Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > Press > SEMATECH Lithography Forum to Focus on Major Technology Shift

Abstract:
Underscoring its role as industry consensus builder, SEMATECH will host its third Lithography Forum May 12-14, in sessions designed to elicit views and drive agreement on the most realistic approach to next-generation lithography technology.

SEMATECH Lithography Forum to Focus on Major Technology Shift

Albany, NY | Posted on March 27th, 2008

The meeting of global lithography experts from industry and academia comes amid growing uncertainty, as evidenced at the recent SPIE conference, on the approach manufacturers and suppliers should to take to prepare for the transition from the 32 nm to the 22 nm half pitch technology node. Investments are huge: lithography tools and infrastructure, which take up to five years to develop, can cost more than $30 million per unit for the current generation; next-generation high-end tools are expected to exceed $40 million.

"The question of what next generation lithography will be is becoming ever more important," said G. Dan Hutcheson of VLSI Research, a leading semiconductor analyst. "The problem is that the 22 nm node is upon us, and if you are a lithographer, you are going to be standing before your boards soon with your head on the block over a bet on one of these solutions."

Over 55 percent of companies surveyed in May 2006 at the previous forum preferred current-generation 193nm immersion technology until at least 2009. For 2012 and beyond, however, EUV (extreme ultra violet) lithography, which uses extremely short wavelengths of light to image circuit patterns on the surface of semiconductor wafers, was the primary choice. However, increasing interest in double patterning balanced by concerns over its cost, and technical progress in EUVL will likely result in changes in the roadmap.

"Given the rising costs and increasing pressure on R&D funding, the industry needs another critical and objective assessment of lithography options," said Michael Lercel, SEMATECH's director of lithography. "Measuring the perception of the readiness of emerging technologies - which we'll ask the Litho Forum participants to weigh in on - is the first step in getting suppliers and partners on board to build tools, materials, and processes for the factory floor."

As in prior forums, various candidate lithography technologies will update the industry on their progress toward readiness for manufacturing insertion, and attendees will be polled, both before and during the meeting, for their opinions on the most likely technology choices for future manufacturing. Unlike other focused conferences, including the SEMATECH-sponsored EUVL Symposium and Immersion Symposium, which provide deep technical results on a single technology, the goal of the Litho Forum is to provide a balanced view of the options for future lithography.

The session is open to the public, and will be held in Lake George, New York as part of the SEMATECH Knowledge Series. Further information is available at
www.sematech.org/meetings/announcements/8352/.

####

About SEMATECH
SEMATECH plays a major role in arbitrating generational shifts by hosting industry-wide forums to foster dialogue and build consensus. SEMATECH also contributes to maintaining the International Technology Roadmap for Semiconductors (ITRS), a 15-year assessment of the industry’s future technology requirements which helps drive the semiconductor industry’s research and development strategies. The consortium works with members and partners on a pre-competitive basis to drive technology from the lab to manufacturing.

For 20 years, SEMATECH® (www.sematech.org), the global consortium of leading semiconductor manufacturers, has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Today, we continue accelerating the next technology revolution with our nanoelectronics and emerging technology partners.

For more information, please click here

Contacts:
SEMATECH
Media Contact:
Anne Englander
512-356-7155

Copyright © Business Wire 2008

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Ultra-thin memory storage device paves way for more powerful computing January 17th, 2018

Scientists synthesize nanoparticle-antioxidants to treat strokes and spinal cord injuries January 16th, 2018

New catalyst for hydrogen production is a step toward clean fuel: Carbon-based nanocomposite with embedded metal ions yields impressive performance as catalyst for electrolysis of water to generate hydrogen January 16th, 2018

'Gyroscope' molecules form crystal that's both solid and full of motion: New type of molecular machine designed by UCLA researchers could have wide-ranging applications in technology and science January 16th, 2018

Possible Futures

Ultra-thin memory storage device paves way for more powerful computing January 17th, 2018

Scientists synthesize nanoparticle-antioxidants to treat strokes and spinal cord injuries January 16th, 2018

New catalyst for hydrogen production is a step toward clean fuel: Carbon-based nanocomposite with embedded metal ions yields impressive performance as catalyst for electrolysis of water to generate hydrogen January 16th, 2018

'Gyroscope' molecules form crystal that's both solid and full of motion: New type of molecular machine designed by UCLA researchers could have wide-ranging applications in technology and science January 16th, 2018

Chip Technology

Ultra-thin memory storage device paves way for more powerful computing January 17th, 2018

'Gyroscope' molecules form crystal that's both solid and full of motion: New type of molecular machine designed by UCLA researchers could have wide-ranging applications in technology and science January 16th, 2018

New oxide and semiconductor combination builds new device potential: Researchers integrated oxide two-dimensional electron gases with gallium arsenide and paved the way toward new opto-electrical devices January 10th, 2018

STMicroelectronics Selects GLOBALFOUNDRIES 22FDX® to Extend Its FD-SOI Platform and Technology Leadership : GF’s FDX technology will enable ST to deliver high-performance, low-power products for next-generation consumer and industrial applications January 9th, 2018

Announcements

Ultra-thin memory storage device paves way for more powerful computing January 17th, 2018

Scientists synthesize nanoparticle-antioxidants to treat strokes and spinal cord injuries January 16th, 2018

New catalyst for hydrogen production is a step toward clean fuel: Carbon-based nanocomposite with embedded metal ions yields impressive performance as catalyst for electrolysis of water to generate hydrogen January 16th, 2018

'Gyroscope' molecules form crystal that's both solid and full of motion: New type of molecular machine designed by UCLA researchers could have wide-ranging applications in technology and science January 16th, 2018

Events/Classes

21st International Conference on Advanced Nanoscience and Nanotechnology December 31st, 2017

Leti Will Demonstrate First 3D Anti-Crash Solution for Embedding in Drones: Fitted on a Mass-Market Microcontroller, 360Fusion Software Technology Detects any Dynamic Obstacle and Helps Guide Drones Away from Collisions December 15th, 2017

Leti to Demo Wristband with Embedded Sensors to Diagnose Sleep Apnea: APNEAband, Which Will Be Demonstrated at CES 2018, Also Monitors Mountain Sickness, Dehydration, Dialysis Treatment Response and Epileptic Seizures December 12th, 2017

Arrowhead Presents New Clinical Data Demonstrating a Sustained Host Response in Hepatitis B Patients Following RNAi Therapy — Up to 5.0 log10 reduction in HBsAg observed; data presented at HEP DART 2017 — December 6th, 2017

Printing/Lithography/Inkjet/Inks/Bio-printing

Printing Flexible Graphene Supercapacitors December 1st, 2017

Math gets real in strong, lightweight structures: Rice University researchers use 3-D printers to turn century-old theory into complex schwarzites November 16th, 2017

Creation of coherent states in molecules by incoherent electrons October 21st, 2017

Graphene based terahertz absorbers: Printable graphene inks enable ultrafast lasers in the terahertz range September 13th, 2017

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project