Nanotechnology Now







Heifer International

Wikipedia Affiliate Button


DHgate

Home > Press > Applied Materials’ New Enabler E5 System Solves Critical Contact Etch Challenges for 32nm Memory Chips

The Applied Centura Enabler E5 sets an industry benchmark, enabling customers to etch 40:1 high aspect ratio contacts with the excellent profile control required for 32nm and below memory chip manufacturing. (Photo: Business Wire)
The Applied Centura Enabler E5 sets an industry benchmark, enabling customers to etch 40:1 high aspect ratio contacts with the excellent profile control required for 32nm and below memory chip manufacturing. (Photo: Business Wire)

Abstract:
Applied Materials, Inc. today unveiled its Applied Centura® Enabler® E5 dielectric etch system, the industry's most advanced solution for creating the 40:1 high aspect ratio contact features that are critical to the yield and performance of 32nm and below DRAM and Flash memory chips. The Enabler E5 sets a new benchmark in profile control, enabling customers to manufacture high performance, robust, next-generation memory devices with >80% bottom-to-top CD ratios across the wafer, and with less than 3nm bowing of the contact sidewall.

Applied Materials’ New Enabler E5 System Solves Critical Contact Etch Challenges for 32nm Memory Chips

SANTA CLARA, CA | Posted on December 3rd, 2008

"Next-generation Flash and DRAM devices pose a significant challenge for dielectric etch systems since it is very difficult to achieve the global profile control necessary for fabricating high aspect ratio contacts," said Ellie Yieh, vice president and general manager of Applied Materials' Etch and Cleans Business Unit. "The Enabler E5 is the only system that can meet all these requirements, allowing memory manufacturers to continue to increase density and reduce the cost-per-bit."

"Customers are very excited about the Enabler E5 system's exceptional profile control," added Ms. Yieh. "We're seeing strong demand for this product with multiple systems installed worldwide and repeat orders from leading memory manufacturers where it has solidly won multiple head-to-head run-offs with other systems."

Central to the Enabler E5 system's performance are its unique reactor architecture and precise process control that provide repeatable, uniform vertical profiles at high aspect ratios globally - from edge-to-edge and wafer-to-wafer - addressing a critical yield inhibitor at higher memory densities. The proprietary chamber technology also provides more efficient cleaning, delivering 50% longer between-maintenance intervals than any competitive system. For more information on the Applied Centura Enabler E5 system, please visit:
www.appliedmaterials.com/products/dielectric_etch_enabler_4.html.

####

About Applied Materials, Inc.
Applied Materials, Inc. (Nasdaq:AMAT) is the global leader in Nanomanufacturing Technology™ solutions with a broad portfolio of innovative equipment, service and software products for the fabrication of semiconductor chips, flat panel displays, solar photovoltaic cells, flexible electronics and energy efficient glass. At Applied Materials, we apply Nanomanufacturing Technology to improve the way people live.

For more information, please click here

Contacts:
Applied Materials, Inc.
Betty Newboe
408-563-0647 (editorial/media)
Robert Friess
408-986-7977 (financial community)

Copyright © Business Wire 2008

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

CiQUS researchers obtain high-quality perovskites over large areas by a chemical method March 4th, 2015

Arrowhead to Present at 2015 Barclays Global Healthcare Conference March 4th, 2015

Nanosorbents Increase Extraction, Recycling of Silver from Aqueous Solutions March 4th, 2015

Black phosphorus is new 'wonder material' for improving optical communication March 3rd, 2015

Chip Technology

Cambrios and Heraeus Jointly Create New, High-Conductivity Transparent Conductors: Two Companies' Combined Products Dramatically Extend Flexible Substrate Capabilities for Next-Generation Mass-Market Technology Products March 3rd, 2015

The taming of magnetic vortices: Unified theory for skyrmion-materials March 3rd, 2015

Black phosphorus is new 'wonder material' for improving optical communication March 3rd, 2015

International research partnership tricks the light fantastic March 2nd, 2015

Announcements

CiQUS researchers obtain high-quality perovskites over large areas by a chemical method March 4th, 2015

Arrowhead to Present at 2015 Barclays Global Healthcare Conference March 4th, 2015

Nanosorbents Increase Extraction, Recycling of Silver from Aqueous Solutions March 4th, 2015

Black phosphorus is new 'wonder material' for improving optical communication March 3rd, 2015

Tools

Keysight Technologies Shifts to Direct Sales of High-Performance Products in North America March 3rd, 2015

Forbidden quantum leaps possible with high-res spectroscopy March 2nd, 2015

International research partnership tricks the light fantastic March 2nd, 2015

Important step towards quantum computing: Metals at atomic scale March 2nd, 2015

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More










ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2015 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE