Nanotechnology Now

Our NanoNews Digest Sponsors



Heifer International

Wikipedia Affiliate Button


android tablet pc

Home > Press > SEMATECH to Report Production-Enabling Breakthroughs at EUVL Symposium

Abstract:
SEMATECH engineers have made significant advances in moving forward the infrastructure that will prepare extreme ultraviolet lithography (EUVL) for cost-effective manufacturing, according to papers being presented here at the 2007 International EUVL Symposium.

SEMATECH to Report Production-Enabling Breakthroughs at EUVL Symposium

SAPPORO, Japan | Posted on October 29th, 2007

An outstanding set of SEMATECH-led technical achievements and breakthroughs in EUVL are featured in nine papers from SEMATECH authors and seven partner papers involving lithographers from the global consortium. The research leading to these accomplishments took place at SEMATECH's facilities at the College of Nanoscale Science and Engineering (CNSE) in Albany, NY, and demonstrates the consortium's commitment to deliver cost-effective manufacturing solutions to its member companies and the semiconductor industry.

"SEMATECH continues to produce results that chip-makers need to show that EUVL is manufacturable," said Michael Lercel, Lithography director. "Here at the EUVL Symposium, we're showing practical results for mask blank defect reduction, more efficient optical system designs, effective reticle handling, and other areas that help drive cost, which is emphasized in our cost-of-ownership models."

"The significant advances made by SEMATECH researchers and engineers working at the UAlbany NanoCollege demonstrate SEMATECH's leadership in spurring next-generation advances in nanoelectronics, which is enhanced by its growing presence and partnership at CNSE's Albany NanoTech," said Dr. James G. Ryan, professor of nanoscience and associate vice president of technology at CNSE. "This represents another important step forward in the development and commercialization of EUVL technology, which is seen as vital to the future of nanoelectronics manufacturing."

Following is a sampling of advances revealed by SEMATECH technologists in papers being delivered at the symposium:

* The best EUV mask blank defect density in the world today - 0.1 per cm2 at 56 nm resolution - will be reported by Chan-Uk Jeon, program manager of the Mask Blank Development Center in Albany, NY. SEMATECH also has created a detailed database of the source of the defects and is developing mitigation methods, such as smoothing, to reduce pit defects. (This SEMATECH smoothing process has achieved an 800X improvement in defect levels.) SEMATECH's work likely will enable mask blanks to be ready for EUV beta tools in 2009.
* SEMATECH has achieved only five added defects at 56 nm sensitivity in EUV mask blank defect totals, according to a paper by Patrick Kearney, Member Technical Staff. This milestone was enabled with industry-leading 56 nm defect inspection sensitivity on multilayer coated blanks, and is rooted in SEMATECH's strategy of collaborating with suppliers to bring together all elements of the industry.
* A manufacturable EUVL reticle solution also requires defect-free reticle handling. EUVL reticle protection using SEMATECH's "sPod" design shows an average of less than one particle added per 100 separate reticle transfers, as explained in a paper by Long He, project engineer. Tests also show the sPod as a potential solution for shipping and storage.
* Using the industry's best EUV resist exposure capability, SEMATECH has demonstrated that effective resolution down to 24 nm can be achieved with current resists and optimized illumination conditions. These results are documented by Andy Ma, EUV resist bench project manager. Ma also describes remaining resist challenges, including linewidth roughness and photospeed.
* Current optical designs for EUV collectors are not very efficient, but SEMATECH has developed a series of upgrades that could boost collector efficiency by 2.8X. That would reduce the industry's critical dependence on high-power sources or improve tool throughput and cost-effectiveness. The designs are explained in a paper by Michael Goldstein, Senior Technologist.
* Detailed cost-of-ownership targets for EUVL - as determined by SEMATECH's detailed cost models - will be reported by Phil Seidel, Senior Member Technical Staff. These performance targets have been integrated into the consortium's technology development projects, and show that the key elements for cost-effective EUVL include source power, optics lifetime, and mask blank defect reduction.

"SEMATECH continues to move beyond theory and alpha concepts to deliver manufacturable EUV solutions for our member companies and the industry," Lercel said. "We are leading EUV mask blank development with the world's best defect inspection and characterization capability and multilayer deposition capability, and leading-edge imaging capability for EUV photoresists."

####

About SEMATECH
For 20 years, SEMATECH® ( http://www.sematech.org ) has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Today, we continue accelerating the next technology revolution with our nanoelectronics and emerging technology partners.

For more information, please click here

Contacts:
SEMATECH, Austin
Dan McGowan
12-356-3440

Copyright © Business Wire 2007

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

Chip Technology

Nanometrics Announces Upcoming Investor Events November 19th, 2014

A novel method for identifying the body’s ‘noisiest’ networks November 19th, 2014

Researchers create & control spin waves, lifting prospects for enhanced info processing November 17th, 2014

VDMA Electronics Production Equipment: Growth track for 2014 and 2015 confirmed: Business climate survey shows robust industry sector November 14th, 2014

Announcements

Renishaw receives Queen's Award for spectroscopy developments November 25th, 2014

JPK reports on the use of AFM and the CellHesion module to study plant cells at the University of Queensland November 25th, 2014

Vegetable oil ingredient key to destroying gastric disease bacteria: In mice, therapeutic nanoparticles dampen H. pylori bacteria and inflammation that lead to ulcers and gastric cancer November 25th, 2014

Research yields material made of single-atom layers that snap together like Legos November 25th, 2014

Events/Classes

Professional AFM Images with a Three Step Click SmartScan by Park Systems Revolutionizes Atomic Force Microscopy by Automatizing the Imaging Process November 24th, 2014

3rd Iran-Proposed Nano Standard Approved by International Standard Organization November 22nd, 2014

Sustainable Nanotechnologies Project November 20th, 2014

Leica Microsystems Presents Universal Hybrid Detector for Single Molecule Detection and Imaging at SfN and ASCB: Leica HyD SMD - the Optimal Detector for Precise and Reliable SMD data November 20th, 2014

Printing/Lithography/Inkjet/Inks

Canatu Launches CNB In-Mold Film for Transparent Touch on 3D Surfaces –in Cars, Household Appliances, Wearables, Portables November 20th, 2014

SouthWest NanoTechnologies to Demonstrate 3D Capacitive Touch Sensor Featuring Transparent, Thermoformed Carbon Nanotube Ink at Printed Electronics USA 2014 (Booth J25) -- “Conductive and Semiconducting Single-Wall Carbon Nanotube Inks” will be Topic of Company Presentation November 10th, 2014

Longhorn beetle inspires ink to fight counterfeiting November 5th, 2014

'Nanomotor lithography' answers call for affordable, simpler device manufacturing October 31st, 2014

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More












ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2014 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE