Nanotechnology Now

Our NanoNews Digest Sponsors


Heifer International

Wikipedia Affiliate Button

Home > Press > Applied Materials’ New Enabler E5 System Solves Critical Contact Etch Challenges for 32nm Memory Chips

The Applied Centura Enabler E5 sets an industry benchmark, enabling customers to etch 40:1 high aspect ratio contacts with the excellent profile control required for 32nm and below memory chip manufacturing. (Photo: Business Wire)
The Applied Centura Enabler E5 sets an industry benchmark, enabling customers to etch 40:1 high aspect ratio contacts with the excellent profile control required for 32nm and below memory chip manufacturing. (Photo: Business Wire)

Abstract:
Applied Materials, Inc. today unveiled its Applied Centura® Enabler® E5 dielectric etch system, the industry's most advanced solution for creating the 40:1 high aspect ratio contact features that are critical to the yield and performance of 32nm and below DRAM and Flash memory chips. The Enabler E5 sets a new benchmark in profile control, enabling customers to manufacture high performance, robust, next-generation memory devices with >80% bottom-to-top CD ratios across the wafer, and with less than 3nm bowing of the contact sidewall.

Applied Materials’ New Enabler E5 System Solves Critical Contact Etch Challenges for 32nm Memory Chips

SANTA CLARA, CA | Posted on December 3rd, 2008

"Next-generation Flash and DRAM devices pose a significant challenge for dielectric etch systems since it is very difficult to achieve the global profile control necessary for fabricating high aspect ratio contacts," said Ellie Yieh, vice president and general manager of Applied Materials' Etch and Cleans Business Unit. "The Enabler E5 is the only system that can meet all these requirements, allowing memory manufacturers to continue to increase density and reduce the cost-per-bit."

"Customers are very excited about the Enabler E5 system's exceptional profile control," added Ms. Yieh. "We're seeing strong demand for this product with multiple systems installed worldwide and repeat orders from leading memory manufacturers where it has solidly won multiple head-to-head run-offs with other systems."

Central to the Enabler E5 system's performance are its unique reactor architecture and precise process control that provide repeatable, uniform vertical profiles at high aspect ratios globally - from edge-to-edge and wafer-to-wafer - addressing a critical yield inhibitor at higher memory densities. The proprietary chamber technology also provides more efficient cleaning, delivering 50% longer between-maintenance intervals than any competitive system. For more information on the Applied Centura Enabler E5 system, please visit:
www.appliedmaterials.com/products/dielectric_etch_enabler_4.html.

####

About Applied Materials, Inc.
Applied Materials, Inc. (Nasdaq:AMAT) is the global leader in Nanomanufacturing Technology™ solutions with a broad portfolio of innovative equipment, service and software products for the fabrication of semiconductor chips, flat panel displays, solar photovoltaic cells, flexible electronics and energy efficient glass. At Applied Materials, we apply Nanomanufacturing Technology to improve the way people live.

For more information, please click here

Contacts:
Applied Materials, Inc.
Betty Newboe
408-563-0647 (editorial/media)
Robert Friess
408-986-7977 (financial community)

Copyright © Business Wire 2008

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Starpharma initiates new DEP™ drug delivery program with AstraZeneca July 27th, 2016

Ageing can drive progress: Population ageing is likely to boost medicine, nanotechnology and robotics, but increase political risks July 27th, 2016

WSU researchers 'watch' crystal structure change in real time: Breakthrough made possible by new Argonne facility July 27th, 2016

Enhancing molecular imaging with light: New technology platform increases spectroscopic resolution by 4 fold July 27th, 2016

Chip Technology

New nontoxic process promises larger ultrathin sheets of 2-D nanomaterials July 27th, 2016

Nanometrics Reports Second Quarter 2016 Financial Results July 26th, 2016

Ultra-flat circuits will have unique properties: Rice University lab studies 2-D hybrids to see how they differ from common electronics July 25th, 2016

Attosecond physics: Mapping electromagnetic waveforms July 25th, 2016

Announcements

Starpharma initiates new DEP™ drug delivery program with AstraZeneca July 27th, 2016

Ageing can drive progress: Population ageing is likely to boost medicine, nanotechnology and robotics, but increase political risks July 27th, 2016

WSU researchers 'watch' crystal structure change in real time: Breakthrough made possible by new Argonne facility July 27th, 2016

Enhancing molecular imaging with light: New technology platform increases spectroscopic resolution by 4 fold July 27th, 2016

Tools

WSU researchers 'watch' crystal structure change in real time: Breakthrough made possible by new Argonne facility July 27th, 2016

Enhancing molecular imaging with light: New technology platform increases spectroscopic resolution by 4 fold July 27th, 2016

Nanometrics Reports Second Quarter 2016 Financial Results July 26th, 2016

The NanoWizard® AFM from JPK is applied for interdisciplinary research at the University of South Australia for applications including smart wound healing and how plants can protect themselves from toxins July 26th, 2016

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







Car Brands
Buy website traffic