Nanotechnology Now







Heifer International

Wikipedia Affiliate Button


DHgate

Home > Press > MIT reports finer lines for microchips

Photo / Ralf Heilmann
MIT nanoruler lithography tool with a 300 mm-diameter silicon wafer.
Photo / Ralf Heilmann
MIT nanoruler lithography tool with a 300 mm-diameter silicon wafer.

Abstract:
MIT researchers have achieved a significant advance in nanoscale lithographic technology, used in the manufacture of computer chips and other electronic devices, to make finer patterns of lines over larger areas than have been possible with other methods.

MIT reports finer lines for microchips

Cambridge, MA | Posted on July 10th, 2008

Their new technique could pave the way for next-generation computer memory and integrated-circuit chips, as well as advanced solar cells and other devices.

The team has created lines about 25 nanometers (billionths of a meter) wide separated by 25 nm spaces. For comparison, the most advanced commercially available computer chips today have a minimum feature size of 65 nm. Intel recently announced that it will start manufacturing at the 32 nm minimum line-width scale in 2009, and the industry roadmap calls for 25 nm features in the 2013-2015 time frame.

The MIT technique could also be economically attractive because it works without the chemically amplified resists, immersion lithography techniques and expensive lithography tools that are widely considered essential to work at this scale with optical lithography. Periodic patterns at the nanoscale, while having many important scientific and commercial applications, are notoriously difficult to produce with low cost and high yield. The new method could make possible the commercialization of many new nanotechnology inventions that have languished in laboratories due to the lack of a viable manufacturing method.

The MIT team includes Mark Schattenburg and Ralf Heilmann of the MIT Kavli Institute of Astrophysics and Space Research and graduate students Chih-Hao Chang and Yong Zhao of the Department of Mechanical Engineering. Their results have been accepted for publication in the journal Optics Letters and were recently presented at the 52nd International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication in Portland, Ore.

Schattenburg and colleagues used a technique known as interference lithography (IL) to generate the patterns, but they did so using a tool called the nanoruler--built by MIT graduate students--that is designed to perform a particularly high precision variant of IL called scanning-beam interference lithography, or SBIL. This recently developed technique uses 100 MHz sound waves, controlled by custom high-speed electronics, to diffract and frequency-shift the laser light, resulting in rapid patterning of large areas with unprecedented control over feature geometry.

While IL has been around for a long time, the SBIL technique has enabled, for the first time, the precise and repeatable pattern registration and overlay over large areas, thanks to a new high-precision phase detection algorithm developed by Zhao and a novel image reversal process developed by Chang.

According to Schattenburg, "What we're finding is that control of the lithographic imaging process is no longer the limiting step. Material issues such as line sidewall roughness are now a major barrier to still-finer length scales. However, there are several new technologies on the horizon that have the potential for alleviating these problems. These results demonstrate that there's still a lot of room left for scale shrinkage in optical lithography. We don't see any insurmountable roadblocks just yet."

The MIT team performed the research in the Space Nanotechnology Laboratory of the MIT Kavli Institute of Astrophysics and Space Research, with financial support from NASA and NSF.

####

About MIT
The mission of MIT is to advance knowledge and educate students in science, technology, and other areas of scholarship that will best serve the nation and the world in the 21st century.

For more information, please click here

Contacts:
MIT News Office
Phone 617-253-2700


Room 11-400
77 Massachusetts Ave.
Cambridge, MA 02139-4307

Copyright © MIT

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Advantest to Exhibit at SEMICON Korea in Seoul, South Korea February 4-6 Showcasing Broad Portfolio of Semiconductor Products, Technologies and Solutions January 29th, 2015

Park Systems Announces Innovations in Bio Cell Analysis with the Launch of Park NX-Bio, the only 3-in-1 Imaging Nanoscale Tool Available for Life Science Researchers January 29th, 2015

2015 Nanonics Image Contest January 29th, 2015

Iranian Scientists Use MOFs to Eliminate Dye Pollutants January 29th, 2015

Chip Technology

Creating new materials with quantum effects for electronics January 29th, 2015

Advantest to Exhibit at SEMICON Korea in Seoul, South Korea February 4-6 Showcasing Broad Portfolio of Semiconductor Products, Technologies and Solutions January 29th, 2015

Nanometrics to Present at the Stifel 2015 Technology, Internet and Media Conference January 27th, 2015

New pathway to valleytronics January 27th, 2015

Nanoelectronics

Electronic circuits with reconfigurable pathways closer to reality January 26th, 2015

Rice-sized laser, powered one electron at a time, bodes well for quantum computing January 15th, 2015

Rapid journey through a crystal lattice: Researchers measure how fast electrons move through single atomic layers January 14th, 2015

A new step towards using graphene in electronic applications January 14th, 2015

Discoveries

Creating new materials with quantum effects for electronics January 29th, 2015

Los Alamos Develops New Technique for Growing High-Efficiency Perovskite Solar Cells: Researchersí crystal-production insights resolve manufacturing difficulty January 29th, 2015

Iranian Scientists Use MOFs to Eliminate Dye Pollutants January 29th, 2015

Made-in-Singapore rapid test kit detects dengue antibodies from saliva: IBN's MedTech innovation simplifies diagnosis of infectious diseases January 29th, 2015

Announcements

Advantest to Exhibit at SEMICON Korea in Seoul, South Korea February 4-6 Showcasing Broad Portfolio of Semiconductor Products, Technologies and Solutions January 29th, 2015

Park Systems Announces Innovations in Bio Cell Analysis with the Launch of Park NX-Bio, the only 3-in-1 Imaging Nanoscale Tool Available for Life Science Researchers January 29th, 2015

2015 Nanonics Image Contest January 29th, 2015

Iranian Scientists Use MOFs to Eliminate Dye Pollutants January 29th, 2015

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More










ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2015 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE