Nanotechnology Now

Our NanoNews Digest Sponsors





Heifer International

Wikipedia Affiliate Button


android tablet pc

Home > Press > Obducat receives International Research award

Abstract:
The 2007 Frost & Sullivan European Excellence in Research Award for the field of Nano Imprint Lithography (NIL) goes to Obducat for its outstanding research and development efforts that led to the introduction of the cutting edge Sindre™ series of NIL tools.

Obducat receives International Research award

SWEDEN | Posted on September 9th, 2007

-We are very proud to receive the highest international recognition that the Frost & Sullivan Award carries, says Patrik Lundström, CEO Obducat. We are very happy because it shows that we really are in the forefront with our NIL technology.

The presentation of Obducat and the company´s business as a market leader in NIL equipment concludes:

"Obducat holds the distinction of being the first company to successfully develop a NIL-based high volume production solution (Sindre™) for the lithography requirements of future semiconductor devices and nanotechnology, a feat that is underpinned by the company´s exceptional research and development effort. Frost & Sullivan is pleased to present Obducat AB with the European Award for Excellence in Research".

-When Sindre™, the world´s first high volume manufacturing system based on NIL, was launched in Malmö last January it was very well received, says Patrik Lundström.
-We are very pleased that the respected and well known institute Frost & Sullivan share our view that this HVM system has a significant commercial potential.

In the presentation of Obducat as winner of the award, Frost & Sullivan give the following background:

"In general, it is important to understand that NIL technology provides a cost-effective solution to the lithography challenges of future semiconductor nodes and many other applications. In addition, NIL stands out among other next generation lithography techniques, in terms of throughput capability and ease of implementation.
The introduction of NIL technology would be truly revolutionary and set industry standards to the new lithography approach."

####

About Obducat
Obducat is the world-leading supplier of lithography solutions for manufacturing and replication of advanced micro- and nano- scale structures.

We provide viable and cost-effective lithography solutions that will give a competitive edge to our customers, enabling them to deliver break-through applications and achieve improved profitability and success. Obducat is the first company to commercialize Nanoimprint Lithography (NIL) and Electron Beam Recorder (EBR). Today we are the market leader and has the largest installed base worldwide of NIL.

For more information, please click here

Contacts:
OBDUCAT AB
P.O. Box 580, SE-201 25 Malmö
+ 46 40 36 21 00

Copyright © Obducat AB

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

Chip Technology

Nanometrics Announces Upcoming Investor Events July 22nd, 2014

Penn Study: Understanding Graphene’s Electrical Properties on an Atomic Level July 22nd, 2014

NUS scientists use low cost technique to improve properties and functions of nanomaterials: By 'drawing' micropatterns on nanomaterials using a focused laser beam, scientists could modify properties of nanomaterials for effective applications in photonic and optoelectric applicat July 22nd, 2014

Oregon chemists eye improved thin films with metal substitution: Solution-based inorganic process could drive more efficient electronics and solar devices July 21st, 2014

Announcements

Nanometrics Announces Upcoming Investor Events July 22nd, 2014

Bruker Awarded Fourth PeakForce Tapping Patent: AFM Mode Uniquely Combines Highest Resolution Imaging and Material Property Mapping July 22nd, 2014

NIST shows ultrasonically propelled nanorods spin dizzyingly fast July 22nd, 2014

Penn Study: Understanding Graphene’s Electrical Properties on an Atomic Level July 22nd, 2014

Tools

Nanometrics Announces Upcoming Investor Events July 22nd, 2014

Bruker Awarded Fourth PeakForce Tapping Patent: AFM Mode Uniquely Combines Highest Resolution Imaging and Material Property Mapping July 22nd, 2014

Dongbu HiTek Unveils Low-Voltage BCDMOS Process for Efficient Power Management in Smart Phones and Tablet Computers July 21st, 2014

Oxford Instruments Asylum Research Opens an Atomic Force Microscopy Demonstration Lab in Mumbai, India July 21st, 2014

Grants/Awards/Scholarships/Gifts/Contests/Honors/Records

Carbyne morphs when stretched: Rice University calculations show carbon-atom chain would go metal to semiconductor July 21st, 2014

Albany NanoCollege Faculty Member Selected as Editor-in-Chief of the Prestigious Journal of Electronic Materials July 1st, 2014

NSERC Boosts Funding for Waterloo Researchers on the Verge of a Breakthrough June 27th, 2014

One step to solar-cell efficiency: Rice University researchers’ chemical process may improve manufacturing June 21st, 2014

Printing/Lithography/Inkjet/Inks

Martini Tech Inc. becomes the exclusive distributor for Yoshioka Seiko Co. porous chucks for Europe and North America July 20th, 2014

University of Illinois researchers demonstrate novel, tunable nanoantennas July 14th, 2014

Haydale Announces Collaboration Agreement with Swansea University’s Welsh Centre for Printing and Coatings (WCPC) July 12th, 2014

Leti to Present Technological Platforms Targeting Industry’s Needs for the Future at Semicon West Workshop: Presentation at STS Session to Focus on Leti Advanced Lithography Programs for 1x Nodes and on Silicon Photonics at TechXPot June 25th, 2014

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More














ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2014 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE