Nanotechnology Now





Heifer International

Wikipedia Affiliate Button


DHgate

Home > Press > SUSS MicroTec Signs License Agreement with Philips Research to Develop a New Nano Imprinting Technology: Substrate Conformal Imprint Lithography (SCIL

6" PDMS stamp used for Substrate Conformal Imprint Lithography (SCIL), a nanotechnology developed by Philips Research, designed on a platform of a SUSS Mask Aligner. The stamp is mounted on a 200 micron AF-45 glass backplate. Photo: courtesy of Philips Research. (Photo: Business Wire)
6" PDMS stamp used for Substrate Conformal Imprint Lithography (SCIL), a nanotechnology developed by Philips Research, designed on a platform of a SUSS Mask Aligner. The stamp is mounted on a 200 micron AF-45 glass backplate. Photo: courtesy of Philips Research. (Photo: Business Wire)

Abstract:
SUSS MicroTec (FWB:SMH)(GER:SMH), supplier of innovative solutions for the 3D, MEMS, Advanced Packaging and Nanotechnology markets, has entered a license agreement with Philips Research, Eindhoven/The Netherlands, for a new enabling technology called Substrate Conformal Imprint Lithography (SCIL). The aim of this cooperation is to bring an existing equipment platform with this additional Nanoimprinting (NIL) feature to the market, enabling new approaches to large-area imprint applications along with excellent printing resolution and repeatability.

SUSS MicroTec Signs License Agreement with Philips Research to Develop a New Nano Imprinting Technology: Substrate Conformal Imprint Lithography (SCIL

Munich, Germany | Posted on April 29th, 2008

This new imprint technology for sub-50nm patterning is bridging the gap between small rigid stamp application for best resolution and large-area soft stamp usage with the usual limited printing resolution below 200nm. SCIL is an enabling technology offering the best of two worlds - large-area soft stamps with repeatable sub-50nm printing capability, avoiding stamp deformation as no contact force is applied, non-UV based curing at room temperature and allowing high aspect ratios even up to 1:5 and more.

The lab aligner platform from SUSS MicroTec, handling the 150 and 200 mm UV-lithography like MA6 and MA8, will be available and upgradeable with this feature. Immediate availability for sampling is given with the current test setup. Market introduction with fully implemented SCIL functionality into Suss` lab aligners is scheduled for later this year.

"SCIL represents an enabling new technology that paves the way for further commercialization of nanoimprint lithography", said Rolf Wolf, general manager of SUSS MicroTec lithography division. "This collaboration with Philips Research significantly broadens the range of nanoimprint lithography processes we can offer our customers."

####

About SUSS MicroTec
SUSS MicroTec is a leading supplier of production, process and test technology for the semiconductor industry. SUSS maintains its leadership position with over 7,000 systems installed worldwide. SUSS products include coating developing systems, 1X full-field lithography (1XFFL) systems, substrate bonders, and probe systems. Headquartered in Munich, Germany, SUSS has 4 international manufacturing sites and provides support from sales and service centers in North America, Europe, Asia and Japan.

All statements in this release other than historical facts are forward-looking statements within the meaning of U.S. Private Securities Litigation Reform Act of 1995. Words such as "believe", "expect", "intend", "anticipate", "estimate", "should", "may", "will", "plan" and similar words and terms used in relation to the enterprise are meant to indicate forward-looking statements of this kind. The company accepts no obligation toward the general public to update or correct forward-looking statements. All forward-looking statements are subject to various risks and uncertainties, as a result of which actual events may diverge numerically from expectations. The forward-looking statements reflect the view at the time they were made.

For more information, please click here

Contacts:
SUSS MicroTec
Brigitte Wehrmann
+49 (0)89 32007 237
Marketing Communications Manager Lithography Division

Copyright © Business Wire 2008

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Discovery of nanotubes offers new clues about cell-to-cell communication July 2nd, 2015

Nanospiked bacteria are the brightest hard X-ray emitters July 2nd, 2015

Engineering the world’s smallest nanocrystal July 2nd, 2015

Producing spin-entangled electrons July 2nd, 2015

3D printing

Silica 'spiky screws' could enhance industrial coatings, additive manufacturing June 24th, 2015

$8.5M Grant For Developing Nano Printing Technology: 4-D printing to advance chemistry, materials sciences and defense capabilities June 18th, 2015

On the Surface of Polymers June 17th, 2015

Cellulose from wood can be printed in 3-D June 17th, 2015

MEMS

Robust new process forms 3-D shapes from flat sheets of graphene June 23rd, 2015

Slip sliding away: Graphene and diamonds prove a slippery combination June 10th, 2015

MEMS Industry Group Hosts Its First MEMS/Sensors Conference Session at Transducers 2015: MIG Speakers Will Explore Technology Transfer, Emerging MEMS/Sensors, Manufacturing Infrastructure and Process Technology, June 23 in Anchorage June 3rd, 2015

Janusz Bryzek Joins MEMS Industry Group to Lead New TSensors Division - New Division will Focus on Accelerating Development of Emerging Ultra-high Volume Sensors Supporting Abundance, mHealth and IoT May 14th, 2015

Announcements

Nanospiked bacteria are the brightest hard X-ray emitters July 2nd, 2015

Engineering the world’s smallest nanocrystal July 2nd, 2015

Producing spin-entangled electrons July 2nd, 2015

NIST Group Maps Distribution of Carbon Nanotubes in Composite Materials July 2nd, 2015

Patents/IP/Tech Transfer/Licensing

GLOBALFOUNDRIES Completes Acquisition of IBM Microelectronics Business: Transaction adds differentiating technologies, world-class technologists, and intellectual property July 1st, 2015

NEI Announces the Issuance of Multiple Patents on Self-Healing & Superhydrophobic Coatings June 30th, 2015

Solegear Further Strengthens its Product Development Team: New Hire Seeks to Create New, Disruptive, Sustainable Materials June 17th, 2015

High-tech nanofibres could help nutrients in food hit the spot June 17th, 2015

Printing/Lithography/Inkjet/Inks

New technology using silver may hold key to electronics advances July 2nd, 2015

New conductive ink for electronic apparel June 25th, 2015

Leti to Present Solutions to New Applications Using 3D Technologies at SEMICON West LetiDay Event, July 14: Leti Experts also Will Speak at TechXPOT Session on MEMS and STS Session on Lithography Cost-and-Productivity Issues Below 14nm June 22nd, 2015

$8.5M Grant For Developing Nano Printing Technology: 4-D printing to advance chemistry, materials sciences and defense capabilities June 18th, 2015

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More










ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project