Nanotechnology Now

Our NanoNews Digest Sponsors



Heifer International

Wikipedia Affiliate Button


android tablet pc

Home > Press > Nanometrics Announces IMPULSE™ Integrated Metrology System

Abstract:
Industry's Most Advanced Integrated Film Thickness and CD Metrology System

Nanometrics Announces IMPULSE™ Integrated Metrology System

MILPITAS, CA | Posted on June 9th, 2008

Nanometrics Incorporated (Nasdaq:NANO), a leading supplier of advanced process control metrology equipment, today announced the introduction of its latest integrated metrology (IM) system, IMPULSE™.

Following the innovative 9000 and 9010 IM systems, the Nanometrics IMPULSE is a 300mm, real-time metrology system used to monitor vital CMP, CVD, etch, and photolithography process applications for 32nm nodes and beyond. The system combines the industry's most advanced technology and best cost of ownership for thin film and optical critical dimension (OCD) metrology in an IM platform.

The IMPULSE incorporates new innovations in mechano-optical design and algorithms, allowing up to 70% higher throughput over previous generation systems and three times tighter process control windows. These inherent system advancements will allow device makers to achieve better process control for greater yield and device performance.

Leveraging 35 years of R&D in metrology and over 1,000 IM systems shipped, Nanometrics continues to build on its experience to offer innovative and reliable IM solutions to semiconductor fabs worldwide. "Our new IMPULSE IM system will enable customers to reach their 32nm process window targets without sacrificing process tool productivity," commented Steve Bradley, Director of the Integrated Metrology Business Unit at Nanometrics. "This will improve yield, performance, and enable a significant cost of ownership advantage over current systems."

The IMPULSE IM module also provides plug and play connectivity with Nanometrics' high-end Atlas XP standalone metrology systems through its NanoNet connectivity solution, and along with its compact footprint and modular design, IMPULSE enables easy implementation for new customers and seamless upgradeability for existing customers. When combined with Nanometrics' NanoCD Suite, IMPULSE enables the most advanced CD metrology in an IM system. With the addition of the IMPULSE, Nanometrics advances its strategy and commitment to offer comprehensive process control metrology solutions in every segment within today's advanced semiconductor manufacturing factories.

####

About Nanometrics Incorporated
Nanometrics is a leader in the design, manufacture and marketing of high-performance process control metrology systems used in semiconductor manufacturing. Nanometrics standalone and integrated metrology systems measure various thin film properties, critical dimensions, overlay control and optical, electrical and material properties, including the structural composition of silicon and compound semiconductor devices, during various steps of the manufacturing process. These systems enable semiconductor manufacturers to improve yields, increase productivity and lower their manufacturing costs. The Company maintains its headquarters in Milpitas, California, with sales and service offices worldwide. Nanometrics is traded on NASDAQ Global Market under the symbol NANO.

For more information, please click here

Contacts:
Nanometrics Incorporated
Kevin Heidrich
408-545-6000
Fax: 408-232-5910

Copyright © Business Wire 2008

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Oregon researchers glimpse pathway of sunlight to electricity: Collaboration with Lund University uses modified UO spectroscopy equipment to study 'maze' of connections in photoactive quantum dots December 19th, 2014

Instant-start computers possible with new breakthrough December 19th, 2014

Aculon Hires New Business Development Director December 19th, 2014

Iranian Scientists Use Nanotechnology to Increase Power, Energy of Supercapacitors December 18th, 2014

Chip Technology

Instant-start computers possible with new breakthrough December 19th, 2014

Switching to spintronics: Berkeley Lab reports on electric field switching of ferromagnetism at room temp December 17th, 2014

Pb islands in a sea of graphene magnetise the material of the future December 16th, 2014

Stanford team combines logic, memory to build a 'high-rise' chip: Today circuit cards are laid out like single-story towns; Futuristic architecture builds layers of logic and memory into skyscraper chips that would be smaller, faster, cheaper -- and taller December 15th, 2014

Announcements

Oregon researchers glimpse pathway of sunlight to electricity: Collaboration with Lund University uses modified UO spectroscopy equipment to study 'maze' of connections in photoactive quantum dots December 19th, 2014

Instant-start computers possible with new breakthrough December 19th, 2014

Aculon Hires New Business Development Director December 19th, 2014

Iranian Scientists Use Nanotechnology to Increase Power, Energy of Supercapacitors December 18th, 2014

Tools

Oregon researchers glimpse pathway of sunlight to electricity: Collaboration with Lund University uses modified UO spectroscopy equipment to study 'maze' of connections in photoactive quantum dots December 19th, 2014

Switching to spintronics: Berkeley Lab reports on electric field switching of ferromagnetism at room temp December 17th, 2014

ORNL microscopy pencils patterns in polymers at the nanoscale December 17th, 2014

Unraveling the light of fireflies December 17th, 2014

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More










ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2014 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE