Nanotechnology Now

Our NanoNews Digest Sponsors



Heifer International

Wikipedia Affiliate Button


android tablet pc

Home > Press > Applied Materials Sets the Standard for 32nm Mask Cleaning with New Tetra Reticle Clean System

The Applied Tetra Reticle Clean delivers damage-free, greater than 99% particle removal efficiency for 32nm and beyond photomasks, with the up to four times the throughput of any competitive system. (Photo: Business Wire)
The Applied Tetra Reticle Clean delivers damage-free, greater than 99% particle removal efficiency for 32nm and beyond photomasks, with the up to four times the throughput of any competitive system. (Photo: Business Wire)

Abstract:
Applied Materials, Inc. today released its Applied Tetra™ Reticle Clean, the industry's only wet clean system that delivers damage-free, >99% particle removal efficiency for 32nm-and-beyond photomasks. Enabling customers to exceed 32nm specifications for critical mask cleaning applications, the compact Tetra Reticle Clean system also sets a new standard for productivity, offering up to four times the throughput of any competing system.

Applied Materials Sets the Standard for 32nm Mask Cleaning with New Tetra Reticle Clean System

TOKYO, Japan | Posted on April 15th, 2008

"Conventional photomask cleaning systems have not been able to meet the challenge of cleaning leading-edge masks effectively without damaging them," said Ajay Kumar, general manager of Applied Materials' Mask Etch and Cleans product division. "We've overcome this technology barrier with the Tetra Reticle Clean system, enabling mask makers to achieve the rapid cleaning performance they need while maintaining the mask feature integrity and phase control that their customers demand."

The Tetra Reticle Clean system's remarkable performance, which has already been validated in a 45nm production environment, is the result of several innovations in cleaning technology. The system features a unique, flexible design and sulfur-free, advanced ammonia-based cleaning agents that combine to maximize photoresist and particle removal without damaging the mask. Proprietary Uniform Cavitation Megasonics™ (UCM) technology distributes energy evenly over the entire mask surface, avoiding the damage-causing spikes generated by traditional point-source megasonic[1] cleans. The Tetra Reticle Clean system also introduces NanoDroplet™ technology which utilizes a unique nozzle design to create small, uniform, high-momentum droplets that evenly distribute energy and help deliver 32nm-and-beyond cleaning performance.

The benchmark high throughput of the Tetra Reticle Clean system is enabled by its ability to treat both sides of the mask simultaneously, cutting process time in half compared to other cleaning systems. This feature enables extendibility to future mask generations by allowing different chemistries to be used on each side without mixing. The system can be configured with multiple processing modules, offering mask makers the capacity to eliminate processing bottlenecks and reduce cycle times. For more information on the Applied Tetra Reticle Clean, visit www.appliedmaterials.com/products/reticle_clean_4.html.

The Tetra Reticle Clean system is part of Applied's expanding portfolio of photomask manufacturing and inspection solutions. The Applied Tetra Reticle Etch system is used by virtually every advanced mask shop in the world for 45nm photomask development and production. The Applied Aera2™ Mask Inspection system, just announced today, enables customers to immediately see what pattern will be printed on the wafer. These solutons will be showcased at the Applied Materials Technical Forum in Yokohama, Japan, on April 15 during SPIE Photomask Japan 2008. Visit www.appliedmaterials.com/2008_PMJ.

####

About Applied Materials, Inc.
Applied Materials, Inc. (Nasdaq:AMAT) is the global leader in Nanomanufacturing Technology™ solutions with a broad portfolio of innovative equipment, service and software products for the fabrication of semiconductor chips, flat panel displays, solar photovoltaic cells, flexible electronics and energy efficient glass. At Applied Materials, we apply Nanomanufacturing Technology to improve the way people live.

[1] Megasonic = the rapid formation and collapse of bubbles in a liquid caused by high-frequency pressure waves

For more information, please click here

Contacts:
Applied Materials, Inc.
Betty Newboe
408-563-0647 (editorial/media)

Linda Heller
408-986-7977 (financial community)

Copyright © Business Wire 2008

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

SEMATECH to Showcase Innovation and Advances in Manufacturing at SEMICON Japan 2014: SEMATECH experts will share the latest techniques, emerging trends and best practices in advanced manufacturing strategies and methodologies November 26th, 2014

Australian startup creates world’s first 100% cotton hydrophobic T-Shirts November 26th, 2014

The mysterious 'action at a distance' between liquid containers November 26th, 2014

'Giant' charge density disturbances discovered in nanomaterials: Juelich researchers amplify Friedel oscillations in thin metallic films November 26th, 2014

Chip Technology

SEMATECH to Showcase Innovation and Advances in Manufacturing at SEMICON Japan 2014: SEMATECH experts will share the latest techniques, emerging trends and best practices in advanced manufacturing strategies and methodologies November 26th, 2014

'Giant' charge density disturbances discovered in nanomaterials: Juelich researchers amplify Friedel oscillations in thin metallic films November 26th, 2014

Nanometrics Announces Upcoming Investor Events November 19th, 2014

A novel method for identifying the body’s ‘noisiest’ networks November 19th, 2014

Announcements

SEMATECH to Showcase Innovation and Advances in Manufacturing at SEMICON Japan 2014: SEMATECH experts will share the latest techniques, emerging trends and best practices in advanced manufacturing strategies and methodologies November 26th, 2014

Australian startup creates world’s first 100% cotton hydrophobic T-Shirts November 26th, 2014

The mysterious 'action at a distance' between liquid containers November 26th, 2014

'Giant' charge density disturbances discovered in nanomaterials: Juelich researchers amplify Friedel oscillations in thin metallic films November 26th, 2014

Tools

Renishaw receives Queen's Award for spectroscopy developments November 25th, 2014

JPK reports on the use of AFM and the CellHesion module to study plant cells at the University of Queensland November 25th, 2014

A*STAR SIMTech wins international award for breaking new ground in actuators: SIMTech invention can be used in an array of industries, and is critical for next generation ultra-precision systems November 24th, 2014

Professional AFM Images with a Three Step Click SmartScan by Park Systems Revolutionizes Atomic Force Microscopy by Automatizing the Imaging Process November 24th, 2014

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More












ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2014 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE