Home > Press > GE Ranks #1 in Proactively Addressing World's High-Tech Challenges
Ranking part of R&D Magazine's survey of top research & development
GE Ranks #1 in Proactively Addressing World's High-Tech Challenges
NISKAYUNA, NY | Posted on November 1st, 2007
GE (NYSE: GE), today announced that it has been recognized as the world's top research and development (R&D) company for proactively addressing the world's biggest "high-tech challenges" by R&D Magazine, http://www.rdmag.com/ , a respected trade publication read by scientists, engineers and administrators who work in research and development. GE also placed first among R&D facilities where technologists would most like to work.
To determine these rankings, R&D Magazine editors analyzed 130
R&D-intensive companies on intellectual property, community service and
financial growth trends, as well as surveyed its readership to evaluate R&D
operations. GE ranked second out of the 130 companies for overall "best R&D
companies in the world."
Mark Little, Senior Vice President and Director, GE Global Research, said
the survey results "are a recognition of GE's strong commitment to research
and development. During the past decade, GE has invested billions of dollars
and expanded its R&D footprint in the United States, Europe and Asia. The
company also has placed big bets in sustainable energy, nanotechnology,
biotechnology and security to address some of the world's most pressing
"We're also very proud that when it comes to which company is seen as the
most proactive in tackling the world's biggest technology challenges, GE comes
out on top," Little added. "We have always viewed technology as a means to
delivering breakthrough products and solutions for our customers and for
society. We pride ourselves on pushing the limits of innovation to change the
As part of the survey, readers were asked which company's R&D was most
proactive in responding to high-tech challenges like global warming, disease
and pollution. GE was the leading vote getter in this category. In tandem with
this question, GE ranked second when readers were asked which company's R&D
has the strongest influence on society.
GE's research and development operation has a proud history that spans
more than a century. The company was the first to establish an industrial
research lab in the U.S. in Schenectady, N.Y. in 1900. Today, its corporate
research and development headquarters in Niskayuna, N.Y., employs more than
1,900 people on its sprawling 525-acre facility. Since 1999, the company has
opened three additional R&D facilities globally in Bangalore, India; Shanghai,
China; and Munich, Germany. GE also has invested more than $125 million to
renovate and expand the Niskayuna facility, which included a new building wing
housing biotechnology and nanotechnology labs.
All together, GE has more than 27,000 technologists across the company
working to develop the next generation of technologies and products.
Technology development at GE extends beyond its R&D labs to it many partners
in academia, government and the private sector. The company engages in
hundreds of projects each year with partners to advance the state of
technology in key areas such as energy, health care, security, transportation
and lighting and appliances.
GE Global Research was the first industrial research lab in the United
States and is one of the world's most diversified research centers, providing
innovative technology for all of GE's businesses. Global Research has been the
cornerstone of GE technology for more than 100 years, developing breakthrough
innovations in areas such as medical imaging, energy generation, jet engines,
advanced materials and lighting. GE Global Research is headquartered in
Niskayuna, New York and has facilities in Bangalore, India; Shanghai, China;
and Munich, Germany.
For more information, please click here
GE Media Relations
Copyright © CNW Group Ltd.
If you have a comment, please Contact
Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.
'Atomic chicken-wire' is key to faster DNA sequencing March 30th, 2015
Nanoscale worms provide new route to nano-necklace structures March 29th, 2015
Solving molybdenum disulfide's 'thin' problem: Research team increases material's light emission by twelve times March 29th, 2015
A first glimpse inside a macroscopic quantum state March 28th, 2015
FEI Technology Award of the German Neuroscience Society Goes to Benjamin Judkewitz of the University of Berlin: Bi-annual award honors excellence in brain research during the German Neuroscience Society’s Annual Meeting, held 18-21 March 2015 March 26th, 2015
FEI Announces Image Contest Grand Prize Winner: Francisco Rangel of the National Institute of Technology, INT/MCTI, Brazil, wins the contest with his “Expanded Vermiculite” image March 23rd, 2015
Halas, Nordlander awarded Optical Society's R.W. Wood Prize: Rice University researchers recognized for pioneering nanophotonics March 21st, 2015
Hiden Instruments identified in London Stock Exchange’s ‘1000 Companies to Inspire Britain' March 21st, 2015