Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > Press > SEMATECH Achieves Single Digit EUV Mask Blank Defect Goal

Abstract:
Technologists at SEMATECH have successfully demonstrated world-class results in low defect density for mask blanks used in extreme ultraviolet lithography (EUVL) - pushing the technology another significant step toward readiness for advanced manufacturing.

SEMATECH Achieves Single Digit EUV Mask Blank Defect Goal

Albany, NY | Posted on February 11th, 2008

In demonstrating a world's best defect density of 0.04/cm2 for EUV mask blanks - with a total of only 8 defects combined from the substrate and the multilayer - the SEMATECH team surpassed the consortium's published commercial EUV mask blank roadmap target for the end of 2007. The roadmap was first developed in 2002 to chart SEMATECH's multiyear strategy to achieve the defect-free mask blanks needed for high volume EUVL manufacturing.

The technical achievement was reported at SEMATECH's Mask Blank Development Center (MBDC), one of several major R&D centers within the College of Nanoscale Science and Engineering (CNSE) of the University at Albany.

"SEMATECH's comprehensive program to provide manufacturing-ready infrastructure for EUV lithography includes a major focus on the very difficult challenge of mask blanks," said Michael Lercel, director of Lithography at SEMATECH. "We've met and exceeded this critical milestone, and we will continue to push ahead on this and other components that our members and the industry will need for successful EUV lithography manufacturing."

"The success of the partnership between SEMATECH and the UAlbany NanoCollege is further illustrated by the latest breakthroughs made by SEMATECH researchers and engineers working at CNSE's Albany NanoTech Complex," said Dr. James G. Ryan, professor of nanoscience and associate vice president of technology at CNSE. "Advances such as these are critical to the development and commercialization of EUVL technology, which is vital for the manufacturing of future nanoelectronics devices that will impact all areas of society."

To achieve manufacturing capability, EUV lithography must clear several technology hurdles including mask blanks, reticle handling, sources, and resists. The mask blanks are the starting material used to make the reticle that contains the device pattern, and are particularly challenging because of the need to accurately deposit more than 80 layers to form the multilayer reflector - while keeping the mask blank defect-free. Low defect mask blanks are essential for cost-effective manufacturing.

The SEMATECH milestone was achieved through the combination of efforts in multilayer deposition, substrate cleaning, improved substrates from suppliers, and state-of-the-art mask blank defect inspection capability. SEMATECH's previously announced partnership with Lasertec Corporation of Japan provided the inspection capability to find defects as small as 53nm on the mask blanks, which was instrumental in providing cycles of learning to reduce defects.

SEMATECH established the Mask Blank Development Center in Albany in 2003, as the world's only research facility devoted to bringing together the critical capabilities needed to enable manufacturable EUV mask blanks.

"This mask blank achievement is a result of the great cooperation of the MBDC team. The Center's unique structure - with core participation from key partners such as Lasertec, New York's Veeco Instruments, and the glass material suppliers - provides the entire infrastructure needed to drive defects to single digit levels," said Chan-Uk Jeon, the SEMATECH MBDC program manager. "We and our commercial partners are committed to keeping this vital effort on track."

####

About SEMATECH
For 20 years, SEMATECH® (www.sematech.org), the global consortium of leading semiconductor manufacturers, has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Today, we continue accelerating the next technology revolution with our nanoelectronics and emerging technology partners.

For more information, please click here

Contacts:
SEMATECH
Anne Englander
512-356-7155

Copyright © Business Wire 2008

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Northwestern researchers achieve unprecedented control of polymer grids: Materials could find applications in water purification, solar energy storage, body armor June 22nd, 2018

Nanobiotix Publishes Positive Phase 2/3 Data For Nanomedicine in Soft Tissue Cancer (Webcast June 22) June 22nd, 2018

Alzheimer's breakthrough: Brain metals that may drive disease progression revealed: In brains affected by Alzheimer's, researchers identify chemically reduced iron species, with mineral forms including a magnetic iron oxide June 22nd, 2018

Collaboration yields discovery of 12-sided silica cages June 20th, 2018

Chip Technology

Carbon nanotube optics poised to provide pathway to optical-based quantum cryptography and quantum computing: Researchers are exploring enhanced potential of carbon nanotubes for unique applications June 18th, 2018

Making quantum puddles: Physicists discover how to create the thinnest liquid films ever June 13th, 2018

Leti Presenting Strategic Vision and Hosting a Workshop at SEMICON West: “From Electrons to Photons” Leti Workshop and CEO Media Briefing Set for Tuesday, July 10 in W Hotel, San Francisco June 12th, 2018

Nanometrics Updates Time of Webcast at Stifel 2018 Cross Sector Insight Conference June 12th, 2018

Announcements

Northwestern researchers achieve unprecedented control of polymer grids: Materials could find applications in water purification, solar energy storage, body armor June 22nd, 2018

Nanobiotix Publishes Positive Phase 2/3 Data For Nanomedicine in Soft Tissue Cancer (Webcast June 22) June 22nd, 2018

Alzheimer's breakthrough: Brain metals that may drive disease progression revealed: In brains affected by Alzheimer's, researchers identify chemically reduced iron species, with mineral forms including a magnetic iron oxide June 22nd, 2018

Collaboration yields discovery of 12-sided silica cages June 20th, 2018

Alliances/Trade associations/Partnerships/Distributorships

Powering the 21st Century with Integrated Photonics: UCSB-Led Team Selected for Demonstration of a Novel Waveguide Platform Which is Transparent Throughout the MWIR and LWIR Spectral Bands June 19th, 2018

Leti and Cellmic Join Forces to Speed Market Adoption of Lens-Free Imaging and Sensing Techniques May 3rd, 2018

Nanobiotix and Weill Cornell Medicine Partner on Pre-Clinical Research Inbox x May 3rd, 2018

New era in high field superconducting magnets – opening new frontiers in science, nanotechnology and materials discovery January 9th, 2018

Research partnerships

Alzheimer's breakthrough: Brain metals that may drive disease progression revealed: In brains affected by Alzheimer's, researchers identify chemically reduced iron species, with mineral forms including a magnetic iron oxide June 22nd, 2018

Powering the 21st Century with Integrated Photonics: UCSB-Led Team Selected for Demonstration of a Novel Waveguide Platform Which is Transparent Throughout the MWIR and LWIR Spectral Bands June 19th, 2018

Evidence for a new property of quantum matter revealed: Electrical dipole activity detected in a quantum material unlike any other tested June 11th, 2018

Scientists use photonic chip to make virtual movies of molecular motion June 6th, 2018

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project