Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button


DHgate

Home > Press > MIT reports finer lines for microchips

Photo / Ralf Heilmann
MIT nanoruler lithography tool with a 300 mm-diameter silicon wafer.
Photo / Ralf Heilmann
MIT nanoruler lithography tool with a 300 mm-diameter silicon wafer.

Abstract:
MIT researchers have achieved a significant advance in nanoscale lithographic technology, used in the manufacture of computer chips and other electronic devices, to make finer patterns of lines over larger areas than have been possible with other methods.

MIT reports finer lines for microchips

Cambridge, MA | Posted on July 10th, 2008

Their new technique could pave the way for next-generation computer memory and integrated-circuit chips, as well as advanced solar cells and other devices.

The team has created lines about 25 nanometers (billionths of a meter) wide separated by 25 nm spaces. For comparison, the most advanced commercially available computer chips today have a minimum feature size of 65 nm. Intel recently announced that it will start manufacturing at the 32 nm minimum line-width scale in 2009, and the industry roadmap calls for 25 nm features in the 2013-2015 time frame.

The MIT technique could also be economically attractive because it works without the chemically amplified resists, immersion lithography techniques and expensive lithography tools that are widely considered essential to work at this scale with optical lithography. Periodic patterns at the nanoscale, while having many important scientific and commercial applications, are notoriously difficult to produce with low cost and high yield. The new method could make possible the commercialization of many new nanotechnology inventions that have languished in laboratories due to the lack of a viable manufacturing method.

The MIT team includes Mark Schattenburg and Ralf Heilmann of the MIT Kavli Institute of Astrophysics and Space Research and graduate students Chih-Hao Chang and Yong Zhao of the Department of Mechanical Engineering. Their results have been accepted for publication in the journal Optics Letters and were recently presented at the 52nd International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication in Portland, Ore.

Schattenburg and colleagues used a technique known as interference lithography (IL) to generate the patterns, but they did so using a tool called the nanoruler--built by MIT graduate students--that is designed to perform a particularly high precision variant of IL called scanning-beam interference lithography, or SBIL. This recently developed technique uses 100 MHz sound waves, controlled by custom high-speed electronics, to diffract and frequency-shift the laser light, resulting in rapid patterning of large areas with unprecedented control over feature geometry.

While IL has been around for a long time, the SBIL technique has enabled, for the first time, the precise and repeatable pattern registration and overlay over large areas, thanks to a new high-precision phase detection algorithm developed by Zhao and a novel image reversal process developed by Chang.

According to Schattenburg, "What we're finding is that control of the lithographic imaging process is no longer the limiting step. Material issues such as line sidewall roughness are now a major barrier to still-finer length scales. However, there are several new technologies on the horizon that have the potential for alleviating these problems. These results demonstrate that there's still a lot of room left for scale shrinkage in optical lithography. We don't see any insurmountable roadblocks just yet."

The MIT team performed the research in the Space Nanotechnology Laboratory of the MIT Kavli Institute of Astrophysics and Space Research, with financial support from NASA and NSF.

####

About MIT
The mission of MIT is to advance knowledge and educate students in science, technology, and other areas of scholarship that will best serve the nation and the world in the 21st century.

For more information, please click here

Contacts:
MIT News Office
Phone 617-253-2700


Room 11-400
77 Massachusetts Ave.
Cambridge, MA 02139-4307

Copyright © MIT

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Scientists take key step toward custom-made nanoscale chemical factories: Berkeley Lab researchers part of team that creates new function in tiny protein shell structures February 6th, 2016

Discovery of the specific properties of graphite-based carbon materials February 6th, 2016

Hepatitis virus-like particles as potential cancer treatment February 5th, 2016

Organic crystals allow creating flexible electronic devices: The researchers from the Faculty of Physics of the Moscow State University have grown organic crystals that allow creating flexible electronic devices February 5th, 2016

Chip Technology

Organic crystals allow creating flexible electronic devices: The researchers from the Faculty of Physics of the Moscow State University have grown organic crystals that allow creating flexible electronic devices February 5th, 2016

Scientists guide gold nanoparticles to form 'diamond' superlattices: DNA scaffolds cage and coax nanoparticles into position to form crystalline arrangements that mimic the atomic structure of diamond February 4th, 2016

Polar vortices observed in ferroelectric: New state of matter holds promise for ultracompact data storage and processing February 4th, 2016

Electrons and liquid helium advance understanding of zero-resistance: Study of electrons on liquid helium systems sheds light on zero-resistance phenomenon in semiconductors February 2nd, 2016

Nanoelectronics

Cornell researchers create first self-assembled superconductor February 1st, 2016

Spin dynamics in an atomically thin semi-conductor February 1st, 2016

New type of nanowires, built with natural gas heating: UNIST research team developed a new simple nanowire manufacturing technique February 1st, 2016

Nanosheet growth technique could revolutionize nanomaterial production February 1st, 2016

Discoveries

Scientists take key step toward custom-made nanoscale chemical factories: Berkeley Lab researchers part of team that creates new function in tiny protein shell structures February 6th, 2016

Discovery of the specific properties of graphite-based carbon materials February 6th, 2016

Study reveals how herpes virus tricks the immune system February 5th, 2016

Hepatitis virus-like particles as potential cancer treatment February 5th, 2016

Announcements

Scientists take key step toward custom-made nanoscale chemical factories: Berkeley Lab researchers part of team that creates new function in tiny protein shell structures February 6th, 2016

Discovery of the specific properties of graphite-based carbon materials February 6th, 2016

Study reveals how herpes virus tricks the immune system February 5th, 2016

Hepatitis virus-like particles as potential cancer treatment February 5th, 2016

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







Car Brands
Buy website traffic