- About Us
- Career Center
- Nano-Social Network
- Nano Consulting
- My Account
The 2007 Frost & Sullivan European Excellence in Research Award for the field of Nano Imprint Lithography (NIL) goes to Obducat for its outstanding research and development efforts that led to the introduction of the cutting edge Sindre™ series of NIL tools.
-We are very proud to receive the highest international recognition that the Frost & Sullivan Award carries, says Patrik Lundström, CEO Obducat. We are very happy because it shows that we really are in the forefront with our NIL technology.
The presentation of Obducat and the company´s business as a market leader in NIL equipment concludes:
"Obducat holds the distinction of being the first company to successfully develop a NIL-based high volume production solution (Sindre™) for the lithography requirements of future semiconductor devices and nanotechnology, a feat that is underpinned by the company´s exceptional research and development effort. Frost & Sullivan is pleased to present Obducat AB with the European Award for Excellence in Research".
-When Sindre™, the world´s first high volume manufacturing system based on NIL, was launched in Malmö last January it was very well received, says Patrik Lundström.
-We are very pleased that the respected and well known institute Frost & Sullivan share our view that this HVM system has a significant commercial potential.
In the presentation of Obducat as winner of the award, Frost & Sullivan give the following background:
"In general, it is important to understand that NIL technology provides a cost-effective solution to the lithography challenges of future semiconductor nodes and many other applications. In addition, NIL stands out among other next generation lithography techniques, in terms of throughput capability and ease of implementation.
The introduction of NIL technology would be truly revolutionary and set industry standards to the new lithography approach."
Obducat is the world-leading supplier of lithography solutions for manufacturing and replication of advanced micro- and nano- scale structures.
We provide viable and cost-effective lithography solutions that will give a competitive edge to our customers, enabling them to deliver break-through applications and achieve improved profitability and success. Obducat is the first company to commercialize Nanoimprint Lithography (NIL) and Electron Beam Recorder (EBR). Today we are the market leader and has the largest installed base worldwide of NIL.
For more information, please click here
P.O. Box 580, SE-201 25 Malmö
+ 46 40 36 21 00
Copyright © Obducat ABIf you have a comment, please Contact us.
Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.
|Related News Press|
Towards Stable Propagation of Light in Nano-Photonic Fibers September 20th, 2016
Chains of nanogold – forged with atomic precision September 23rd, 2016
Electron beam microscope directly writes nanoscale features in liquid with metal ink September 16th, 2016
Bringing graphene speakers to the mobile market (video) September 12th, 2016
Novel nanoscale detection of real-time DNA amplification holds promise for diagnostics: Research team led by Nagoya University develop a label-free method for detecting DNA amplification in real time based on refractive index changes in diffracted light September 12th, 2016
Iran to hold intl. school on application of nanomaterials in medicine September 20th, 2016
Tailored probes for atomic force microscopes: 3-D laser lithography enhances microscope for studying nanostructures in biology and engineering/ publication in Applied Physics Letters August 11th, 2016
Smarter self-assembly opens new pathways for nanotechnology: Brookhaven Lab scientists discover a way to create billionth-of-a-meter structures that snap together in complex patterns with unprecedented efficiency August 9th, 2016