Nanotechnology Now - Press Release: "Oerlikon Systems Announces VERSALINE(TM) Sale to Cornell University"

Home > Press > Oerlikon Systems Announces VERSALINE(TM) Sale to Cornell University

Abstract:
Oerlikon Systems recently announced that the Cornell University Nanoscale Science and Technology Facility (CNF) in Ithaca, New York has purchased a VERSALINE™ deep silicon dry etching system.

Oerlikon Systems Announces VERSALINE(TM) Sale to Cornell University

St. Petersburg, FL | Posted on October 30th, 2007

This VERSALINE™ system will bring new processing capability for MEMS device fabrication as well as enabling a broad range of nanoscale science and technology projects. The system incorporates Oerlikon's latest Deep Silicon Etch (DSE®) technology that provides the etching precision and process latitude necessary to create the next generation of nanoscale and MEMS devices.

The Cornell Nanoscale Science & Technology Facility ( http://www.cnf.cornell.edu ) is a national user facility that provides state-of-the-art resources coupled with expert staff as part of the National Nanofabrication Infrastructure Network (NNIN). This year marks CNF's 30th year in operation. Research at CNF encompasses physical sciences, engineering, and life sciences, and has a strong inter-disciplinary emphasis. Over 700 users per year (50% of them come from outside Cornell) use the fabrication, synthesis, computation, characterization, and integration resources of CNF to build structures, devices and systems from atomic to micron length-scales. Dry etching of silicon is one of the critical processes for research in these areas.

"After an extensive and detailed evaluation of the available deep silicon etch technology, Oerlikon's VERSALINE™ DSE® performance offered the best combination of outstanding process latitude, mask selectivity, and high etch rate we require to meet the needs of our numerous user projects," stated Don Tennant, Directory of Operations at CNF.

Added Vince Genova, CNF's engineer responsible for analyzing the various results, "This state of the art DRIE system also minimized RIE lag, demonstrated high aspect ratio etching, improved sidewall morphology, and eliminated common artifacts encountered in DRIE. We look forward to the tool's arrival later this year."

David Lishan, Principal Scientist at Oerlikon Systems, states, "Our collaborations with Cornell goes back nearly a decade and we are pleased to continue working with Cornell to extend the boundaries of MEMS and nanotechnology. This opportunity is another example of Oerlikon's commitment to advanced research."

####

About Oerlikon Systems
Oerlikon (SWX:OERL) is among the world's most successful industrial high-tech companies focusing on machine and systems engineering. Oerlikon stands for leading industrial solutions and cutting-edge technology in textile production, thin film coating, propulsion, precision and vacuum technology. As a company with Swiss roots and a 100-year tradition, Oerlikon, with CHF 4.8 billion in sales, over 19,000 employees at 170 locations in 35 countries, has evolved into a global player today.

For more information, please click here

Contacts:
OC Oerlikon Balzers Ltd., St. Petersburg
Sven E. Jarby, Phone 727-577-4999

or
Corporate Communications
Burkhard Boendel, Phone +41 58 360 96 05 or
Fax +41 58 360 91 93

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark: