- About Us
- Career Center
- Nano-Social Network
- Nano Consulting
- My Account
Physical limitations of existing photolithography technology has led to the introduction of novel lithographic technologies during the last two decades. Experts agree that by the end of the current decade, imaging requirements for sub-50 nm node and beyond, will require the introduction of new lithographic technologies to support challenging technological needs, production throughput, and cost effectiveness.
New analysis from Frost & Sullivan ( http://www.ti.frost.com ), Global Advances in Semiconductor Micro-lithography Technologies, discusses the trends and adoption factors influencing the development of microlithography in the field of microelectronics and other sectors. For many decades now, optical lithography has remained an industrial workhorse due in large part to the many enhancement techniques that have prolonged its lifetime, despite repeated forecasts predicting its end. Nevertheless, challenges such as rising mask set costs and the resolution limit drive the search for next generation lithography (NGL).
If you are interested in an analysis, which provides manufacturers, end users, and other industry participants with an overview, summary, challenges and latest coverage of the Global Advances in Semiconductor Micro-lithography Technologies, then send an e-mail to Sara Villarruel, Corporate Communications at with the following information: your full name, company name, title, telephone number, e-mail address, city, state, and country. We will send you the information via email upon receipt of the above information.
"Until now, existing optical lithography lacked a clear successor capable of providing cost effectiveness and technological manufacturing capability at finer geometries," says Frost & Sullivan Industry Analyst Dr. Jayson Koh.
Despite substantial technical progress, several challenges still require attention to ensure the successful adoption of new lithography tools and equipment to enable high-volume production for advanced integrated circuit (IC) manufacturing processes.
The unavailability of affordable lithography processes beyond sub-50 nm, hinders the transition to next-generation technology nodes. Costs of mask sets continue to rise exponentially. For instance, a mask set costs approximately $800,000 at 90 nm and $1.2 million at 65 nm. Following this trend, a 45 nm mask set will likely cost more than $2 million.
In addition, existing immersion optical techniques represent over one third of the chip manufacturing costs and this number continues to increase with each process technology generation. These factors have led to the support of maskless lithography such as electron-beam.
"Maskless technology provides a viable solution to fulfill the needs for higher resolution while lowering mask cost," says Dr. Koh. "However, maskless lithography suffers from low throughput and as such, it is currently targeting only low volume production, which requires approximately 20 wafers per hour."
The evaluation of strengths associated with any next generation lithography technology is largely determined by the cost of development and tools as well as its physical limits. Cost is the main reason behind the reluctance in adopting extreme ultraviolet wavelength optical lithography.
Future advanced lithographic tools, especially for extreme ultraviolet lithography, will likely total over $20 million. As a result, these next generation technologies rely heavily on worldwide collaborations for the development of new lithographic tools and materials.
In order to convince companies to adopt NGL for high-volume manufacturing, NGL manufacturers must quickly develop prototype tools and demonstrate their capabilities beyond existing photolithography technology.
These technologies must also provide technological scalability and extensions to improve the production tool throughput and lower the cost of ownership. In addition, the introduction of NGL processes also entails increased investments in R&D for exposure tools as well as equipment, resist materials, masks, and metrology advancements.
Global Advances in Semiconductor Micro-lithography Technologies is part of the Technical Insights Subscription, which also includes the following research services: semiconductor microlithography - emerging technologies impacting the electronics markets, nanotechnology - applications and markets in North America, nanoelectronics - markets, applications, and technology developments, Asian semiconductor packaging and manufacturing markets, and world front-end semiconductor manufacturing technologies. All research services included in subscriptions provide detailed market opportunities and industry trends, evaluated following extensive interviews with market participants. Interviews with the press are available.
Technical Insights is an international technology analysis business that produces a variety of technical news alerts, newsletters, and research services.
About Frost & Sullivan
Frost & Sullivan, a global growth consulting company, has been partnering with clients to support the development of innovative strategies for more than 40 years. The company's industry expertise integrates growth consulting, growth partnership services, and corporate management training to identify and develop opportunities. Frost & Sullivan serves an extensive clientele that includes Global 1000 companies, emerging companies, and the investment community by providing comprehensive industry coverage that reflects a unique global perspective, and combines ongoing analysis of markets, technologies, econometrics, and demographics.
For more information, please click here
Frost & Sullivan
Corporate Communications – North America:
Sara Villarruel, 210-477-8448
Corporate Communications – Europe:
Joanna Lewandowska, +48-22-390-41-46
Corporate Communications – Southeast Asia:
Donna Jeremiah, +603-6304-5832
Corporate Communications – South Asia, Middle East:
Ravinder Kaur, +91-44-42044760
Corporate Communications – Latin America:
José María Jantus, +54-11-4777-9951
Corporate Communications – China:
Bo Zhang, +86-21-5407-5780, ext. 8611
Corporate Communications – Australia & New Zealand:
Sharmin Jassal, +61-2-8247-8900
Corporate Communications – Africa:
Patrick Cairns, +27-21-680-3274
Copyright © Business Wire 2007If you have a comment, please Contact us.
Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.
|Related News Press|
Two-dimensional semiconductor comes clean April 27th, 2015
Time Dependant Spectroscopy of Microscopic Samples: CRAIC TimePro™ software is used with CRAIC Technologies microspectrometers to measure the kinetic UV-visible-NIR, Raman and fluorescence spectra of microscopic sample areas May 2nd, 2015
Interviews/Book Reviews/Essays/Reports/Podcasts/Journals/White papers
FEI Company: Strong Growth Prospects Remain May 1st, 2015
No Hogwarts invitation required: Invisibility cloaks move into the real-life classroom: A new solid-state device can demonstrate the physical principles of invisibility cloaks without special equipment or magic spells April 30th, 2015