Home > Press > Rudolph Technologies and Entrepix, Inc. Announce License Agreement
Entrepix to market Rudolph AutoEL Series Ellipsometer
Rudolph Technologies and Entrepix, Inc. Announce License Agreement
FLANDERS, NJ | Posted on November 27th, 2007
Rudolph Technologies, Flanders, New Jersey, and Entrepix, Inc., Tempe, Arizona, announced today that Rudolph has granted Entrepix an exclusive license to manufacture, sell, service and support the Rudolph AutoEL® series of thin-film ellipsometers. The AutoEL® was the first microprocessor-based automated ellipsometer and is recognized worldwide as a high-performance, high-precision instrument used in the measurement of film thickness. Thousands of AutoEL tools have been placed in universities, semiconductor research labs and semiconductor production lines since it was commercialized in 1977, with many of those tools in continuous use today. All systems to be sold will be labeled "Rudolph Technologies AutoEL®—provided and supported by Entrepix".
"The AutoEL technology was the foundation of our overwhelming success in thin-film metrology," said Paul McLaughlin, chairman and chief executive officer of Rudolph. "We are confident that Entrepix will continue to maintain the high level of support for this product that our customers have expected over the past thirty years."
Entrepix provides CMP process outsourcing and equipment services, including refurbishment of CMP, post-CMP cleaning and thin-film metrology equipment. Due to the complementary nature of Entrepix foundry and equipment capabilities, many semiconductor industry OEMs have authorized the company to exclusively refurbish, service and support pre-owned tools on their behalf.
"We are excited about this opportunity to serve our customers with this established product," said Tim Tobin, chief executive officer of Entrepix. "The AutoEL is a perfect complement to our existing CMP and metrology equipment business. We have the infrastructure in place to continue development and refinement plus expand support of the tool to meet our customers' needs well into the future."
Under the terms of the Agreement, the transfer of assets and inventory will be completed sometime in the fourth quarter. Entrepix is licensed to market the AutoEL on a global basis (excluding Japan) beginning immediately. All inquiries for the AutoEL received by Rudolph will now be redirected to Entrepix.
Entrepix, Inc. is a leading provider of Chemical Mechanical Polishing (CMP) process outsourcing and equipment services. The company provides production, integration and optimization services to IDMs, OEMs, MEMS, nanotechnology and CMP consumables suppliers from its ISO 9001:2000 certified foundry in Tempe, AZ. Entrepix also supplies CMP and metrology equipment to support customers' internal processing requirements. The company's comprehensive processing and equipment capabilities provide customers CMP solutions, from initial integration and optimization, through pilot production and high volume manufacturing.
About Rudolph Technologies
Rudolph Technologies is a worldwide leader in the design, development, manufacture and support of high-performance process control metrology, defect inspection and data analysis systems used by semiconductor device manufacturers. Rudolph provides a full-fab solution through its families of proprietary products that provide critical yield-enhancing information, enabling microelectronic device manufacturers to drive down costs and time to market. The company has enhanced the competitiveness of its products in the marketplace by anticipating and addressing many emerging trends driving the semiconductor industry's growth. Rudolph’s strategy for continued technological and market leadership includes aggressive research and development of complementary metrology and inspection solutions. Headquartered in Flanders, New Jersey, Rudolph supports its customers with a worldwide sales and service organization. Additional information can be found on the company’s website at http://www.rudolphtech.com .
Safe Harbor Statement
This press release contains forward-looking statements within the meaning of the Private Securities Litigation Reform Act of 1995 (the “Act”). In some cases, you can identify those so-called “forward-looking statements” by words such as “may,” “will,” “would,” “should,” “expects,” “plans,” “anticipates,” “believes,” “feels,” “estimates,” “predicts,” “potential,” or “continue,” or the negative of those words and other comparable words. Rudolph wishes to take advantage of the “safe harbor” provided for by the Act and cautions that actual results may differ materially from those projected as a result of various factors, including risks and uncertainties, many of which are beyond Rudolph’s control. Factors that could cause actual results to differ materially from the expectations expressed in such forward-looking statements, include, but are not limited to, the impact of the slowdown in the overall economy, the uncertainty of the current global political environment, the potential for terrorist attacks, the potential for business disruptions due to infectious diseases, changes in customer demands for our existing and new products, the timing, cancellation or delay of customer orders and shipments, the timing of revenue recognition of shipments, new product offerings from our competitors, changes in or an inability to execute Rudolph’s business strategy, unanticipated manufacturing or supply problems and changes in tax rules. Rudolph cannot guarantee future results, levels of activity, performance, or achievements. The matters discussed in this press release also involve risks and uncertainties as summarized in Rudolph’s Form 10-K report for the year ended December 31, 2006 and other filings with the Securities and Exchange Commission (“SEC”), which are available at http://www.sec.gov , the SEC’s website, and at http://www.rudolphtech.com , the Rudolph website. While these factors may be updated from time to time through the filing of reports and registration statements with the SEC, Rudolph does not assume any obligation to update the forward-looking information contained in this press release.
For more information, please click here
Steven R. Roth, 973-448-4302
Virginia Becker, 952-259-1647
Bob Tucker, 602-426-8675
Vice President, General Manager
Impress Public Relations
Amy Smith, 401-369-9266
Copyright © Business Wire 2007
If you have a comment, please Contact
Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.
A*STAR and industry form S$200M semiconductor R&D July 25th, 2014
A Crystal Wedding in the Nanocosmos July 23rd, 2014
Nanometrics Announces Upcoming Investor Events July 22nd, 2014
Penn Study: Understanding Graphene’s Electrical Properties on an Atomic Level July 22nd, 2014
Terabyte Photonic Dataset Sale July 30th, 2014
Zenosense, Inc. July 29th, 2014
Optimum inertial design for self-propulsion: A new study investigates the effects of small but finite inertia on the propulsion of micro and nano-scale swimming machines July 29th, 2014
A new way to make microstructured surfaces: Method can produce strong, lightweight materials with specific surface properties July 29th, 2014
Silicene Labs Announces the Launch of Patent-Pending, 2D Materials Composite Index™ : The Initial 2D Materials Composite Index™ for Q2 2014 Is: 857.3; Founders Include World-Renowned Physicist and Seasoned Business and IP Professionals July 24th, 2014
UCF Nanotech Spinout Developing Revolutionary Battery Technology: Power the Next Generation of Electronics with Carbon July 23rd, 2014
Bruker Awarded Fourth PeakForce Tapping Patent: AFM Mode Uniquely Combines Highest Resolution Imaging and Material Property Mapping July 22nd, 2014
Rice's silicon oxide memories catch manufacturers' eye: Use of porous silicon oxide reduces forming voltage, improves manufacturability July 10th, 2014