Nanotechnology Now







Heifer International

Wikipedia Affiliate Button


DHgate

Home > Press > Obducat receives International Research award

Abstract:
The 2007 Frost & Sullivan European Excellence in Research Award for the field of Nano Imprint Lithography (NIL) goes to Obducat for its outstanding research and development efforts that led to the introduction of the cutting edge Sindre™ series of NIL tools.

Obducat receives International Research award

SWEDEN | Posted on September 9th, 2007

-We are very proud to receive the highest international recognition that the Frost & Sullivan Award carries, says Patrik Lundström, CEO Obducat. We are very happy because it shows that we really are in the forefront with our NIL technology.

The presentation of Obducat and the company´s business as a market leader in NIL equipment concludes:

"Obducat holds the distinction of being the first company to successfully develop a NIL-based high volume production solution (Sindre™) for the lithography requirements of future semiconductor devices and nanotechnology, a feat that is underpinned by the company´s exceptional research and development effort. Frost & Sullivan is pleased to present Obducat AB with the European Award for Excellence in Research".

-When Sindre™, the world´s first high volume manufacturing system based on NIL, was launched in Malmö last January it was very well received, says Patrik Lundström.
-We are very pleased that the respected and well known institute Frost & Sullivan share our view that this HVM system has a significant commercial potential.

In the presentation of Obducat as winner of the award, Frost & Sullivan give the following background:

"In general, it is important to understand that NIL technology provides a cost-effective solution to the lithography challenges of future semiconductor nodes and many other applications. In addition, NIL stands out among other next generation lithography techniques, in terms of throughput capability and ease of implementation.
The introduction of NIL technology would be truly revolutionary and set industry standards to the new lithography approach."

####

About Obducat
Obducat is the world-leading supplier of lithography solutions for manufacturing and replication of advanced micro- and nano- scale structures.

We provide viable and cost-effective lithography solutions that will give a competitive edge to our customers, enabling them to deliver break-through applications and achieve improved profitability and success. Obducat is the first company to commercialize Nanoimprint Lithography (NIL) and Electron Beam Recorder (EBR). Today we are the market leader and has the largest installed base worldwide of NIL.

For more information, please click here

Contacts:
OBDUCAT AB
P.O. Box 580, SE-201 25 Malmö
+ 46 40 36 21 00

Copyright © Obducat AB

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

Chip Technology

Researchers Make Magnetic Graphene: UC Riverside research could lead to new multi-functional electronic devices January 27th, 2015

Nanometrics to Present at the Stifel 2015 Technology, Internet and Media Conference January 27th, 2015

New pathway to valleytronics January 27th, 2015

Entanglement on a chip: Breakthrough promises secure communications and faster computers January 27th, 2015

Announcements

Iranian Researchers Planning to Produce Edible Insulin January 28th, 2015

Nanoparticles that deliver oligonucleotide drugs into cells described in Nucleic Acid Therapeutics January 28th, 2015

'Bulletproof' battery: Kevlar membrane for safer, thinner lithium rechargeables January 28th, 2015

Spider electro-combs its sticky nano-filaments January 28th, 2015

Tools

Joint international research project leads to a breakthrough in terahertz spectroscopy January 28th, 2015

JPK opens new expanded offices in Berlin to meet the growing demand for products worldwide January 28th, 2015

Pittcon News: Renishaw adds to the comprehensive imaging options available with its inVia confocal Raman microscope January 27th, 2015

Nanometrics to Present at the Stifel 2015 Technology, Internet and Media Conference January 27th, 2015

Grants/Awards/Scholarships/Gifts/Contests/Honors/Records

OCSiAl supports NanoART Imagery Contest January 23rd, 2015

EnvisioNano: An image contest hosted by the National Nanotechnology Initiative (NNI) January 22nd, 2015

Laser-generated surface structures create extremely water-repellent metals: Super-hydrophobic properties could lead to applications in solar panels, sanitation and as rust-free metals January 20th, 2015

NREL Scientist Brian Gregg Named AAAS Fellow: Gregg honored for distinguished contributions to the field of organic solar photoconversion January 20th, 2015

Printing/Lithography/Inkjet/Inks

Toyocolor to Launch New Carbon Nanotube Materials at nano tech 2015 January 24th, 2015

Teijin to Participate in Nano Tech 2015 January 22nd, 2015

A new step towards using graphene in electronic applications January 14th, 2015

Nanoshaping method points to future manufacturing technology December 11th, 2014

NanoNews-Digest
The latest news from around the world, FREE



  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More










ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2015 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE