Nanotechnology Now

Our NanoNews Digest Sponsors





Heifer International

Wikipedia Affiliate Button


android tablet pc

Home > Press > 248 nm Lithography to Reach 80 nm Resolution

Abstract:
Industry's Highest KrF NA Will Enable Chip Manufacturers to Reduce Cost of Ownership

248 nm Lithography to Reach 80 nm Resolution

OBERKOCHEN, Germany & SAN FRANCISCO, CA | Posted on July 17th, 2007

Carl Zeiss SMT AG announces at Semicon West 2007 its new lithography optical system Starlith® 1000 for KrF. The new system stands out with a numerical aperture (NA) of 0.93 which will be the highest NA for 248 nm exposure wavelength available in the market. This in turn provides a more cost effective solution for patterning of features down to 80 nm in volume chip production.

"Together with our strategic partner ASML we have investigated customer needs initiating the development of Starlith® 1000. This demonstrates our continuing efforts to offer solutions to the semiconductor industry for cost-effective and highly reliable lithography processes. With Starlith® 1000 the application range of KrF lithography is further extended", Winfried Kaiser points out. The Vice President Product Strategy at Carl Zeiss SMT´s Lithography Optics division continues: This development has only been possible due to our long experience in innovative lens design for lithography and leading-edge manufacturing facilities we have in place at our new production site in Oberkochen, Germany."

With Starlith® 1000 Carl Zeiss SMT now offers a complete product portfolio of leading-edge lithography optics for each of the most advanced exposure wavelenghts/technologies: @ 248 nm/KrF - the new Starlith® 1000; @ 193 nm/ArF dry - the Starlith® 1450 and @ 193 nm immersion/ArF immersion - the Starlith® 1900i.

The Starlith® 1000 system will be part of ASML´s new TWINSCAN™ XT:1000 which will begin shipping in 2008.

####

About Carl Zeiss SMT AG
Carl Zeiss SMT utilizes its globally leading know-how in light, electron and ion-optical technologies to offer its customers in the manufacturing industry and R&D a broad portfolio of products, services and application solutions. The market-leading systems and solutions from Carl Zeiss SMT are used in mutually strengthening fields of application in nanotechnology such as semiconductor technology, materials research and the life sciences. The global customer community is constantly growing. As the innovation leader for lithography optics, as well as optical and particle-beam based inspection, analysis and measuring systems, Carl Zeiss SMT opens up new avenues for its customers in industrial manufacturing environments, quality assurance and industrial and university R&D. Together with its subsidiaries in Germany, England, France and the USA, the international group of companies has approximately 2,400 employees. In fiscal year 2005/06, Carl Zeiss SMT AG generated revenues of over EUR 860 billion. Carl Zeiss SMT AG is a wholly owned subsidiary of Carl Zeiss AG.

For more information, please click here

Contacts:
Press:
Carl Zeiss SMT AG
Public Relations
Markus Wiederspahn, +49 7364 20-2194

Copyright © Business Wire 2007

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

Chip Technology

Sussex physicists find simple solution for quantum technology challenge October 28th, 2014

Watching the hidden life of materials: Ultrafast electron diffraction experiments open a new window on the microscopic world October 27th, 2014

Breakthrough in molecular electronics paves the way for DNA-based computer circuits in the future: DNA-based programmable circuits could be more sophisticated, cheaper and simpler to make October 27th, 2014

QuantumWise guides the semiconductor industry towards the atomic scale October 24th, 2014

Announcements

Nano Ruffles in Brain Matter: Freiburg researchers decipher the role of nanostructures around brain cells in central nervous system function October 31st, 2014

Gold nanoparticle chains confine light to the nanoscale October 31st, 2014

'Nanomotor lithography' answers call for affordable, simpler device manufacturing October 31st, 2014

Device invented at Johns Hopkins provides up-close look at cancer on the move: Microscopic view of metastasis could give insight about how to keep cancer in check October 31st, 2014

Tools

Device invented at Johns Hopkins provides up-close look at cancer on the move: Microscopic view of metastasis could give insight about how to keep cancer in check October 31st, 2014

A new cheap and efficient method to improve SERS, an ultra-sensitive chemical detection technique October 28th, 2014

New Compact SIMS at 61st AVS | Visit us on Booth 311 October 28th, 2014

New nanodevice to improve cancer treatment monitoring October 27th, 2014

Printing/Lithography/Inkjet/Inks

'Nanomotor lithography' answers call for affordable, simpler device manufacturing October 31st, 2014

3DXNano™ ESD Carbon Nanotube 3D Printing Filament - optimized for demanding 3D printing applications in the semi-con and electronics industry October 16th, 2014

Aculon NanoClear Stencil Solution Wins 2014 Global Technology Award at SMTAI October 12th, 2014

Fast, cheap nanomanufacturing: Arrays of tiny conical tips that eject ionized materials could fabricate nanoscale devices cheaply October 4th, 2014

NanoNews-Digest
The latest news from around the world, FREE





  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoTech-Transfer
University Technology Transfer & Patents
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More














ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project







© Copyright 1999-2014 7th Wave, Inc. All Rights Reserved PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE