Nanotechnology Now

Our NanoNews Digest Sponsors



Heifer International

Wikipedia Affiliate Button


android tablet pc

Home > Press > BASF and Evonik co-develop advanced CMP slurries

Abstract:
Enhanced cost effectiveness and quality of ceria-based slurries to face future challenges

BASF and Evonik co-develop advanced CMP slurries

Germany | Posted on July 3rd, 2008

Evonik Industries AG and BASF have agreed to collaborate on the development of ceria-based slurries for fabricating computer chips. The agreement will leverage BASF's chemical expertise, global marketing and distribution capabilities with Evonik´s leading position in nanomaterials. The resulting slurries are expected to be commercialized in 2009.

Slurries containing nanoscale materials such as ceria are used to polish the silicon dioxide surfaces of wafers to produce highly planar surfaces in a process known as chemical-mechanical polishing, or CMP. The most important processing steps of integrated circuit (IC) fabrication are STI (shallow trench isolation), one of the fastest growing applications requiring CMP slurries, and ILD (inter-layer dielectric).

"With the introduction of smaller node sizes, the requirements of the CMP process have become increasingly critical to IC fabrication. Evonik and BASF believe that this project will enable both parties to stay ahead in the CMP technology and provide next generation solutions and materials for the IC industry," said Dr. Iordanis Savvopoulos, Vice President Technology Solutions in Evonik´s Business Unit Inorganic Materials.

"Chemistry plays an important role in the development of IC products. Combining BASF's extensive background in chemistry and long years of experience in the IC industry with the expertise of Evonik in abrasive particles, we can provide intelligent solutions that meet the increasingly stringent requirements in the market," said Dr. Klemens Mathauer, head of CMP business of BASF's global business unit Electronic Materials.

Evonik´s contribution to the joint development includes various grades of cerium oxide as important fundamental components and formulation know-how for these particles. BASF will contribute its CMP slurry formulation chemistry, production and application know-how, backed by its high-tech laboratories in Europe and Asia.

####

About BASF
BASF is the world’s leading chemical company: The Chemical Company. Its portfolio ranges from oil and gas to chemicals, plastics, performance products, agricultural products and fine chemicals. As a reliable partner BASF helps its customers in virtually all industries to be more successful. With its high-value products and intelligent solutions, BASF plays an important role in finding answers to global challenges such as climate protection, energy efficiency, nutrition and mobility. BASF has more than 95,000 employees and posted sales of almost €58 billion in 2007.

About Evonik
Evonik Industries is the creative industrial group from Germany which operates in three business areas: Chemicals, Energy and Real Estate. Evonik is a global leader in specialty chemicals, an expert in power generation from hard coal and renewable energies, and one of the largest private residential real estate companies in Germany. Our strengths are creativity, specialization, continuous self-renewal, and reliability. Evonik is active in over 100 countries around the world. In its fiscal year 2007 about 43,000 employees generated sales of about €14.4 billion and an operating profit (EBIT) of more than €1.3 billion. Further information on Evonik is available on the Internet at www.evonik.com.

For more information, please click here

Copyright © BASF

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Scientists reveal breakthrough in optical fiber communications December 21st, 2014

Atom-thick CCD could capture images: Rice University scientists develop two-dimensional, light-sensitive material December 20th, 2014

Oregon researchers glimpse pathway of sunlight to electricity: Collaboration with Lund University uses modified UO spectroscopy equipment to study 'maze' of connections in photoactive quantum dots December 19th, 2014

Instant-start computers possible with new breakthrough December 19th, 2014

Chemistry

How does enzymatic pretreatment affect the nanostructure and reaction space of lignocellulosic biomass? December 18th, 2014

The gold standard December 9th, 2014

Simple, Biocompatible Method Developed for Production of Cerium Oxide Nanoparticles December 9th, 2014

Nanocatalysts Can Reduce Pollution Caused by Diesel Engines December 4th, 2014

Chip Technology

Instant-start computers possible with new breakthrough December 19th, 2014

Switching to spintronics: Berkeley Lab reports on electric field switching of ferromagnetism at room temp December 17th, 2014

Pb islands in a sea of graphene magnetise the material of the future December 16th, 2014

Stanford team combines logic, memory to build a 'high-rise' chip: Today circuit cards are laid out like single-story towns; Futuristic architecture builds layers of logic and memory into skyscraper chips that would be smaller, faster, cheaper -- and taller December 15th, 2014

Announcements

Scientists reveal breakthrough in optical fiber communications December 21st, 2014

Atom-thick CCD could capture images: Rice University scientists develop two-dimensional, light-sensitive material December 20th, 2014

Oregon researchers glimpse pathway of sunlight to electricity: Collaboration with Lund University uses modified UO spectroscopy equipment to study 'maze' of connections in photoactive quantum dots December 19th, 2014

Instant-start computers possible with new breakthrough December 19th, 2014

Alliances/Partnerships/Distributorships

SUNY Poly NanoCollege Faculty Member Selected as American Physical Society Fellow: SUNY Poly Associate Professor of Nanoscience Dr. Vincent LaBella Recognized for Significant Technological Innovations that Enable Interactive Learning December 17th, 2014

New 'electronic skin' for prosthetics, robotics detects pressure from different directions December 10th, 2014

SEMATECH Reports Significant Progress in EUV Resist Outgas Testing: Technologists from SEMATECH and JSR demonstrate outgas test results that further enable EUV lithography for high-volume manufacturing readiness December 3rd, 2014

Toward a low-cost 'artificial leaf' that produces clean hydrogen fuel December 3rd, 2014

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More










ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2014 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE