- About Us
- Career Center
- Nano-Social Network
- Nano Consulting
- My Account
Call for Papers in Progress
Veeco Instruments Inc. (Nasdaq: VECO), the leading provider of atomic force microscopes (AFMs) to the nanoscience community, announced today that it will host the "Seeing at the Nanoscale VII" conference at the University of California, Santa Barbara (UCSB), July 28-31, 2009. Celebrating its seventh year, the conference provides the optimum forum for academic and industrial scientists to share information and exchange ideas on a wide variety of advanced nanotechnology topics, ranging from novel imaging approaches and unique material characterization to combining AFM with other technologies, such as confocal microscopy and Raman spectroscopy. This year there is also a special session on emerging AFM markets, such as energy generation, storage and conservation. Abstracts for oral and poster presentations are now being accepted at www.veeco.com/nanoconference.
The 2009 Seeing at the Nanoscale conference is chaired by David Awschalom, UCSB, and co-chaired by James Gimzewski, UCLA. In addition to invited presentations from each session chair, the conference will also feature oral presentations by Jun Hu of the Institute of Applied Physics, China; Hirofumi Yamada of Kyoto University, Japan; and co-chair James Gimzewski.
Professor Gimzewski, one of the pioneers of nanotechnology and SPM, commented, "In light of the physical manipulation capabilities of AFM, Seeing at the Nanoscale is increasingly ‘feeling' at the nanoscale. The conference has become a great venue to hear about cutting-edge developments in enabling tools for nanotechnology, biology and medicine."
"The focused conference sessions and poster presentations allow hundreds of researchers from around the world to network and collaborate while addressing a select range of AFM-enabled discoveries. This process helps to accelerate global advances in nanoscience and nanotechnology." said Chanmin Su, Director of AFM Technology at Veeco.
In conjunction with the three-day conference, Veeco will host an extensive one-day training course covering a variety of AFM techniques, such as HarmoniX™ Material Property Mapping and Microscope Image Registration Overlay (MIRO). Conference sessions for 2009 include:
Session 1: Force Probing and Imaging Biology to the Nanoscopic Scale
Chair: Daniel Müeller, Dresden University of Technology, Germany
Session 2: Next-Generation Materials and Polymer Systems
Chair: Sergei Sheiko, University of North Carolina, USA
Session 3: Beyond Topography: Measurement of Physical Properties at the Nanoscale ─
Nanomechanical, Electrical, Optical, Magnetic and Thermal
Chair: Mark VanLandingham, U.S. Army Research Laboratory, USA
Session 4: Extending the Limits of SPM: High-Speed Scanning, Ultra High-Resolution Imaging,
Multiple-Probe SPM, Novel Probes and Combinations of AFM with Other Technologies
Chair: Olav Solgaard, Stanford University, USA
Special Session: Nanoscale Materials for Energy Applications
Chair: Mowafak Al-Jassim, National Renewable Energy Laboratory, USA
The conference is co-sponsored by Veeco and the California NanoSystems Institute at UCSB. More details on session, abstract submission, and invited speaker presentations may be found at www.veeco.com/nanoconference.
About Veeco Instruments Inc.
Veeco Instruments Inc. manufactures enabling solutions for customers in the HB-LED, solar, data storage, semiconductor, scientific research and industrial markets. We have leading technology positions in our three businesses: LED & Solar Process Equipment, Data Storage Process Equipment, and Metrology Instruments. Veeco’s manufacturing and engineering facilities are located in New York, New Jersey, California, Colorado, Arizona, Minnesota and Massachusetts. Global sales and service offices are located throughout the U.S., Europe, Japan and APAC.
To the extent that this news release discusses expectations or otherwise makes statements about the future, such statements are forward-looking and are subject to a number of risks and uncertainties that could cause actual results to differ materially from the statements made. These factors include the risks discussed in the Business Description and Management's Discussion and Analysis sections of Veeco's Annual Report on Form 10-K for the year ended December 31, 2007 and in our subsequent quarterly reports on Form 10-Q, current reports on Form 8-K and press releases. Veeco does not undertake any obligation to update any forward-looking statements to reflect future events or circumstances after the date of such statements.
For more information, please click here
Veeco Instruments Inc.
SVP Investor Relations & Corp. Comm.
Metrology Marketing Communications
Copyright © Business Wire 2009If you have a comment, please Contact us.
Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.
|Related News Press|
News and information
Graphene under pressure August 26th, 2016
New approach to determining how atoms are arranged in materials August 25th, 2016
Graphene under pressure August 26th, 2016
50 years after the release of the film 'Fantastic Voyage,' science upstages fiction: Science upstages fiction with nanorobotic agents designed to travel in the human body to treat cancer August 25th, 2016
University of Puerto Rico and NASA back in the news – XEI reports August 23rd, 2016
Spider silk: Mother Nature's bio-superlens August 22nd, 2016
Stretchy supercapacitors power wearable electronics August 25th, 2016
Semblant to Present at China Mobile Manufacturing Forum 2016 August 25th, 2016
Nanoparticles that speed blood clotting may someday save lives August 23rd, 2016