Nanotechnology Now







Heifer International

Wikipedia Affiliate Button


DHgate

Home > News > German ministry helps fund Dresden-based 32-/22-nm photomask lithography project

September 4th, 2008

German ministry helps fund Dresden-based 32-/22-nm photomask lithography project

Abstract:
In a move aimed to bolster Dresden's role as a center of excellence for advanced photomask development and engineering, the German Federal Ministry of Education and Research (BMBF) is funding a portion of a new joint venture in the area. Over the next two and a half years, the "Critical Dimension and Registration for 32-nm Mask Lithography" (CDuR32) cooperative project--a partnership of the Advanced Mask Technology Center (AMTC), Vistec Semiconductor Systems, and the German Metrology Institute (PTB)--will develop mask and measurement technologies for 32-nm memory chip and 22-nm microprocessor generations.

CDuR32 is aligned with the goals of the European research support platform (ENIAC) and will help expand Europe's position in nanoelectronics, according to the participants. The project will have a budget of Euro 16.7 million (of which BMBF contributes Euro 7.9 million) and will also help create new and maintain already existing, highly qualified jobs.

The three project partners have specific roles: AMTC (a joint venture of AMD, Qimonda, and Toppan Photomasks) analyzes and develops the basic principles of manufacturing 32-/22-nm masks; Vistec's new-generation measurement system (LMS IPRO5) will help meet the stringent requirements of qualifying accurate mask structures; and PTB contributes measurement capabilities and new mathematical analysis methods to help solve mask quality issues, such as the definition and characterization of measurement and calibration guidelines.

Source:
fabtech.org

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

International research partnership tricks the light fantastic March 2nd, 2015

UC research partnership explores how to best harness solar power March 2nd, 2015

Researchers turn unzipped nanotubes into possible alternative for platinum: Aerogel catalyst shows promise for fuel cells March 2nd, 2015

Important step towards quantum computing: Metals at atomic scale March 2nd, 2015

Govt.-Legislation/Regulation/Funding/Policy

Forbidden quantum leaps possible with high-res spectroscopy March 2nd, 2015

Researchers turn unzipped nanotubes into possible alternative for platinum: Aerogel catalyst shows promise for fuel cells March 2nd, 2015

First detailed microscopy evidence of bacteria at the lower size limit of life: Berkeley Lab research provides comprehensive description of ultra-small bacteria February 28th, 2015

SUNY Poly CNSE Researchers and Corporate Partners to Present Forty Papers at Globally Recognized Lithography Conference: SUNY Poly CNSE Research Group Awarded Both ‘Best Research Paper’ and ‘Best Research Poster’ at SPIE Advanced Lithography 2015 forum February 25th, 2015

Chip Technology

International research partnership tricks the light fantastic March 2nd, 2015

Important step towards quantum computing: Metals at atomic scale March 2nd, 2015

onic Present breakthrough in CMOS-based Transceivers for mm-Wave Radar Systems March 1st, 2015

New nanowire structure absorbs light efficiently: Dual-type nanowire arrays can be used in applications such as LEDs and solar cells February 25th, 2015

Announcements

International research partnership tricks the light fantastic March 2nd, 2015

UC research partnership explores how to best harness solar power March 2nd, 2015

Researchers turn unzipped nanotubes into possible alternative for platinum: Aerogel catalyst shows promise for fuel cells March 2nd, 2015

Important step towards quantum computing: Metals at atomic scale March 2nd, 2015

Printing/Lithography/Inkjet/Inks

Maximum Precision in 3D Printing: New complete solution makes additive manufacturing standard for microfabrication February 26th, 2015

SUNY Poly CNSE Researchers and Corporate Partners to Present Forty Papers at Globally Recognized Lithography Conference: SUNY Poly CNSE Research Group Awarded Both ‘Best Research Paper’ and ‘Best Research Poster’ at SPIE Advanced Lithography 2015 forum February 25th, 2015

World’s first compact rotary 3D printer-cum-scanner unveiled at AAAS by NTU Singapore start-up: With production funded by crowdsourcing, the first unit will be delivered to the United States in March February 16th, 2015

3-D printing with custom molecules creates low-cost mechanical sensor February 10th, 2015

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More










ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2015 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE