | Media Relations
257 Fuller Road | Suite 2200 | Albany, NY | 12203
o: 518-649-1041 | m: 518-487-8256

Copyright © SEMATECH

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Ultra-flat circuits will have unique properties: Rice University lab studies 2-D hybrids to see how they differ from common electronics July 25th, 2016

Attosecond physics: Mapping electromagnetic waveforms July 25th, 2016

Borrowing from pastry chefs, engineers create nanolayered composites: Method to stack hundreds of nanoscale layers could open new vistas in materials science July 25th, 2016

Integration of novel materials with silicon chips makes new 'smart' devices possible July 25th, 2016

Chip Technology

Ultra-flat circuits will have unique properties: Rice University lab studies 2-D hybrids to see how they differ from common electronics July 25th, 2016

Attosecond physics: Mapping electromagnetic waveforms July 25th, 2016

Borrowing from pastry chefs, engineers create nanolayered composites: Method to stack hundreds of nanoscale layers could open new vistas in materials science July 25th, 2016

Integration of novel materials with silicon chips makes new 'smart' devices possible July 25th, 2016

Announcements

Borrowing from pastry chefs, engineers create nanolayered composites: Method to stack hundreds of nanoscale layers could open new vistas in materials science July 25th, 2016

Integration of novel materials with silicon chips makes new 'smart' devices possible July 25th, 2016

Accurate design of large icosahedral protein nanocages pushes bioengineering boundaries: Scientists used computational methods to build ten large, two-component, co-assembling icosahedral protein complexes the size of small virus coats July 25th, 2016

XEI Scientific Partners with Electron Microscopy Sciences to Promote and Sell its Products in North and South America July 25th, 2016

Alliances/Trade associations/Partnerships/Distributorships

XEI Scientific Partners with Electron Microscopy Sciences to Promote and Sell its Products in North and South America July 25th, 2016

Leti and Korea Institute of Science and Technology to Explore Collaboration on Advanced Technologies for Digital Era July 14th, 2016

Nanosystem and Digital Surf launch NanoMap Alpha: New surface imaging & metrology software based on Mountains® Technology July 14th, 2016

FEI and King Abdullah University of Science and Technology Establish New Electron Microscopy ‘Centre of Excellence’: Centre of Excellence involves materials and life sciences research and technical collaboration July 5th, 2016

Research partnerships

Quantum drag:University of Iowa physicist says current in one iron magnetic sheet can create quantized spin waves in another, separate sheet July 22nd, 2016

Rice's 'antenna-reactor' catalysts offer best of both worlds: Technology marries light-harvesting nanoantennas to high-reaction-rate catalysts July 18th, 2016

Researchers invent 'smart' thread that collects diagnostic data when sutured into tissue: Advances could pave way for new generation of implantable and wearable diagnostics July 18th, 2016

Leti and Korea Institute of Science and Technology to Explore Collaboration on Advanced Technologies for Digital Era July 14th, 2016

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







Car Brands
Buy website traffic