Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > Press > Applied Materials Sets the Standard for 32nm Mask Cleaning with New Tetra Reticle Clean System

The Applied Tetra Reticle Clean delivers damage-free, greater than 99% particle removal efficiency for 32nm and beyond photomasks, with the up to four times the throughput of any competitive system. (Photo: Business Wire)
The Applied Tetra Reticle Clean delivers damage-free, greater than 99% particle removal efficiency for 32nm and beyond photomasks, with the up to four times the throughput of any competitive system. (Photo: Business Wire)

Abstract:
Applied Materials, Inc. today released its Applied Tetra™ Reticle Clean, the industry's only wet clean system that delivers damage-free, >99% particle removal efficiency for 32nm-and-beyond photomasks. Enabling customers to exceed 32nm specifications for critical mask cleaning applications, the compact Tetra Reticle Clean system also sets a new standard for productivity, offering up to four times the throughput of any competing system.

Applied Materials Sets the Standard for 32nm Mask Cleaning with New Tetra Reticle Clean System

TOKYO, Japan | Posted on April 15th, 2008

"Conventional photomask cleaning systems have not been able to meet the challenge of cleaning leading-edge masks effectively without damaging them," said Ajay Kumar, general manager of Applied Materials' Mask Etch and Cleans product division. "We've overcome this technology barrier with the Tetra Reticle Clean system, enabling mask makers to achieve the rapid cleaning performance they need while maintaining the mask feature integrity and phase control that their customers demand."

The Tetra Reticle Clean system's remarkable performance, which has already been validated in a 45nm production environment, is the result of several innovations in cleaning technology. The system features a unique, flexible design and sulfur-free, advanced ammonia-based cleaning agents that combine to maximize photoresist and particle removal without damaging the mask. Proprietary Uniform Cavitation Megasonics™ (UCM) technology distributes energy evenly over the entire mask surface, avoiding the damage-causing spikes generated by traditional point-source megasonic[1] cleans. The Tetra Reticle Clean system also introduces NanoDroplet™ technology which utilizes a unique nozzle design to create small, uniform, high-momentum droplets that evenly distribute energy and help deliver 32nm-and-beyond cleaning performance.

The benchmark high throughput of the Tetra Reticle Clean system is enabled by its ability to treat both sides of the mask simultaneously, cutting process time in half compared to other cleaning systems. This feature enables extendibility to future mask generations by allowing different chemistries to be used on each side without mixing. The system can be configured with multiple processing modules, offering mask makers the capacity to eliminate processing bottlenecks and reduce cycle times. For more information on the Applied Tetra Reticle Clean, visit www.appliedmaterials.com/products/reticle_clean_4.html.

The Tetra Reticle Clean system is part of Applied's expanding portfolio of photomask manufacturing and inspection solutions. The Applied Tetra Reticle Etch system is used by virtually every advanced mask shop in the world for 45nm photomask development and production. The Applied Aera2™ Mask Inspection system, just announced today, enables customers to immediately see what pattern will be printed on the wafer. These solutons will be showcased at the Applied Materials Technical Forum in Yokohama, Japan, on April 15 during SPIE Photomask Japan 2008. Visit www.appliedmaterials.com/2008_PMJ.

####

About Applied Materials, Inc.
Applied Materials, Inc. (Nasdaq:AMAT) is the global leader in Nanomanufacturing Technology™ solutions with a broad portfolio of innovative equipment, service and software products for the fabrication of semiconductor chips, flat panel displays, solar photovoltaic cells, flexible electronics and energy efficient glass. At Applied Materials, we apply Nanomanufacturing Technology to improve the way people live.

[1] Megasonic = the rapid formation and collapse of bubbles in a liquid caused by high-frequency pressure waves

For more information, please click here

Contacts:
Applied Materials, Inc.
Betty Newboe
408-563-0647 (editorial/media)

Linda Heller
408-986-7977 (financial community)

Copyright © Business Wire 2008

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

CubeSat Structures Competition Opens Space Design to Students of the World December 16th, 2017

Record high photoconductivity for new metal-organic framework material December 15th, 2017

Error-free into the quantum computer age December 15th, 2017

Leti Will Demonstrate First 3D Anti-Crash Solution for Embedding in Drones: Fitted on a Mass-Market Microcontroller, 360Fusion Software Technology Detects any Dynamic Obstacle and Helps Guide Drones Away from Collisions December 15th, 2017

Chip Technology

Error-free into the quantum computer age December 15th, 2017

Columbia engineers create artificial graphene in a nanofabricated semiconductor structure: Researchers are the first to observe the electronic structure of graphene in an engineered semiconductor; finding could lead to progress in advanced optoelectronics and data processing December 13th, 2017

UCLA chemists synthesize narrow ribbons of graphene using only light and heat: Tiny structures could be next-generation solution for smaller electronic devices December 8th, 2017

Device makes power conversion more efficient: New design could dramatically cut energy waste in electric vehicles, data centers, and the power grid December 8th, 2017

Announcements

CubeSat Structures Competition Opens Space Design to Students of the World December 16th, 2017

Record high photoconductivity for new metal-organic framework material December 15th, 2017

Error-free into the quantum computer age December 15th, 2017

Leti Will Demonstrate First 3D Anti-Crash Solution for Embedding in Drones: Fitted on a Mass-Market Microcontroller, 360Fusion Software Technology Detects any Dynamic Obstacle and Helps Guide Drones Away from Collisions December 15th, 2017

Tools

Perking up and crimping the 'bristles' of polyelectrolyte brushes December 13th, 2017

Untangling DNA: Researchers filter the entropy out of nanopore measurements December 8th, 2017

JPK Instruments announce partnership with Swiss company, Cytosurge AG. The partnership makes Cytosurge’s FluidFM® technology available on the JPK NanoWizard® AFM platform December 8th, 2017

Researchers advance technique to detect ovarian cancer: Rice, MD Anderson use fluorescent carbon nanotube probes to achieve first in vivo success November 30th, 2017

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project