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Qcept's ChemetriQ(R) non-visual defect inspection technology to assist
CEA-Leti in resolving critical yield issues for high-k and low-k
dielectrics, fully silicided metal gates, and other advanced processes
Qcept Technologies Inc., the developer
of a new breed of wafer inspection systems for the semiconductor
manufacturing industry, announced that it has entered into a cooperative
agreement with CEA-Leti, one of the world's leading research organizations
dedicated to the advancement of micro- and nanotechnology. Qcept and
CEA-Leti will investigate potential new techniques for characterizing a
variety of leading-edge semiconductor materials and processes, including
high-k and low-k dielectrics, atomic layer deposition (ALD), fully
silicided (FUSI) metal gates, and advanced cleaning technologies.
Under the terms of the agreement, CEA-Leti is providing its extensive
know-how in advanced semiconductor process development to the partnership.
Qcept, in turn, has installed its ChemetriQ(R) non-visual defect (NVD)
wafer inspection technology in CEA-Leti's development facility in Grenoble,
France, where it is augmenting the organization's existing process
"Advanced materials and processes, such as high-k dielectrics and metal
gates, have the potential to significantly enhance the performance of
future generations of semiconductor devices. However, their complexity can
give rise to new and unique yield problems, which require innovative
inspection methods," stated Adrien Danel, lead research engineer at
CEA-Leti. "This partnership with Qcept can help us to better understand the
yield issues surrounding these materials and processes in order to speed
their development and integration into full-scale manufacturing."
"Leti is at the forefront of many critical areas of semiconductor
research and development," stated Ralph Spicer, vice president of marketing
for Qcept. "Working with CEA-Leti will provide us with a unique opportunity
to have early access to these advanced technologies -- allowing us to
qualify our ChemetriQ solution for some of the industry's most cutting-edge
Qcept's ChemetriQ platform provides rapid, full-wafer, inline detection
of NVDs, such as organic and inorganic residue, metallic contaminants,
process- induced charging, watermarks and other non-visual residue defects
that are undetectable by optical inspection systems. ChemetriQ accomplishes
this by employing an innovative, non-destructive technology that detects
work function variations on the surface of semiconductor wafers. The
ChemetriQ platform is sensitive to 5E9 atoms/cm2 (one atom out of 200,000
per square centimeter), which exceeds the requirements outlined in the
International Technology Roadmap for Semiconductors (ITRS) for metallic
contamination detection down to the 22-nm node.
The CEA (French Atomic Energy Commission), a public organization for
technological research, carries out its missions in the domains of energy,
information and health technologies, and defense, building on the
foundations of fundamental research at the highest level. Strengthened by
the competence of its 15,000 researchers and collaborators, it is
recognized internationally and constitutes a strong source of original
ideas for public authorities, institutions and industries in France and
Located in Grenoble, France, CEA-Leti (Electronics and Information
Technology Laboratory of the French Atomic Energy Commission) is at the
leading edge of European research in microelectronics, microtechnology and
nanotechnology. It employs close to 1,000 people and deposits approximately
200 patents per year. With 28 start-ups created or in the course of
creation, it is one of the most important partners of the industrial world.
Instigator of the MINATEC(R) pole of innovation, CEA-Leti is also one of
its principal partners, alongside of the INP Grenoble (Grenoble Institute
of Technology) and local authorities. More information can be found at
About Qcept Technologies Inc.
Qcept delivers wafer inspection solutions for non-visual defect (NVD)
detection in advanced semiconductor manufacturing. Qcept's ChemetriQ(R)
platform is being adopted in critical processes for inline, non-contact,
full-wafer detection of such NVDs as sub-monolayer organic and metallic
residues, process-induced charging, and other undesired surface non-
uniformities that cannot be detected by conventional optical inspection
equipment. More information can be found at www.qceptech.com.
ChemetriQ is a registered trademark of Qcept Technologies Inc. All
other trademarks are the property of their respective owners.
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