Nanotechnology Now

Our NanoNews Digest Sponsors





Heifer International

Wikipedia Affiliate Button


android tablet pc

Home > Press > Obducat receives International Research award

Abstract:
The 2007 Frost & Sullivan European Excellence in Research Award for the field of Nano Imprint Lithography (NIL) goes to Obducat for its outstanding research and development efforts that led to the introduction of the cutting edge Sindre™ series of NIL tools.

Obducat receives International Research award

SWEDEN | Posted on September 9th, 2007

-We are very proud to receive the highest international recognition that the Frost & Sullivan Award carries, says Patrik Lundström, CEO Obducat. We are very happy because it shows that we really are in the forefront with our NIL technology.

The presentation of Obducat and the company´s business as a market leader in NIL equipment concludes:

"Obducat holds the distinction of being the first company to successfully develop a NIL-based high volume production solution (Sindre™) for the lithography requirements of future semiconductor devices and nanotechnology, a feat that is underpinned by the company´s exceptional research and development effort. Frost & Sullivan is pleased to present Obducat AB with the European Award for Excellence in Research".

-When Sindre™, the world´s first high volume manufacturing system based on NIL, was launched in Malmö last January it was very well received, says Patrik Lundström.
-We are very pleased that the respected and well known institute Frost & Sullivan share our view that this HVM system has a significant commercial potential.

In the presentation of Obducat as winner of the award, Frost & Sullivan give the following background:

"In general, it is important to understand that NIL technology provides a cost-effective solution to the lithography challenges of future semiconductor nodes and many other applications. In addition, NIL stands out among other next generation lithography techniques, in terms of throughput capability and ease of implementation.
The introduction of NIL technology would be truly revolutionary and set industry standards to the new lithography approach."

####

About Obducat
Obducat is the world-leading supplier of lithography solutions for manufacturing and replication of advanced micro- and nano- scale structures.

We provide viable and cost-effective lithography solutions that will give a competitive edge to our customers, enabling them to deliver break-through applications and achieve improved profitability and success. Obducat is the first company to commercialize Nanoimprint Lithography (NIL) and Electron Beam Recorder (EBR). Today we are the market leader and has the largest installed base worldwide of NIL.

For more information, please click here

Contacts:
OBDUCAT AB
P.O. Box 580, SE-201 25 Malmö
+ 46 40 36 21 00

Copyright © Obducat AB

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

Chip Technology

Harris & Harris Group Notes the Receipt of Proceeds From the Sale of Molecular Imprints' Semiconductor Business to Canon April 22nd, 2014

Progress made in developing nanoscale electronics: New research directs charges through single molecules April 21st, 2014

'Exotic' material is like a switch when super thin April 18th, 2014

Scientists open door to better solar cells, superconductors and hard-drives: Research enhances understanding of materials interfaces April 14th, 2014

Announcements

Berkeley Lab Researchers Demonstrate First Size-based Chromatography Technique for the Study of Living Cells April 22nd, 2014

PETA science consortium to present hazard testing strategy at nanotoxicology meeting: High tech field ripe for use of sophisticated non-animal testing strategies April 22nd, 2014

Harris & Harris Group Notes the Receipt of Proceeds From the Sale of Molecular Imprints' Semiconductor Business to Canon April 22nd, 2014

National Space Society Congratulates SpaceX on the Success of CRS-3 and the First Flight of the Falcon 9R April 22nd, 2014

Tools

MRI, on a molecular scale: Researchers develop system that could one day peer into the atomic structure of individual molecules April 20th, 2014

Oxford Instruments Asylum Research Introduces the MFP-3D InfinityTM AFM Featuring Powerful New Capabilities and Stunning High Performance April 18th, 2014

More effective kidney stone treatment, from the macroscopic to the nanoscale April 17th, 2014

Aerotech X-Y ball-screw stage for economical high performance Planar positioning April 16th, 2014

Grants/Awards/Scholarships/Gifts/Contests/Honors/Records

National Space Society Congratulates SpaceX on the Success of CRS-3 and the First Flight of the Falcon 9R April 22nd, 2014

Energy Research Facility Construction Project at Brookhaven Lab Wins U.S. Energy Secretary's Achievement Award April 16th, 2014

IDTechEx Printed Electronics Europe 2014 Award Winners April 1st, 2014

Dais Analytic Wins SBIR Grant: Dais Analytic Receives US Army Small Business Innovation Research Grant to Further Its Demonstrated Successes in Cleaning Most Forms of Wastewater March 28th, 2014

Printing/Lithography/Inkjet

Conductive Inks: booming to $2.8 billion by 2024 April 17th, 2014

Transparent Conductive Films and Sensors Are Hot Segments in Printed Electronics: Start-ups in these fields show above-average momentum, while companies working on emissive displays such as OLED are fading, Lux Research says April 17th, 2014

Obducat has launched a new generation of SINDRE® Nano Imprint production system April 11th, 2014

Printed Electronics Europe - Plastic Logic shows a flexible OLED display for wearable devices April 11th, 2014

NanoNews-Digest
The latest news from around the world, FREE







  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More














ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2014 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE