Nanotechnology Now - Press Release: Accelrys Releases New and Enhanced Scripting and Workflow Capabilities in Materials Studio® 4.2

Home > Press > Accelrys Releases New and Enhanced Scripting and Workflow Capabilities in Materials Studio® 4.2

Abstract:
New Scripting and Workflow Tools Enable Customers to Customize and Automate their Modeling and Simulation Tasks

Accelrys Releases New and Enhanced Scripting and Workflow Capabilities in Materials Studio® 4.2

San Diego, CA | Posted on October 9th, 2007

Accelrys, Inc. (NASDAQ:ACCL) today announced the release of Materials Studio® 4.2, the newest version of its chemicals, materials and pharmaceutical development modeling and simulation platform. Materials Studio 4.2 provides scripting enhancements, new Materials Visualizer tools and innovative workflow capabilities for automating and customizing modeling and simulation tasks in the areas of catalysis, crystallization, polymers and visualization. Materials Studio 4.2 also includes the new products Adsorption Locator and a graphical interface to Gaussian® 2003.

The MaterialsScript Application Programmers Interface (API) provides a powerful method for generating complete workflows that integrate multiple components of Materials Studio and can be customized to an individual's research needs. Materials Studio 4.2 extends this scripting capability to include DMol3 and Polymorph Predictor. Incorporating DMol3 into scripted workflows makes it easy to model homogeneous and heterogeneous catalysis, and other complex processes relevant to the chemicals, electronics, automotive, and aerospace sectors. Polymorph Predictor enables researchers to study the packing behaviour of organic molecules in crystalline environments which is crucial towards understanding solid forms in Pharmaceutical Development. In addition, new mesoscale tools allow users to create complex starting morphologies which are critical to understanding the properties of materials at the nanoscale.

Accelrys continues integrating third party collaborative tools such as Gaussian® 2003 with the addition of Gaussian Interface which extends the capabilities of Materials Studio by integrating some of the most accurate quantum mechanical methods available. This is especially important for our customer's research efforts in the areas of catalysis, and reaction engineering.

Adsorption Locator is another new module in Materials Studio resulting from the Nanotechnology Consortium which helps researchers understand phenomena of key importance in coatings development, catalysis, gas sensor development, and general materials discovery.

"Materials Studio 4.2 continues to build upon Accelrys' integrated multi-scale modelling and simulation and platform," said Accelrys' President and Chief Executive Officer Mark J. Emkjer. "Creating flexible, customizable and fully integrated scientific business intelligence solutions in the chemical, materials and pharmaceutical development areas allows us to drive our solutions downstream towards the customer's final product."

Key functionality of Materials Studio Reflex can now be accessed within the Accelrys scientific operating platform, SciTegic Pipeline Pilot, environment. Reflex, a comprehensive package for analyzing powder diffraction data, can be used to access important information about a drug sample, such as phase identity, mixture composition, and the degree of crystallinity based on powder X-ray data. This new functionality positions Accelrys to move downstream from drug discovery into pharmaceutical development.

For more information about Materials Studio 4.2 or to download a free trial of the visualization component, Materials Visualizer, please visit http://www.accelrys.com/ today.

####

About Accelrys, Inc.
Accelrys develops and commercializes scientific business intelligence software for the integration, mining, analysis, modeling and simulation, management and interactive reporting of scientific data. Our solutions are used by biologists, chemists, materials scientists, and information technology professionals for product design as well as drug discovery and development. Our technology and services are designed to meet the needs of today’s leading research and development organizations including leading commercial, government and academic organizations. Many of the largest pharmaceutical, biotechnology, chemical, and petroleum companies worldwide use our solutions. Accelrys is headquartered in San Diego, California. For more information about Accelrys, visit its website at http://www.accelrys.com/

Forward-Looking Statements

This press release contains forward-looking statements. Such statements, including statements relating to Materials Studio 4.2, including Materials Studio 4.2 features and potential demand therefore, are subject to risks and uncertainties including, but not limited to, the risks that Materials Studio 4.2 will not successfully achieve market acceptance, demand relating to Materials Studio 4.2, and other risks and uncertainties described in documents Accelrys has filed with the Securities and Exchange Commission, including its most recent report on Form 10-K and any subsequent interim filings. All forward-looking statements in this document are qualified entirely by the cautionary statements included in this document and such filings. These risks and uncertainties could cause actual results to differ materially from results expressed or implied by forward-looking statements contained in this document. These forward-looking statements speak only as of the date of this document. Accelrys disclaims any intent or obligation to publicly update or revise any forward-looking statements contained herein to reflect any change in its expectations with regard thereto or any change in events, conditions or circumstances on which any such statement is based.

For more information, please click here

Contacts:
Accelrys, Inc.
Philomena Walsh
858-799-5440

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark: