- About Us
- Career Center
- Nano-Social Network
- Nano Consulting
- My Account
Vistec Lithography Inc. has recently received an order from the Paul Scherrer Institute (Switzerland) for a Vistec EBPG5000plus electron beam lithography system.
The Paul Scherrer Institute (PSI) holds a prominent position within the Swiss research and education environment. As a user laboratory the PSI develops and operates complex research facilities and equipment to serve both the R&D sector and the industry.
The new electron-beam lithography system will be installed at the Laboratory for Micro - and Nanotechnology (LMN) of the Paul Scherer Institute. It is required for the research on the optic, electronic, and magnetic properties of nanostructures. PSI's large-scale experimental facilities and specialized nanofabrication technologies available at LMN offer unique possibilities for these investigations. In addition, advanced nanodevices such as diffractive x-ray optical elements will be fabricated for internal and external customers. "The system will help us to keep track of our challenging research roadmap" says Dr. Christian David, Nanopatterning Group Manager at the LMN.
The EBPG5000plus is in line with other Vistec electron-beam lithography systems already installed at leading edge research institutes worldwide. Based on reliable and well-proven system architecture, the system provides a spot size down to <2.5nm at 100keV beam energy, thus allowing nano-lithography structures smaller than 8nm to be routinely generated. As a result of its high flexibility and easy-to-use software the EBPG5000plus has become the "system of choice" in the research community.
"We are extremely proud to have received this order from the Paul Scherrer Institute, one of the leading European research institutes. This will continue our successful cooperation into the future", says Mike Butler, Product Manager for Gaussian Beam Systems at Vistec Lithography Inc.
About Vistec Lithography Inc.
Vistec Electron Beam Lithography Group is providing leading edge technology solutions in all areas of advanced lithography, both in production for direct write and mask making as well as in applied research and nanotechnology. The company serves customers in semiconductor industry including compound semiconductor and mask making, advanced research, optics and emerging markets like nanotechnology.
For more information, please click here
Copyright © Vistec Lithography Inc.If you have a comment, please Contact us.
Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.
|Related News Press|
News and information
Gigantic ultrafast spin currents: Scientists from TU Wien (Vienna) are proposing a new method for creating extremely strong spin currents. They are essential for spintronics, a technology that could replace today's electronics May 25th, 2016
Deep Space Industries and SFL selected to provide satellites for HawkEye 360’s Pathfinder mission: The privately-funded space-based global wireless signal monitoring system will be developed by Deep Space Industries and UTIAS Space Flight Laboratory May 26th, 2016