Nanotechnology Now

Our NanoNews Digest Sponsors





Heifer International

Wikipedia Affiliate Button


android tablet pc

Home > Press > Molecular Imprint Deploys Next Phase Of Step And Flash Imprint Lithography Campaign

Abstract:
Molecular Imprints, Inc., a market and technology leader for nanopatterning systems and solutions, today announced the next phase of its ongoing S-FIL® (Step and Flash® Imprint Lithography) adoption and education campaign. The company will build on several notable successes achieved in 2008, as the S-FIL campaign paves the way for both the semiconductor and hard disk drive (HDD) industries to transition to this advanced form of nanoimprint lithography. Molecular Imprints will also expand its efforts in the light-emitting diode (LED) market.

Molecular Imprint Deploys Next Phase Of Step And Flash Imprint Lithography Campaign

Austin, TX | Posted on December 11th, 2008

Among the campaign's key achievements in 2008 was the continuing standardization by the HDD industry on S-FIL technology, with the number of orders by HDD companies for S-FIL systems reaching a total of 10, six of which have shipped. In the semiconductor industry, SEMATECH accepted delivery of a new Imprio 300 system and completed installation and formal acceptance in a record 68 days. The industry-leading consortium will be characterizing S-FIL for volume manufacturing at the 32nm node and below.

"In 2008, Molecular Imprints' S-FIL solution further solidified its position as the lithography technology of choice for patterned media production in the hard disk drive industry, while in the semiconductor industry S-FIL became a favored candidate for use in 32nm and below volume nonvolatile memory production," said Mark Melliar-Smith, CEO of Molecular Imprints. "The move toward semiconductor manufacturing was evidenced not only by concrete actions, such as the investment of SEMATECH to develop S-FIL for manufacturing, but also by industry surveys from organizations such as Wright, Williams & Kelly that found the number of industry participants expecting to see imprint lithography in production between 2010 and 2012 has jumped over 50 percent and notably, ahead of EUV. As manufacturers better understand the high-resolution, low-cost-of-ownership advantages of S-FIL, the momentum for adoption accelerates. With this in mind we will further enhance our S-FIL campaign in 2009."

As Molecular Imprints stepped up education efforts on S-FIL in 2008, interest in this advanced nanopatterning technology rose and system orders followed. As part of its education activities for 2009, Molecular Imprints will participate at several key industry tradeshows and conferences, including the Strategies in Light Conference, the SPIE Advanced Lithography Conference, SEMICON West and DISKCON USA.

These appearances follow the company's successful outreach efforts in 2008 that included delivering the opening address on lithography trends at DISCKON USA, as well as giving an invited address at the Micro & Nano Engineering (MNE) conference. Molecular Imprints will build on its education outreach at all of these events by expanding its participation in conference papers, technical articles and oral presentations, including findings from efforts with partners that are validating S-FIL for production applications. In addition to education efforts, the campaign will increase its focus in 2009 on enhancing the S-FIL infrastructure to support customers as they move closer to volume production on next-generation solid-state and hard-disk memory devices and systems.

Beyond new partnerships, system orders and event appearances, Molecular Imprints' S-FIL campaign in 2008 was characterized by several landmark achievements, including the introduction of the Imprio 300 for the semiconductor industry and the Imprio HD2200 for the HDD industry. Unveiled in February 2008, the Imprio 300 represents the highest resolution, lowest cost-of-ownership nanopatterning solution for IC prototyping and process development at the 32nm node and below. The Imprio HD2200, which was introduced three months later, is the only nanopatterning system to enable both development and pilot production of double-sided pattern media. In recognition of the advantages of S-FIL for patterned media, which are offered in the Imprio HD2200, Molecular Imprints also received the DISKCON USA Best in Show award for best use of a new technology.

####

About Molecular Imprints, Inc
Molecular Imprints, Inc. (MII) is the technology leader for high-resolution, low cost-of-ownership nanopatterning systems and solutions in the hard disk drive (HDD) and semiconductor industries. MII is leveraging its innovative Step and Flash Imprint Lithography (S-FIL®) with Drop-on-DemandTM material application technology to become the worldwide market and technology leader in high-volume patterning solutions for storage and memory devices, while enabling emerging markets in optics, biotechnology, and other industries. MII enables nanoscale patterning by delivering a comprehensive nanopatterning solution that is affordable, compatible and extendible to sub-10-nanometer resolution levels.

For more information, please click here

Contacts:
Physical address:
1807 West Braker Lane, Building C-100
Austin TX 78758-3605
Mailing address:
Box 81485
Austin TX 78708-1485

Tel: 1-512-339-7760
Fax: 1-512-339-3799

Copyright © Molecular Imprints, Inc

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Haydale Secures Exclusive Development and Supply Agreement with Tantec A/S: New reactors to be built and commissioned by Tantec A/S represent another step forward towards the commercialisation of graphene October 24th, 2014

QuantumWise guides the semiconductor industry towards the atomic scale October 24th, 2014

MEMS & Sensors Technology Showcase: Finalists Announced for MEMS Executive Congress US 2014 October 23rd, 2014

Nanoparticle technology triples the production of biogas October 23rd, 2014

Chip Technology

QuantumWise guides the semiconductor industry towards the atomic scale October 24th, 2014

Strengthening thin-film bonds with ultrafast data collection October 23rd, 2014

NIST offers electronics industry 2 ways to snoop on self-organizing molecules October 22nd, 2014

Materials for the next generation of electronics and photovoltaics: MacArthur Fellow develops new uses for carbon nanotubes October 21st, 2014

Announcements

Haydale Secures Exclusive Development and Supply Agreement with Tantec A/S: New reactors to be built and commissioned by Tantec A/S represent another step forward towards the commercialisation of graphene October 24th, 2014

QuantumWise guides the semiconductor industry towards the atomic scale October 24th, 2014

Advancing thin film research with nanostructured AZO: Innovnano’s unique and cost-effective AZO sputtering targets for the production of transparent conducting oxides October 23rd, 2014

Strengthening thin-film bonds with ultrafast data collection October 23rd, 2014

Printing/Lithography/Inkjet/Inks

3DXNano™ ESD Carbon Nanotube 3D Printing Filament - optimized for demanding 3D printing applications in the semi-con and electronics industry October 16th, 2014

Aculon NanoClear Stencil Solution Wins 2014 Global Technology Award at SMTAI October 12th, 2014

Fast, cheap nanomanufacturing: Arrays of tiny conical tips that eject ionized materials could fabricate nanoscale devices cheaply October 4th, 2014

'Greener,' low-cost transistor heralds advance in flexible electronics September 24th, 2014

NanoNews-Digest
The latest news from around the world, FREE





  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More














ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2014 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE