Nanotechnology Now

Our NanoNews Digest Sponsors


Heifer International

Wikipedia Affiliate Button

Home > Press > KLA-Tencor Launches First Computational Lithography Tool To Address Double-Patterning Challenges

Abstract:
Today KLA-Tencor (NASDAQ:KLAC) introduced the latest version of its industry-leading computational lithography tool, PROLITH™ 11. The new tool enables users for the first time to evaluate current double-patterning schemes and cost-effectively explore alternate solutions to lithography challenges in design, materials and process development. This new computational lithography tool also supports single-pass patterning and immersion technologies.

KLA-Tencor Launches First Computational Lithography Tool To Address Double-Patterning Challenges

San Jose, CA | Posted on July 10th, 2008

"The emergence of double-patterning lithography has challenged circuit designers and chipmakers because of the dramatic increase in lithography complexity and experimental costs," noted Ed Charrier, vice president and general manager of KLA-Tencor's Process Control Information Division. "Computational lithography has become an essential tool for controlling these costs. Among computational lithography tools, PROLITH 11 has the unique ability to allow engineers to explore wide ranges of design, material or process conditions in order to solve a particular problem — without having to spend the resources of a fab."

Double-patterning lithography (DPL) is a method for constructing the small features of advanced devices by dividing the pattern into two interleaved patterns. This means that a double mask set and new photoresist materials are required for DPL layers, amplifying process complexity and cost. With experts predicting the price of a mask set to exceed $4M at the 32nm node, fabs are strongly motivated to thoroughly characterize how a two-pass, double-mask, dual-resist strategy will print on the wafer under the natural range of process conditions, so that the mask designs, materials and process parameters are right the first time.

PROLITH 11 allows engineers to model this complex system with unprecedented precision, and then use the model to optimize the system by exploring the effects of small or large changes in mask design, photoresist properties, and scanner or process parameters on the printed pattern. By using PROLITH 11, fabs avoid time-consuming, expensive experiments on product wafers which delay time to market and result in thousands of scrapped processed wafers.

As one tool in a complete suite of systems from KLA-Tencor designed to address advanced lithography challenges, PROLITH 11 has been shipped to leading chipmakers in the U.S., Japan and Taiwan. The PROLITH platform comprises the most widely used lithography simulation toolset on the market, installed in the development groups of virtually every chipmaker currently producing 65nm and 45nm devices.

PROLITH 11 TECHNOLOGY SUMMARY


Fundamental and Rigorous Calculations





PROLITH 11 is the only lithography simulator to model the topography specific to double patterning and calculate how variability in printing the first layer could affect the second layer.



PROLITH 11 results are based on fundamental optical and kinetic models.



PROLITH can accommodate:


• Complex film stacks


• Embedded substrate topography



PROLITH 11 resist models can be calibrated using data from IC manufactures, resist vendors, research groups and consortia.


Extrapolation of Results for Problem Solving





The PROLITH 11 model can be used to explore:


• New mask designs


• New photoresists


• Different scanner settings


• Different process parameters

Complementary to Full-Chip Simulators

Complementary to full-chip simulators, which are designed to optimize an entire chip in less than 24 hours, PROLITH models a small area of the die in full detail in a few minutes. While the results of full-chip simulators apply to one set of design and process conditions, PROLITH results can be extrapolated significantly from the conditions under which the model was generated, so that various solutions can be explored. PROLITH results can be used to determine the optimum conditions under which full-chip simulators are run.

####

About KLA-Tencor
KLA-Tencor is the world’s leading provider of process control and yield management solutions for the semiconductor and related microelectronics industries. Headquartered in San Jose, California, the Company has sales and service offices around the world. An S&P 500 company, KLA-Tencor is traded on the NASDAQ Global Select Market under the symbol KLAC.

For more information, please click here

Contacts:
KLA-Tencor
Ed Lockwood
408-875-9529 (Investor Relations)
Sr. Director, Investor Relations

Meggan Powers
408-875-8733 (Media Relations)
Sr. Director, Corporate Communications

Copyright © Business Wire 2008

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Scientists find a way of acquiring graphene-like films from salts to boost nanoelectronics: Physicists use supercomputers to find a way of making 'imitation graphene' from salt July 30th, 2016

Vortex laser offers hope for Moore's Law: The optics advancement may solve an approaching data bottleneck by helping to boost computing power and information transfer rates tenfold July 30th, 2016

New method for making green LEDs enhances their efficiency and brightness July 30th, 2016

A new type of quantum bits July 29th, 2016

Chip Technology

Scientists find a way of acquiring graphene-like films from salts to boost nanoelectronics: Physicists use supercomputers to find a way of making 'imitation graphene' from salt July 30th, 2016

Vortex laser offers hope for Moore's Law: The optics advancement may solve an approaching data bottleneck by helping to boost computing power and information transfer rates tenfold July 30th, 2016

Novel state of matter: Observation of a quantum spin liquid July 29th, 2016

A new type of quantum bits July 29th, 2016

Announcements

Scientists find a way of acquiring graphene-like films from salts to boost nanoelectronics: Physicists use supercomputers to find a way of making 'imitation graphene' from salt July 30th, 2016

Vortex laser offers hope for Moore's Law: The optics advancement may solve an approaching data bottleneck by helping to boost computing power and information transfer rates tenfold July 30th, 2016

New method for making green LEDs enhances their efficiency and brightness July 30th, 2016

A new type of quantum bits July 29th, 2016

Tools

Lonely atoms, happily reunited July 29th, 2016

Pixel-array quantum cascade detector paves the way for portable thermal imaging devices: Research team from TU-Wien Center for Micro- and Nanostructures have developed a new 'cooler' sensing instrument thereby increasing energy-efficiency and enhancing mobility for diagnostic tes July 28th, 2016

WSU researchers 'watch' crystal structure change in real time: Breakthrough made possible by new Argonne facility July 27th, 2016

Enhancing molecular imaging with light: New technology platform increases spectroscopic resolution by 4 fold July 27th, 2016

Printing/Lithography/Inkjet/Inks

Nanoscientists develop the 'ultimate discovery tool': Rapid discovery power is similar to what gene chips offer biology June 25th, 2016

Perovskite solar cells surpass 20 percent efficiency: EPFL researchers are pushing the limits of perovskite solar cell performance by exploring the best way to grow these crystals June 13th, 2016

'On-the-fly' 3-D print system prints what you design, as you design it June 1st, 2016

Physicists create first metamaterial with rewritable magnetic ordering May 23rd, 2016

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







Car Brands
Buy website traffic