Nanotechnology Now

Our NanoNews Digest Sponsors

Heifer International

Wikipedia Affiliate Button

Home > Press > SEMATECH Achieves Single Digit EUV Mask Blank Defect Goal

Abstract:
Technologists at SEMATECH have successfully demonstrated world-class results in low defect density for mask blanks used in extreme ultraviolet lithography (EUVL) - pushing the technology another significant step toward readiness for advanced manufacturing.

SEMATECH Achieves Single Digit EUV Mask Blank Defect Goal

Albany, NY | Posted on February 11th, 2008

In demonstrating a world's best defect density of 0.04/cm2 for EUV mask blanks - with a total of only 8 defects combined from the substrate and the multilayer - the SEMATECH team surpassed the consortium's published commercial EUV mask blank roadmap target for the end of 2007. The roadmap was first developed in 2002 to chart SEMATECH's multiyear strategy to achieve the defect-free mask blanks needed for high volume EUVL manufacturing.

The technical achievement was reported at SEMATECH's Mask Blank Development Center (MBDC), one of several major R&D centers within the College of Nanoscale Science and Engineering (CNSE) of the University at Albany.

"SEMATECH's comprehensive program to provide manufacturing-ready infrastructure for EUV lithography includes a major focus on the very difficult challenge of mask blanks," said Michael Lercel, director of Lithography at SEMATECH. "We've met and exceeded this critical milestone, and we will continue to push ahead on this and other components that our members and the industry will need for successful EUV lithography manufacturing."

"The success of the partnership between SEMATECH and the UAlbany NanoCollege is further illustrated by the latest breakthroughs made by SEMATECH researchers and engineers working at CNSE's Albany NanoTech Complex," said Dr. James G. Ryan, professor of nanoscience and associate vice president of technology at CNSE. "Advances such as these are critical to the development and commercialization of EUVL technology, which is vital for the manufacturing of future nanoelectronics devices that will impact all areas of society."

To achieve manufacturing capability, EUV lithography must clear several technology hurdles including mask blanks, reticle handling, sources, and resists. The mask blanks are the starting material used to make the reticle that contains the device pattern, and are particularly challenging because of the need to accurately deposit more than 80 layers to form the multilayer reflector - while keeping the mask blank defect-free. Low defect mask blanks are essential for cost-effective manufacturing.

The SEMATECH milestone was achieved through the combination of efforts in multilayer deposition, substrate cleaning, improved substrates from suppliers, and state-of-the-art mask blank defect inspection capability. SEMATECH's previously announced partnership with Lasertec Corporation of Japan provided the inspection capability to find defects as small as 53nm on the mask blanks, which was instrumental in providing cycles of learning to reduce defects.

SEMATECH established the Mask Blank Development Center in Albany in 2003, as the world's only research facility devoted to bringing together the critical capabilities needed to enable manufacturable EUV mask blanks.

"This mask blank achievement is a result of the great cooperation of the MBDC team. The Center's unique structure - with core participation from key partners such as Lasertec, New York's Veeco Instruments, and the glass material suppliers - provides the entire infrastructure needed to drive defects to single digit levels," said Chan-Uk Jeon, the SEMATECH MBDC program manager. "We and our commercial partners are committed to keeping this vital effort on track."

####

About SEMATECH
For 20 years, SEMATECH® (www.sematech.org), the global consortium of leading semiconductor manufacturers, has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Today, we continue accelerating the next technology revolution with our nanoelectronics and emerging technology partners.

For more information, please click here

Contacts:
SEMATECH
Anne Englander
512-356-7155

Copyright © Business Wire 2008

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Ag/ZnO-Nanorods Schottky diodes based UV-PDs are fabricated and tested May 26th, 2017

New metamaterial-enhanced MRI technique tested on humans May 26th, 2017

Controlling 3-D behavior of biological cells using laser holographic techniques May 26th, 2017

Unveiling the quantum necklace: Researchers simulate quantum necklace-like structures in superfluids May 26th, 2017

Chip Technology

Researchers find new way to control light with electric fields May 25th, 2017

Nanometrics Announces Retirement Plans of CEO Timothy Stultz: Dr. Stultz to Continue as Director May 25th, 2017

GLOBALFOUNDRIES and Chengdu Partner to Expand FD-SOI Ecosystem in China: More than $100M investment to establish a center of excellence for FDXTM FD-SOI design May 23rd, 2017

Plasmon-powered upconversion nanocrystals for enhanced bioimaging and polarized emission: Plasmonic gold nanorods brighten lanthanide-doped upconversion superdots for improved multiphoton bioimaging contrast and enable polarization-selective nonlinear emissions for novel nanoscal May 19th, 2017

Announcements

Ag/ZnO-Nanorods Schottky diodes based UV-PDs are fabricated and tested May 26th, 2017

New metamaterial-enhanced MRI technique tested on humans May 26th, 2017

Controlling 3-D behavior of biological cells using laser holographic techniques May 26th, 2017

Unveiling the quantum necklace: Researchers simulate quantum necklace-like structures in superfluids May 26th, 2017

Alliances/Trade associations/Partnerships/Distributorships

California Research Alliance by BASF establishes more than 25 research projects in three years April 26th, 2017

BASF and Landa partner to create revolutionary pigments for automotive coatings: The alliance combines BASF innovations with Landa nano-pigment technology April 5th, 2017

Leti Announces EU/South Korean Project for World’s First 5G-system Prototype: Coinciding with the 2018 Winter Games in PyeongChang, Korea, Prototype Will Be First Time State-of-the-art Terrestrial Wireless Communication Is Seamlessly Combined with Disruptive Satellite Communicati April 4th, 2017

ATTOPSEMI Technology Joins FDXcelerator Program to Deliver Advanced Non-Volatile Memory IP to GLOBALFOUNDRIES 22 FDX® Technology Platform: Leading-edge I-fuse™ brings higher reliability, smaller cell size and ease of programmability for consumer, automotive, and IoT applications March 27th, 2017

Research partnerships

Ag/ZnO-Nanorods Schottky diodes based UV-PDs are fabricated and tested May 26th, 2017

Three-dimensional graphene: Experiment at BESSY II shows that optical properties are tuneable May 24th, 2017

Zap! Graphene is bad news for bacteria: Rice, Ben-Gurion universities show laser-induced graphene kills bacteria, resists biofouling May 22nd, 2017

Sensors detect disease markers in breath May 19th, 2017

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project