Nanotechnology Now

Our NanoNews Digest Sponsors





Heifer International

Wikipedia Affiliate Button


android tablet pc

Home > Press > Applied Materials’ New Enabler E5 System Solves Critical Contact Etch Challenges for 32nm Memory Chips

The Applied Centura Enabler E5 sets an industry benchmark, enabling customers to etch 40:1 high aspect ratio contacts with the excellent profile control required for 32nm and below memory chip manufacturing. (Photo: Business Wire)
The Applied Centura Enabler E5 sets an industry benchmark, enabling customers to etch 40:1 high aspect ratio contacts with the excellent profile control required for 32nm and below memory chip manufacturing. (Photo: Business Wire)

Abstract:
Applied Materials, Inc. today unveiled its Applied Centura® Enabler® E5 dielectric etch system, the industry's most advanced solution for creating the 40:1 high aspect ratio contact features that are critical to the yield and performance of 32nm and below DRAM and Flash memory chips. The Enabler E5 sets a new benchmark in profile control, enabling customers to manufacture high performance, robust, next-generation memory devices with >80% bottom-to-top CD ratios across the wafer, and with less than 3nm bowing of the contact sidewall.

Applied Materials’ New Enabler E5 System Solves Critical Contact Etch Challenges for 32nm Memory Chips

SANTA CLARA, CA | Posted on December 3rd, 2008

"Next-generation Flash and DRAM devices pose a significant challenge for dielectric etch systems since it is very difficult to achieve the global profile control necessary for fabricating high aspect ratio contacts," said Ellie Yieh, vice president and general manager of Applied Materials' Etch and Cleans Business Unit. "The Enabler E5 is the only system that can meet all these requirements, allowing memory manufacturers to continue to increase density and reduce the cost-per-bit."

"Customers are very excited about the Enabler E5 system's exceptional profile control," added Ms. Yieh. "We're seeing strong demand for this product with multiple systems installed worldwide and repeat orders from leading memory manufacturers where it has solidly won multiple head-to-head run-offs with other systems."

Central to the Enabler E5 system's performance are its unique reactor architecture and precise process control that provide repeatable, uniform vertical profiles at high aspect ratios globally - from edge-to-edge and wafer-to-wafer - addressing a critical yield inhibitor at higher memory densities. The proprietary chamber technology also provides more efficient cleaning, delivering 50% longer between-maintenance intervals than any competitive system. For more information on the Applied Centura Enabler E5 system, please visit:
www.appliedmaterials.com/products/dielectric_etch_enabler_4.html.

####

About Applied Materials, Inc.
Applied Materials, Inc. (Nasdaq:AMAT) is the global leader in Nanomanufacturing Technology™ solutions with a broad portfolio of innovative equipment, service and software products for the fabrication of semiconductor chips, flat panel displays, solar photovoltaic cells, flexible electronics and energy efficient glass. At Applied Materials, we apply Nanomanufacturing Technology to improve the way people live.

For more information, please click here

Contacts:
Applied Materials, Inc.
Betty Newboe
408-563-0647 (editorial/media)
Robert Friess
408-986-7977 (financial community)

Copyright © Business Wire 2008

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

University of Manchester selects Anasys AFM-IR for coatings and corrosion research July 30th, 2014

Nature inspires a greener way to make colorful plastics July 30th, 2014

Analytical solutions from Malvern Instruments support University of Wisconsin-Milwaukee researchers in understanding environmental effects of nanomaterials July 30th, 2014

FEI Unveils New Solutions for Faster Time-to-Analysis in Metals Research July 30th, 2014

Chip Technology

A*STAR and industry form S$200M semiconductor R&D July 25th, 2014

A Crystal Wedding in the Nanocosmos July 23rd, 2014

Nanometrics Announces Upcoming Investor Events July 22nd, 2014

Penn Study: Understanding Graphene’s Electrical Properties on an Atomic Level July 22nd, 2014

Announcements

University of Manchester selects Anasys AFM-IR for coatings and corrosion research July 30th, 2014

Nature inspires a greener way to make colorful plastics July 30th, 2014

Analytical solutions from Malvern Instruments support University of Wisconsin-Milwaukee researchers in understanding environmental effects of nanomaterials July 30th, 2014

FEI Unveils New Solutions for Faster Time-to-Analysis in Metals Research July 30th, 2014

Tools

New Objective Focusing Nanopositioner from nPoint July 30th, 2014

University of Manchester selects Anasys AFM-IR for coatings and corrosion research July 30th, 2014

Analytical solutions from Malvern Instruments support University of Wisconsin-Milwaukee researchers in understanding environmental effects of nanomaterials July 30th, 2014

FEI Unveils New Solutions for Faster Time-to-Analysis in Metals Research July 30th, 2014

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More














ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2014 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE