Nanotechnology Now

Our NanoNews Digest Sponsors





Heifer International

Wikipedia Affiliate Button


android tablet pc

Home > Press > SEMATECH Achieves Single Digit EUV Mask Blank Defect Goal

Abstract:
Technologists at SEMATECH have successfully demonstrated world-class results in low defect density for mask blanks used in extreme ultraviolet lithography (EUVL) - pushing the technology another significant step toward readiness for advanced manufacturing.

SEMATECH Achieves Single Digit EUV Mask Blank Defect Goal

Albany, NY | Posted on February 11th, 2008

In demonstrating a world's best defect density of 0.04/cm2 for EUV mask blanks - with a total of only 8 defects combined from the substrate and the multilayer - the SEMATECH team surpassed the consortium's published commercial EUV mask blank roadmap target for the end of 2007. The roadmap was first developed in 2002 to chart SEMATECH's multiyear strategy to achieve the defect-free mask blanks needed for high volume EUVL manufacturing.

The technical achievement was reported at SEMATECH's Mask Blank Development Center (MBDC), one of several major R&D centers within the College of Nanoscale Science and Engineering (CNSE) of the University at Albany.

"SEMATECH's comprehensive program to provide manufacturing-ready infrastructure for EUV lithography includes a major focus on the very difficult challenge of mask blanks," said Michael Lercel, director of Lithography at SEMATECH. "We've met and exceeded this critical milestone, and we will continue to push ahead on this and other components that our members and the industry will need for successful EUV lithography manufacturing."

"The success of the partnership between SEMATECH and the UAlbany NanoCollege is further illustrated by the latest breakthroughs made by SEMATECH researchers and engineers working at CNSE's Albany NanoTech Complex," said Dr. James G. Ryan, professor of nanoscience and associate vice president of technology at CNSE. "Advances such as these are critical to the development and commercialization of EUVL technology, which is vital for the manufacturing of future nanoelectronics devices that will impact all areas of society."

To achieve manufacturing capability, EUV lithography must clear several technology hurdles including mask blanks, reticle handling, sources, and resists. The mask blanks are the starting material used to make the reticle that contains the device pattern, and are particularly challenging because of the need to accurately deposit more than 80 layers to form the multilayer reflector - while keeping the mask blank defect-free. Low defect mask blanks are essential for cost-effective manufacturing.

The SEMATECH milestone was achieved through the combination of efforts in multilayer deposition, substrate cleaning, improved substrates from suppliers, and state-of-the-art mask blank defect inspection capability. SEMATECH's previously announced partnership with Lasertec Corporation of Japan provided the inspection capability to find defects as small as 53nm on the mask blanks, which was instrumental in providing cycles of learning to reduce defects.

SEMATECH established the Mask Blank Development Center in Albany in 2003, as the world's only research facility devoted to bringing together the critical capabilities needed to enable manufacturable EUV mask blanks.

"This mask blank achievement is a result of the great cooperation of the MBDC team. The Center's unique structure - with core participation from key partners such as Lasertec, New York's Veeco Instruments, and the glass material suppliers - provides the entire infrastructure needed to drive defects to single digit levels," said Chan-Uk Jeon, the SEMATECH MBDC program manager. "We and our commercial partners are committed to keeping this vital effort on track."

####

About SEMATECH
For 20 years, SEMATECH® (www.sematech.org), the global consortium of leading semiconductor manufacturers, has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Today, we continue accelerating the next technology revolution with our nanoelectronics and emerging technology partners.

For more information, please click here

Contacts:
SEMATECH
Anne Englander
512-356-7155

Copyright © Business Wire 2008

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Scientists Capture Ultrafast Snapshots of Light-Driven Superconductivity: X-rays reveal how rapidly vanishing 'charge stripes' may be behind laser-induced high-temperature superconductivity April 16th, 2014

'Life Redesigned: The Emergence of Synthetic Biology' Lecture at Brookhaven Lab on Wednesday, April 30: Biomedical Engineer James Collins to Speak for BSA Distinguished Lecture Series April 16th, 2014

ECHA Planning Workshop on Regulatory Challenges in the Risk Assessment of Nanomaterials April 16th, 2014

Lumerical files a provisional patent that extends the standard eigenmode expansion propagation technique to better address waveguide component design. Lumerical’s EME propagation tool will address a wide set of waveguide applications in silicon photonics and integrated optics April 16th, 2014

Chip Technology

Scientists open door to better solar cells, superconductors and hard-drives: Research enhances understanding of materials interfaces April 14th, 2014

Obducat has launched a new generation of SINDRE® Nano Imprint production system April 11th, 2014

Scientists in Singapore develop novel ultra-fast electrical circuits using light-generated tunneling currents April 10th, 2014

Clean Shot at Manufacturing Course…For Less April 9th, 2014

Announcements

UT Arlington physicist creates new nanoparticle for cancer therapy April 16th, 2014

Relieving electric vehicle range anxiety with improved batteries: Lithium-sulfur batteries last longer with nanomaterial-packed cathode April 16th, 2014

Aerotech X-Y ball-screw stage for economical high performance Planar positioning April 16th, 2014

Energy Research Facility Construction Project at Brookhaven Lab Wins U.S. Energy Secretary's Achievement Award April 16th, 2014

Alliances/Partnerships/Distributorships

Virus structure inspires novel understanding of onion-like carbon nanoparticles April 10th, 2014

Peer Reviewed and Approved for Science by the the Washington Academy of Sciences April 3rd, 2014

New JEOL-Nikon MiXcroscopy Correlative Imaging Solution March 27th, 2014

Quantum Dots Take Center Stage at Inaugural Event: QD Vision Co-Founder and CTO Dr. Seth Coe-Sullivan to Chair First Quantum Dots Forum, March 26, 2014, San Diego, CA March 25th, 2014

Research partnerships

Scientists Capture Ultrafast Snapshots of Light-Driven Superconductivity: X-rays reveal how rapidly vanishing 'charge stripes' may be behind laser-induced high-temperature superconductivity April 16th, 2014

Scalable CVD process for making 2-D molybdenum diselenide: Rice, NTU scientists unveil CVD production for coveted 2-D semiconductor April 8th, 2014

Carbon nanotubes grow in combustion flames April 1st, 2014

Never say never in the nano-world March 31st, 2014

NanoNews-Digest
The latest news from around the world, FREE







  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More














ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2014 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE