Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > Press > Molecular Imprint Deploys Next Phase Of Step And Flash Imprint Lithography Campaign

Abstract:
Molecular Imprints, Inc., a market and technology leader for nanopatterning systems and solutions, today announced the next phase of its ongoing S-FIL® (Step and Flash® Imprint Lithography) adoption and education campaign. The company will build on several notable successes achieved in 2008, as the S-FIL campaign paves the way for both the semiconductor and hard disk drive (HDD) industries to transition to this advanced form of nanoimprint lithography. Molecular Imprints will also expand its efforts in the light-emitting diode (LED) market.

Molecular Imprint Deploys Next Phase Of Step And Flash Imprint Lithography Campaign

Austin, TX | Posted on December 11th, 2008

Among the campaign's key achievements in 2008 was the continuing standardization by the HDD industry on S-FIL technology, with the number of orders by HDD companies for S-FIL systems reaching a total of 10, six of which have shipped. In the semiconductor industry, SEMATECH accepted delivery of a new Imprio 300 system and completed installation and formal acceptance in a record 68 days. The industry-leading consortium will be characterizing S-FIL for volume manufacturing at the 32nm node and below.

"In 2008, Molecular Imprints' S-FIL solution further solidified its position as the lithography technology of choice for patterned media production in the hard disk drive industry, while in the semiconductor industry S-FIL became a favored candidate for use in 32nm and below volume nonvolatile memory production," said Mark Melliar-Smith, CEO of Molecular Imprints. "The move toward semiconductor manufacturing was evidenced not only by concrete actions, such as the investment of SEMATECH to develop S-FIL for manufacturing, but also by industry surveys from organizations such as Wright, Williams & Kelly that found the number of industry participants expecting to see imprint lithography in production between 2010 and 2012 has jumped over 50 percent and notably, ahead of EUV. As manufacturers better understand the high-resolution, low-cost-of-ownership advantages of S-FIL, the momentum for adoption accelerates. With this in mind we will further enhance our S-FIL campaign in 2009."

As Molecular Imprints stepped up education efforts on S-FIL in 2008, interest in this advanced nanopatterning technology rose and system orders followed. As part of its education activities for 2009, Molecular Imprints will participate at several key industry tradeshows and conferences, including the Strategies in Light Conference, the SPIE Advanced Lithography Conference, SEMICON West and DISKCON USA.

These appearances follow the company's successful outreach efforts in 2008 that included delivering the opening address on lithography trends at DISCKON USA, as well as giving an invited address at the Micro & Nano Engineering (MNE) conference. Molecular Imprints will build on its education outreach at all of these events by expanding its participation in conference papers, technical articles and oral presentations, including findings from efforts with partners that are validating S-FIL for production applications. In addition to education efforts, the campaign will increase its focus in 2009 on enhancing the S-FIL infrastructure to support customers as they move closer to volume production on next-generation solid-state and hard-disk memory devices and systems.

Beyond new partnerships, system orders and event appearances, Molecular Imprints' S-FIL campaign in 2008 was characterized by several landmark achievements, including the introduction of the Imprio 300 for the semiconductor industry and the Imprio HD2200 for the HDD industry. Unveiled in February 2008, the Imprio 300 represents the highest resolution, lowest cost-of-ownership nanopatterning solution for IC prototyping and process development at the 32nm node and below. The Imprio HD2200, which was introduced three months later, is the only nanopatterning system to enable both development and pilot production of double-sided pattern media. In recognition of the advantages of S-FIL for patterned media, which are offered in the Imprio HD2200, Molecular Imprints also received the DISKCON USA Best in Show award for best use of a new technology.

####

About Molecular Imprints, Inc
Molecular Imprints, Inc. (MII) is the technology leader for high-resolution, low cost-of-ownership nanopatterning systems and solutions in the hard disk drive (HDD) and semiconductor industries. MII is leveraging its innovative Step and Flash Imprint Lithography (S-FIL®) with Drop-on-DemandTM material application technology to become the worldwide market and technology leader in high-volume patterning solutions for storage and memory devices, while enabling emerging markets in optics, biotechnology, and other industries. MII enables nanoscale patterning by delivering a comprehensive nanopatterning solution that is affordable, compatible and extendible to sub-10-nanometer resolution levels.

For more information, please click here

Contacts:
Physical address:
1807 West Braker Lane, Building C-100
Austin TX 78758-3605
Mailing address:
Box 81485
Austin TX 78708-1485

Tel: 1-512-339-7760
Fax: 1-512-339-3799

Copyright © Molecular Imprints, Inc

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Camouflaged nanoparticles used to deliver killer protein to cancer June 17th, 2018

Squeezing light at the nanoscale: Ultra-confined light could detect harmful molecules June 17th, 2018

Physicists devise method to reveal how light affects materials: The new method adds to the understanding of the fundamental laws governing the interaction of electrons and light June 15th, 2018

Tripling the Energy Storage of Lithium-Ion Batteries: Scientists have synthesized a new cathode material from iron fluoride that surpasses the capacity limits of traditional lithium-ion batteries June 14th, 2018

Chip Technology

Making quantum puddles: Physicists discover how to create the thinnest liquid films ever June 13th, 2018

Leti Presenting Strategic Vision and Hosting a Workshop at SEMICON West: “From Electrons to Photons” Leti Workshop and CEO Media Briefing Set for Tuesday, July 10 in W Hotel, San Francisco June 12th, 2018

Nanometrics Updates Time of Webcast at Stifel 2018 Cross Sector Insight Conference June 12th, 2018

Does nanoconfinement affect the interaction between two materials placed in contact? It ispossible to estimate how nanoconfinement affects the number of contacts formed by two materials placed in intimate contact and, hence, the interfacial interactions June 7th, 2018

Announcements

Camouflaged nanoparticles used to deliver killer protein to cancer June 17th, 2018

Squeezing light at the nanoscale: Ultra-confined light could detect harmful molecules June 17th, 2018

Physicists devise method to reveal how light affects materials: The new method adds to the understanding of the fundamental laws governing the interaction of electrons and light June 15th, 2018

Tripling the Energy Storage of Lithium-Ion Batteries: Scientists have synthesized a new cathode material from iron fluoride that surpasses the capacity limits of traditional lithium-ion batteries June 14th, 2018

Printing/Lithography/Inkjet/Inks/Bio-printing

Making carbon nanotubes as usable as common plastics: Researchers discover that cresols disperse carbon nanotubes at unprecedentedly high concentrations May 15th, 2018

New 4-D printer could reshape the world we live in March 20th, 2018

Leti & Mapper announce cyber-security breakthrough that encrypts individual chips with a code: Low-Cost Cyber-Security Breakthrough that Encrypts Individual Chips With a Unique Code Presented at SPIE Advanced Lithography 2018 in San Jose March 2nd, 2018

Basque researchers turn light upside down February 23rd, 2018

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project