Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > Press > Fujitsu Microelectronics Provides Advanced 65nm RF CMOS Process Design Kit: Platforms are Ideal for High-performance and Low-power Wireless SoCs

Abstract:
Fujitsu Microelectronics America, Inc. (FMA) today announced the availability of 65nm RF CMOS manufacturing services with the introduction of an advanced Process Design Kit (PDK) to enable first-pass silicon success. The RF CMOS platforms from Fujitsu are now available to customers in 90nm and 65nm nodes.

Fujitsu Microelectronics Provides Advanced 65nm RF CMOS Process Design Kit: Platforms are Ideal for High-performance and Low-power Wireless SoCs

SUNNYVALE, CA | Posted on November 12th, 2008

The RF CMOS PDKs are ideal for developing high-performance, low-power SoCs that integrate RF functions for Bluetooth, GPS, cellular, wireless audio/video, wireless LAN and optical communications. The highly accurate transistor models include both advanced PSP and traditional BSIM models. The PDK's superior model accuracy and improved ease of use enable engineers to design challenging mixed-signal and RF ICs easily.

Based on the Fujitsu low leakage 90nm and 65nm analog/RF CMOS process technologies, the PDKs include a comprehensive set of parameterized cells and toolkits for active and passive devices. The flexible inductor synthesis toolkit automatically generates precise and scalable inductor layout and models for high-speed analog and RF circuits. The sophisticated statistical simulation environment is a powerful tool for yield analysis, process sensitivity and design space exploration. The result for customers is reduced development time and rapid time-to-market.

"Our platforms ensure that our customers achieve first-pass functional silicon at the 90- and 65-nanometer process nodes for high-performance, low-power RF CMOS IC designs, avoiding costly re-spins and low yields," said Steve Della Rocchetta, vice president of the Semiconductor Manufacturing Services business group at Fujitsu Microelectronics America.

"The main advantage of the Fujitsu RF CMOS processes is the ability to integrate complex logic, analog and RF circuits into single chip," said Tatsuya Yamazaki, vice president, in charge of the ASIC/COT business for Fujitsu Microelectronics Limited in Japan. "Built on the Fujitsu advanced process technologies, accurate device models, and comprehensive IP portfolios, the Fujitsu low-power RF CMOS technology platforms are exceptional choices for next-generation, high-volume wireless applications."

Availability

Both the 90nm CS100A-LL and 65nm CS200L PDKs are available now. Customers are using the design kits for their leading-edge, high-precision analog and high-speed RF applications.

Fujitsu has issued a new white paper entitled "Motivation for RF Integration," which discusses the many opportunities for the semiconductor industry that have been created by the proliferation of wireless applications, ranging from cellular phones to wireless audio/video products. Although major components in traditional wireless systems have long been fabricated in a variety of CMOS and compound semiconductor process technologies, recent advances in RF CMOS have made it the technology of choice for these applications. RF CMOS is contributing significantly to the success of wireless products in the marketplace. The new white paper is available at
www.fujitsu.com/downloads/MICRO/fma/formpdf/sms_rfcmos.pdf

####

About Fujitsu Microelectronics America, Inc. (FMA)
Fujitsu Microelectronics America, Inc. (FMA) leads the industry in innovation. FMA provides high-quality, reliable semiconductor products, design and manufacturing services for the wireless, networking, consumer, automotive, and other markets throughout North and South America.

For more information, please click here

Contacts:
Corporate Headquarters
Tel: 408-737-5600
Toll free: 800-866-8608
Fax: 408-737-5999

Address:
1250 East Arques Avenue, M/S 333
Sunnyvale, CA
USA
94085-5401

Copyright © PR Newswire Association LLC.

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Rice U. chemists create 3-D printed graphene foam June 22nd, 2017

Tiny bubbles provide tremendous propulsion in new microparticles research-Ben-Gurion U. June 21st, 2017

Enhanced photocatalytic activity by Cu2O nanoparticles integrated H2Ti3O7 nanotubes June 21st, 2017

Researchers developed nanoparticle based contrast agent for dual modal imaging of cancer June 21st, 2017

Chip Technology

Alloying materials of different structures offers new tool for controlling properties June 19th, 2017

GLOBALFOUNDRIES®, ON Semiconductor Deliver the Industry’s Lowest Power Bluetooth® Low Energy SoC Family: 55nm LPx RF-enabled platform, with SST’s highly reliable embedded SuperFlash®, provides low power and cost for IoT and “Connected” Health and Wellness Devices June 19th, 2017

New prospects for universal memory -- high speed of RAM and the capacity of flash: Thin films created at MIPT could be the basis for future development of ReRAM June 17th, 2017

In a project funded by the Austrian Science Fund FWF, the physicist Serdar Sarıçiftçi investigates possible uses in electronics of the semiconductor properties of indigo pigment June 14th, 2017

Announcements

Rice U. chemists create 3-D printed graphene foam June 22nd, 2017

Tiny bubbles provide tremendous propulsion in new microparticles research-Ben-Gurion U. June 21st, 2017

Enhanced photocatalytic activity by Cu2O nanoparticles integrated H2Ti3O7 nanotubes June 21st, 2017

Researchers developed nanoparticle based contrast agent for dual modal imaging of cancer June 21st, 2017

Tools

Researchers developed nanoparticle based contrast agent for dual modal imaging of cancer June 21st, 2017

Oxford Instruments congratulates Lancaster University for inaugurating the IsoLab, built for studying quantum systems June 20th, 2017

Changing the color of laser light on the femtosecond time scale: How BiCoO3 achieves second harmonic generation June 14th, 2017

Leti Announces Two New Tools for Improving Transportation Comfort, Safety and Efficiency: Wearable Device Measures Stress Responses for Travelers, Pilots and Truck Drivers, While Smartphone App Provides Transit Agencies Broad Data on Transport Modes June 13th, 2017

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project