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Home > News > OAI adds nano imprint lithography option for mask aligners

August 1st, 2007

OAI adds nano imprint lithography option for mask aligners

Abstract:
OAI (Optical Associates Inc.) says that it has added to its mask aligners nano imprint lithography with sub-20 nm resolution. Working with Nanolithosolution Inc. (NLS), OAI is offering a nano imprint module as an option for all of the company's mask aligners -- which can then be used as imprint systems or as standard mask aligners (the module can be easily removed at any time). The module can be included with new orders or retrofit onto existing systems. It comes complete with wafer and mask holder and a nano imprint controller to control the process steps. OAI also supplies a complete starter kit of materials.

Source:
smalltimes.com

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