Nanotechnology Now

Our NanoNews Digest Sponsors



Heifer International

Wikipedia Affiliate Button


android tablet pc

Home > Press > SUSS MicroTec Delivers Coat/Develop Cluster to Replisaurus Technologies

Abstract:
SUSS MicroTec (FWB:SMH)(GER:SMH), supplier of innovative solutions for the 3D, MEMS, Advanced Packaging and Nanotechnology markets, announced today that it has shipped and successfully installed a Gamma coating cluster at Replisaurus Technologies, a provider of a revolutionary metallization technology called "ElectroChemical Pattern Replication" (ECPR™), which offers a simple and cost effective integrated solution eliminating several traditional process steps thereby reducing complexity. The modular coat/bake/develop cluster from SUSS represents the latest generation technology in high volume production spin coating. Gamma systems are designed to maximize performance at the lowest cost of ownership, while delivering consistently uniform results for a variety of applications such as thin and thick resists, BCB, dielectrics or high topographies.

SUSS MicroTec Delivers Coat/Develop Cluster to Replisaurus Technologies

Munich, Germany | Posted on July 8th, 2008

Replisaurus will use the Gamma for applications related to its proprietary ECPR™ process, a fab-friendly, environmentally-clean metallization process technology, which has extremely fast plating rates. The ECPR™ process combines the precision and resolution of advanced lithography with the ease and efficiency of electrochemical deposition into one single integrated process solution. ECPR™ is targeted at key growth markets such as integrated passives, copper pillars and 3D integration.

"Replisaurus chose SUSS MicroTec to support us with superior coater and developer technology as SUSS is clearly the leader in this market. The SUSS Gamma system meets our high performance requirements by delivering consistently uniform results for a variety of challenging materials, said James Quinn, CEO of Replisaurus Technologies.

"Replisaurus has been devoted to developing production processes for the advanced Packaging and 3D integration market", commented Rolf Wolf, general manager of SUSS MicroTec Lithography Division. "We are excited to support their enabling technology with our Gamma system."

####

About SUSS MicroTec
SUSS MicroTec listed in Deutsche Borse AG’s Prime Standard is one of the world’s leading suppliers of process and testing solutions for markets such as advanced packaging, MEMS, nanotechnology, compound semiconductor, Silicon-On-Insulator and 3D Interconnect. SUSS MicroTec enables its customers to increase process performance while reducing cost of ownership and to meet the volume requirements of fast growing markets with high quality solutions.

SUSS MicroTec supports more than 8,000 installed mask aligners, coaters, bonders and probe systems with a global infrastructure for applications and service.

Headquartered in Garching near Munich, Germany, SUSS MicroTec employs more than 730 employees worldwide.

About Replisaurus Technologies

Replisaurus Technologies, Inc. has developed a revolutionary metallization technology targeted at key growth markets such as integrated passives, copper pillars and 3D integration (TSV). The “ElectroChemical Pattern Replication” (ECPR™) process offers a simple and cost effective integrated solution eliminating several traditional process steps thereby reducing complexity. ECPR™ is a fab friendly, environmentally clean process which does not use any solvents, developers or strippers and has extremely fast plating rates. The ECPR™ technology is a “Design Enabling” technology for integrated passives enabling advanced designs, eliminating the need for prototyping and dummy plating patterns. The electrochemical replication principle of ECPR™ combines the precision and resolution of advanced lithography with the ease and efficiency of electrochemical deposition into one single integrated process solution. For more information please visit us at www.replisaurus.com

All statements in this release other than historical facts are forward-looking statements within the meaning of U.S. Private Securities Litigation Reform Act of 1995. Words such as "believe", "expect", "intend", "anticipate", "estimate", "should", "may", "will", "plan" and similar words and terms used in relation to the enterprise are meant to indicate forward-looking statements of this kind. The company accepts no obligation toward the general public to update or correct forward-looking statements. All forward-looking statements are subject to various risks and uncertainties, as a result of which actual events may diverge numerically from expectations. The forward-looking statements reflect the view at the time they were made.

For more information, please click here

Contacts:
SUSS MicroTec
Brigitte Wehrmann
+49 (0)89 32007 237
Marketing Communications Manager Lithography Division

Copyright © Business Wire 2008

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Arrowhead to Present at BioCentury's NewsMakers in the Biotech Industry Conference September 19th, 2014

SouthWest NanoTechnologies (SWeNT) Receives NIST Small Business Innovation Research (SBIR) Phase 1 Award to Produce Greater than 99% Semiconducting Single-Wall Carbon Nanotubes September 19th, 2014

Toward optical chips: A promising light source for optoelectronic chips can be tuned to different frequencies September 19th, 2014

New research points to graphene as a flexible, low-cost touchscreen solution September 19th, 2014

MEMS

IEEE International Electron Devices Meeting To Celebrate 60th Anniversary as The Leading Technical Conference for Advanced Semiconductor Devices September 18th, 2014

Carbyne morphs when stretched: Rice University calculations show carbon-atom chain would go metal to semiconductor July 21st, 2014

Leti to Present Technological Platforms Targeting Industry’s Needs for the Future at Semicon West Workshop: Presentation at STS Session to Focus on Leti Advanced Lithography Programs for 1x Nodes and on Silicon Photonics at TechXPot June 25th, 2014

Mirrorcle Technologies Opens New Company Headquarters May 27th, 2014

Chip Technology

SouthWest NanoTechnologies (SWeNT) Receives NIST Small Business Innovation Research (SBIR) Phase 1 Award to Produce Greater than 99% Semiconducting Single-Wall Carbon Nanotubes September 19th, 2014

Toward optical chips: A promising light source for optoelectronic chips can be tuned to different frequencies September 19th, 2014

IEEE International Electron Devices Meeting To Celebrate 60th Anniversary as The Leading Technical Conference for Advanced Semiconductor Devices September 18th, 2014

‘Small’ transformation yields big changes September 16th, 2014

Announcements

Arrowhead to Present at BioCentury's NewsMakers in the Biotech Industry Conference September 19th, 2014

SouthWest NanoTechnologies (SWeNT) Receives NIST Small Business Innovation Research (SBIR) Phase 1 Award to Produce Greater than 99% Semiconducting Single-Wall Carbon Nanotubes September 19th, 2014

Toward optical chips: A promising light source for optoelectronic chips can be tuned to different frequencies September 19th, 2014

New research points to graphene as a flexible, low-cost touchscreen solution September 19th, 2014

Tools

IEEE International Electron Devices Meeting To Celebrate 60th Anniversary as The Leading Technical Conference for Advanced Semiconductor Devices September 18th, 2014

FEI Opens New Technology Center in Czech Republic: FEI expands its presence in Brno with the opening of a new, larger facility September 18th, 2014

New NPZ100-403 Piezo Stage from nPoint Inc. September 17th, 2014

Researchers Create World’s Largest DNA Origami September 11th, 2014

New-Contracts/Sales/Customers

Fullerex: Talga Resources Joins INSCX™ Exchange September 4th, 2014

Global Energy Systems Signs Master Sales Agreement with China Aviation Supplies Group September 4th, 2014

East China University of Science and Technology Purchases Nanonex Advanced Nanoimprint Tool NX-B200 July 30th, 2014

University of Manchester selects Anasys AFM-IR for coatings and corrosion research July 30th, 2014

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More














ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2014 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE